公开(公告)号：US08906193B2

公开(公告)日：2014-12-09

申请号：US12651165

申请日：2009-12-31

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  F17D1/04 ,  G05D11/13

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US08109288B2

公开(公告)日：2012-02-07

申请号：US12219978

申请日：2008-07-31

申请人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

发明人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

IPC分类号： B05B1/14

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10T137/2499 ,  Y10T137/7722 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8733

摘要： A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

摘要翻译： 分压控制系统45包括从操作气体供给管44分支并且可变地控制操作气体的压力传感器3和分别连接到每个阀2的压力传感器3并且检测操作气体的压力的两个阀2， 以及控制器25，其基于压力传感器3的检测结果按比例地控制阀2的操作，从而相对控制两个阀的压力P1和P2。 利用这种结构，可以减少操作气体的浪费，并且提高相对于设定变化等的响应性。

公开(公告)号：US20100163112A1

公开(公告)日：2010-07-01

申请号：US12651165

申请日：2009-12-31

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： F17D3/00

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US20080300728A1

公开(公告)日：2008-12-04

申请号：US12219978

申请日：2008-07-31

申请人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

发明人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

IPC分类号： G05D7/00 ,  G05D16/00

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10T137/2499 ,  Y10T137/7722 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8733

摘要： A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

摘要翻译： 分压控制系统45包括从操作气体供给管44分支并且可变地控制操作气体的压力传感器3和分别连接到每个阀2的压力传感器3并且检测操作气体的压力的两个阀2， 以及控制器25，其基于压力传感器3的检测结果按比例地控制阀2的操作，从而相对控制两个阀的压力P1和P2。 利用这种结构，可以减少操作气体的浪费，并且提高相对于设定变化等的响应性。

公开(公告)号：US07353841B2

公开(公告)日：2008-04-08

申请号：US11295649

申请日：2005-12-07

申请人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

发明人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

IPC分类号： G05D11/13 ,  G05D16/20

CPC分类号： G05D16/206 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87877

摘要： Provided is a relative pressure control system has a simple configuration, but enables accurate regulation of a division ratio of an operation gas, and concurrently makes it possible to securely drain the operation gas from an operation gas pipeline in case of emergency. The system includes a plurality of air operated valves of a normally open type that are connected to an operation gas pipeline supplied with an operation gas; pressure sensors that are series connected to the respective air operated valves and that detect output pressures of the respective air operated valves; a controller that controls operation pressures of the respective air operated valves in accordance with the pressures detected by the pressure sensors; and a hard interlock solenoid valve that correlates the plurality of air operated valves to one another so that at least one of the plurality of air operated valves is normally opened. In the configuration, an opening of a specified one of the plurality of air operated valves is regulated, the operation gas is output at a predetermined division ratio.

摘要翻译： 提供一种相对压力控制系统具有简单的结构，但是能够精确地调节操作气体的分配比，并且在紧急情况下同时可以从操作气体管道可靠地排出操作气体。 该系统包括多个常开型气动阀，其连接到供给操作气体的操作气体管道; 压力传感器串联连接到相应的气动阀并且检测各个气动阀的输出压力; 控制器，其根据压力传感器检测到的压力来控制各个气动阀的操作压力; 以及将所述多个气动阀彼此关联使得所述多个气动阀中的至少一个通常打开的硬联锁电磁阀。 在这种构造中，调节多个气动阀中的指定的一个的开度，以预定的分配比率输出操作气体。

公开(公告)号：US20060124169A1

公开(公告)日：2006-06-15

申请号：US11296209

申请日：2005-12-08

申请人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

发明人： Kenetsu Mizusawa ,  Keiki Ito ,  Masahide Itoh

IPC分类号： E03B1/00 ,  G05D11/00

CPC分类号： F17D1/04 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/52 ,  G05D11/132 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069 ,  H01L21/67253 ,  Y10T137/0329 ,  Y10T137/0335 ,  Y10T137/0352 ,  Y10T137/2496 ,  Y10T137/87346

摘要： A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

摘要翻译： 用于将气体供给到其中处理基板的处理室中的气体供给单元包括多个气体供给源，用于混合从气体供给源供给的多个气体以形成气体混合物的混合管线， 用于将要供应到处理室中的多个位置的气体混合物进行分支的分支管线的多个，以及用于向在至少一条分支管线中流动的气体混合物供应特定附加气体的附加气体供应单元。 气体供应单元还包括用于分别调节分支管线中的气体流量的压力计和阀，以及压力比控制器，用于通过调节阀的开度来控制分支成分支管路的气体混合物以具有规定的压力比 基于通过使用压力计获得的测量结果。

公开(公告)号：US20060097644A1

公开(公告)日：2006-05-11

申请号：US11295649

申请日：2005-12-07

申请人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

发明人： Tetsujiro Kono ,  Hiroki Doi ,  Minoru Ito ,  Hideki Nagaoka ,  Keiki Ito ,  Hiroki Endo ,  Tsuyoshi Shimazu ,  Jun Hirose ,  Osamu Katsumata ,  Kazuyuki Miura ,  Takashi Kitazawa

IPC分类号： H01J7/24

CPC分类号： G05D16/206 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87877

摘要： Provided is a relative pressure control system has a simple configuration, but enables accurate regulation of a division ratio of an operation gas, and concurrently makes it possible to securely drain the operation gas from an operation gas pipeline in case of emergency. The system includes a plurality of air operated valves of a normally open type that are connected to an operation gas pipeline supplied with an operation gas; pressure sensors that are series connected to the respective air operated valves and that detect output pressures of the respective air operated valves; a controller that controls operation pressures of the respective air operated valves in accordance with the pressures detected by the pressure sensors; and a hard-interlock solenoid valve that correlates the plurality of air operated valves to one another so that at least one of the plurality of air operated valves is normally opened. In the configuration, an opening of a specified one of the plurality of air operated valves is regulated, the operation gas is output at a predetermined division ratio.

摘要翻译： 提供一种相对压力控制系统具有简单的结构，但是能够精确地调节操作气体的分配比，并且在紧急情况下同时可以从操作气体管道可靠地排出操作气体。 该系统包括多个常开型气动阀，其连接到供给操作气体的操作气体管道; 压力传感器串联连接到相应的气动阀并且检测各个气动阀的输出压力; 控制器，其根据压力传感器检测到的压力来控制各个气动阀的操作压力; 以及将所述多个气动阀彼此关联使得所述多个气动阀中的至少一个正常打开的硬联锁电磁阀。 在这种构造中，调节多个气动阀中的指定的一个的开度，以预定的分配比率输出操作气体。

公开(公告)号：US07481240B2

公开(公告)日：2009-01-27

申请号：US10863205

申请日：2004-06-09

申请人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

发明人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

IPC分类号： G05D11/13 ,  G05D16/20

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10T137/2499 ,  Y10T137/7722 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8733

摘要： A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

摘要翻译： 分压控制系统45包括从操作气体供给管44分支并且可变地控制操作气体的压力传感器3和分别连接到每个阀2的压力传感器3并且检测操作气体的压力的两个阀2， 以及控制器25，其基于压力传感器3的检测结果按比例地控制阀2的操作，从而相对控制两个阀的压力P1和P2。 利用这种结构，可以减少操作气体的浪费，并且提高相对于设定变化等的响应性。

公开(公告)号：US20050029369A1

公开(公告)日：2005-02-10

申请号：US10863205

申请日：2004-06-09

申请人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

发明人： Hideki Nagaoka ,  Hiroshi Koizumi ,  Jun Ooyabu ,  Tsuyoshi Shimazu ,  Hiroki Endo ,  Keiki Ito ,  Daisuke Hayashi

IPC分类号： B01J4/00 ,  H01L21/00 ,  B05B1/14

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10T137/2499 ,  Y10T137/7722 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8733

摘要： A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

摘要翻译： 分压控制系统45包括从操作气体供给管44分支并且可变地控制操作气体的压力传感器3和分别连接到每个阀2的压力传感器3并且检测操作气体的压力的两个阀2， 以及控制器25，其基于压力传感器3的检测结果按比例地控制阀2的操作，从而相对控制两个阀的压力P1和P2。 利用这种结构，可以减少操作气体的浪费，并且提高相对于设定变化等的响应性。

公开(公告)号：US5554249A

公开(公告)日：1996-09-10

申请号：US395303

申请日：1995-02-28

申请人： Makoto Hasegawa ,  Tsuyoshi Saito ,  Fumihiko Higuchi ,  Hideaki Amano ,  Katsunori Naitoh ,  Takashi Tozawa ,  Tatsuya Nakagome ,  Keiki Ito ,  Kouji Suzuki

发明人： Makoto Hasegawa ,  Tsuyoshi Saito ,  Fumihiko Higuchi ,  Hideaki Amano ,  Katsunori Naitoh ,  Takashi Tozawa ,  Tatsuya Nakagome ,  Keiki Ito ,  Kouji Suzuki

IPC分类号： C23C14/35 ,  C23C16/50 ,  H01J37/32 ,  H01L21/00 ,  C23C14/34 ,  C23C16/00

CPC分类号： H01L21/67167 ,  C23C14/35 ,  C23C16/50 ,  H01J37/32082 ,  H01J37/3266 ,  H01L21/67069 ,  H01L21/67196

摘要： A magnetron plasma etching system has a plurality of processing chambers connected to a common transfer chamber. Each processing chamber has a pair of counter electrodes for generating an electric field and a magnet mechanism for generating a magnetic field having an N-S axis crossing the electric field. All magnetic fields are rotated in the same plane. The rotation of the magnetic fields is controlled by a controller. When one of the magnetic fields is rotated, the other magnetic fields are rotated at equal speed such that the directions of N-S axes thereof are parallel and identical to that of the one of the magnetic fields.

摘要翻译： 磁控管等离子体蚀刻系统具有连接到公共传送室的多个处理室。 每个处理室具有用于产生电场的一对对电极和用于产生具有与电场交叉的N-S轴的磁场的磁体机构。 所有磁场都在同一平面内旋转。 磁场的旋转由控制器控制。 当其中一个磁场旋转时，其他磁场以相等的速度旋转，使得其N-S轴的方向平行且与一个磁场相同。