Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin
    1.
    发明授权
    Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin 有权
    用于形成含有含羟基的咔唑酚醛清漆树脂的抗蚀剂下层膜的组合物

    公开(公告)号:US09263285B2

    公开(公告)日:2016-02-16

    申请号:US13992864

    申请日:2011-12-05

    Abstract: There is provided a composition for forming a resist underlayer film having heat resistance for use in a lithography process in semiconductor device production. A composition for forming a resist underlayer film, comprising a polymer that contains a unit structure of formula (1) and a unit structure of formula (2) in a proportion of 3 to 97:97 to 3 in molar ratio: A method for producing a semiconductor device, including the steps of: forming an underlayer film using the composition for forming a resist underlayer film on a semiconductor substrate; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a patterned resist film and developing; etching the hard mask according to the patterned resist film; etching the underlayer film according to the patterned hard mask; and processing the semiconductor substrate according to the patterned underlayer film.

    Abstract translation: 提供了一种用于形成半导体器件制造中用于光刻工艺的具有耐热性的抗蚀剂下层膜的组合物。 一种形成抗蚀剂下层膜的组合物,其含有以式(1)的单元结构的聚合物和式(2)的单元结构,其比例为3至97:97至3的摩尔比。 半导体器件,包括以下步骤:使用在半导体衬底上形成抗蚀剂下层膜的组合物形成下层膜; 在下层膜上形成硬掩模; 进一步在硬掩模上形成抗蚀剂膜; 形成图案化的抗蚀剂膜并显影; 根据图案化的抗蚀剂膜蚀刻硬掩模; 根据图案化的硬掩模蚀刻下层膜; 以及根据图案化的下层膜处理半导体衬底。

    Integrated circuit device and electronic apparatus
    2.
    发明授权
    Integrated circuit device and electronic apparatus 有权
    集成电路器件和电子设备

    公开(公告)号:US08957884B2

    公开(公告)日:2015-02-17

    申请号:US12878354

    申请日:2010-09-09

    CPC classification number: G09G3/16 G09G3/344 G09G2310/0275

    Abstract: An integrated circuit device includes: a driving voltage output unit that outputs a driving voltage supplied to a segment electrode of an electro-optical panel; a display data storage unit that stores display data; and a driving waveform information output unit that outputs driving waveform information when a display state of the segment electrode is changed from a first display state corresponding to first display data to a second display state corresponding to second display data, wherein the driving voltage output unit outputs the driving voltage specified by the first display data and the second display data from the display data storage unit, and the driving waveform information from the driving waveform information output unit.

    Abstract translation: 集成电路装置包括:驱动电压输出单元,其输出提供给电光板的段电极的驱动电压; 存储显示数据的显示数据存储单元; 以及驱动波形信息输出单元,当所述分段电极的显示状态从对应于第一显示数据的第一显示状态改变为对应于第二显示数据的第二显示状态时,输出驱动波形信息,其中所述驱动电压输出单元输出 由第一显示数据指定的驱动电压和来自显示数据存储单元的第二显示数据,以及来自驱动波形信息输出单元的驱动波形信息。

    RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC SKELETON-CONTAINING CARBAZOLE RESIN
    3.
    发明申请
    RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC SKELETON-CONTAINING CARBAZOLE RESIN 有权
    含有含烯烃的卡巴唑树脂的耐下层膜成膜组合物

    公开(公告)号:US20140235060A1

    公开(公告)日:2014-08-21

    申请号:US14131011

    申请日:2012-07-05

    Abstract: There is provided a resist underlayer film used in lithography process that has a high n value and a low k value, and can effectively reduce reflection of light having a wavelength of 193 nm from the substrate in a three-layer process in which the resist underlayer film is used in combination with a silicon-containing intermediate layer. A resist underlayer film-forming composition used in lithography process including: a polymer containing a unit structure including a product obtained by reaction of a condensed heterocyclic compound and a bicyclo ring compound. The condensed heterocyclic compound is a carbazole compound or a substituted carbazole compound. The bicyclo ring compound is dicyclopentadiene, substituted dicyclopentadiene, tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene, or substituted tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene.

    Abstract translation: 提供了在光刻工艺中使用的抗蚀剂下层膜,其具有高n值和低k值,并且可以有效地减少在其中抗蚀剂底层的三层工艺中具有193nm波长的光的反射 膜与含硅中间层组合使用。 在光刻工艺中使用的抗蚀剂下层膜形成组合物,包括:包含通过稠合杂环化合物与双环化合物反应获得的产物的单元结构的聚合物。 稠合杂环化合物是咔唑化合物或取代的咔唑化合物。 双环环化合物是二环戊二烯,取代的二环戊二烯,四环[4.4.0.12,5.17,10]十二碳-3,8-二烯或取代的四环[4.4.0.12,5.17,10]十二碳-3,8-二烯。

    RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN
    5.
    发明申请
    RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN 审中-公开
    用于包含聚合物结构树脂的层析膜的膜下膜成膜组合物

    公开(公告)号:US20130189533A1

    公开(公告)日:2013-07-25

    申请号:US13825925

    申请日:2011-10-07

    Abstract: There is provided a resist underlayer film forming composition for forming a resist underlayer film providing heat resistance properties and hardmask characteristics. A resist underlayer film forming composition for lithography, comprising: a polymer containing a unit structure of Formula (1): O—Ar1  Formula (1) (in Formula (1), Ar1 is a C6-50 arylene group or an organic group containing a heterocyclic group), a unit structure of Formula (2): O—Ar2—O—Ar3-T-Ar4  Formula (2) (in Formula (2), Ar2, Ar3, and Ar4 are individually a C6-50 arylene group or an organic group containing a heterocyclic group; and T is a carbonyl group or a sulfonyl group), or a combination of the unit structure of Formula (1) and the unit structure of Formula (2). The organic groups of Ar1 and Ar2 containing arylene group may be organic groups containing a fluorene structure.

    Abstract translation: 提供了形成具有耐热性和硬掩模特性的抗蚀剂下层膜的抗蚀剂下层膜形成用组合物。 一种用于光刻的抗蚀剂下层膜形成组合物,其包含:含有式(1)的单元结构的聚合物:(1)(式(1)中,Ar 1为C 6-50亚芳基或有机 (2)的单元结构:式(2)中的:单价结构:式(2)中,Ar 2,Ar 3和Ar 4分别为C 6〜 -50亚芳基或含有杂环基的有机基团,T为羰基或磺酰基),或式(1)的单元结构与式(2)的单元结构的组合。 含有亚芳基的Ar 1和Ar 2的有机基团可以是含有芴结构的有机基团。

    COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING
    6.
    发明申请
    COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING 有权
    用于形成包含含有环氧树脂和芳族环的树脂的层压薄膜的组合物

    公开(公告)号:US20120142195A1

    公开(公告)日:2012-06-07

    申请号:US13389682

    申请日:2010-08-11

    CPC classification number: G03F7/091 G03F7/0752 G03F7/094

    Abstract: There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product (C) of an alicyclic epoxy polymer (A) with a condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B). The alicyclic epoxy polymer (A) may include a repeating structural unit of Formula (1): (T is a repeating unit structure containing an alicyclic ring in the polymer main chain; and E is an epoxy group or an organic group containing an epoxy group). The condensed-ring aromatic carboxylic acid and monocyclic aromatic carboxylic acid (B) may include a condensed-ring aromatic carboxylic acid (B1) and a monocyclic aromatic carboxylic acid (B2) in a molar ratio of B1:B2=3:7 to 7:3. The condensed-ring aromatic carboxylic acid (B1) may be 9-anthracenecarboxylic acid and the monocyclic aromatic carboxylic acid (B2) may be benzoic acid.

    Abstract translation: 提供了具有耐热性和蚀刻选择性的抗蚀剂下层膜。 一种用于形成用于光刻的抗蚀剂下层膜的组合物,其包含脂环式环氧聚合物(A)与稠环芳族羧酸和单环芳族羧酸(B)的反应产物(C)。 脂环族环氧聚合物(A)可以包括式(1)的重复结构单元:(T是在聚合物主链中含有脂环族的重复单元结构,E是环氧基或含有环氧基的有机基 )。 缩环芳族羧酸和单环芳香族羧酸(B)可以包括B1:B2 = 3:7〜7的摩尔比的缩环芳族羧酸(B1)和单环芳​​香族羧酸(B2) :3。 缩环芳族羧酸(B1)可以是9-蒽代羧酸,单环芳香羧酸(B2)可以是苯甲酸。

    COATING COMPOSITION AND PATTERN FORMING METHOD
    8.
    发明申请
    COATING COMPOSITION AND PATTERN FORMING METHOD 审中-公开
    涂料组合物和图案形成方法

    公开(公告)号:US20110117746A1

    公开(公告)日:2011-05-19

    申请号:US13054665

    申请日:2009-07-23

    Abstract: It is an object to provide a coating composition applicable to “reversal patterning” and suitable for forming a film covering a resist pattern. The object is accomplished by a coating composition for lithography comprising an organopolysiloxane, a solvent containing the prescribed organic solvent as a main component, and a quaternary ammonium salt or a quaternary phosphonium salt; or a coating composition for lithography comprising a polysilane, a solvent containing the prescribed organic solvent as a main component, and at least one additive selected from a group consisting of a crosslinking agent, a quaternary ammonium salt, a quaternary phosphonium salt, and a sulfonic acid compound, wherein the polysilane has, at a terminal thereof, a silanol group or a silanol group together with a hydrogen atom.

    Abstract translation: 本发明的目的是提供适用于“反转图案化”并适用于形成覆盖抗蚀剂图案的膜的涂料组合物。 该目的通过一种用于光刻的涂料组合物来实现,该涂料组合物包含有机聚硅氧烷,含有规定的有机溶剂作为主要成分的溶剂,以及季铵盐或季鏻盐; 或用于光刻的涂料组合物,其包含聚硅烷,含有规定的有机溶剂作为主要成分的溶剂和至少一种选自交联剂,季铵盐,季鏻盐和磺酸盐的添加剂 酸化合物,其中聚硅烷在其末端具有硅烷醇基或硅烷醇基以及氢原子。

    Information processing apparatus
    9.
    发明授权
    Information processing apparatus 失效
    信息处理装置

    公开(公告)号:US07277081B2

    公开(公告)日:2007-10-02

    申请号:US10281979

    申请日:2002-10-29

    Abstract: In a personal data assistant, a main body includes an input sheet, which is turnable between a first position where at least a part of a display unit of the personal data assistant is covered and a second position where the display unit is not covered. The input sheet has various types of keys formed thereon. When any one of the keys is pressed on the input sheet, a pressure is applied to an input device formed on the display unit, and an input coordinate is detected by the change of, for example, the resistance value of the input device. Since the surface of the display unit is not entirely covered with the input sheet, the display in the range of the display unit which is not covered with the input sheet is not made dark. Further, since the input device is not directly touched with a finger, the input device is prevented from being made dirty, and the display of the display unit under the input device is prevented from being difficult to be seen. Accordingly, the operability of the personal data assistant can be improved while displaying information clearly.

    Abstract translation: 在个人数据助理中,主体包括输入片,该输入片可以在个人数据助理的显示单元的至少一部分被覆盖的第一位置与不覆盖显示单元的第二位置之间转动。 输入表具有形成在其上的各种键。 当在输入页面上按压任何一个键时,对形成在显示单元上的输入装置施加压力,并且通过例如输入装置的电阻值的改变来检测输入坐标。 由于显示单元的表面不完全被输入纸覆盖,所以未被输入纸张覆盖的显示单元的范围内的显示不会变暗。 此外,由于输入装置不是用手指直接触摸,因此防止输入装置变脏,并且防止显示单元在输入装置下的显示难以被看到。 因此,可以在显示信息的同时改善个人数据助理的可操作性。

    Image-processing apparatus
    10.
    发明授权
    Image-processing apparatus 失效
    图像处理装置

    公开(公告)号:US06978045B1

    公开(公告)日:2005-12-20

    申请号:US09408366

    申请日:1999-09-29

    CPC classification number: H04N1/4092 G06K15/02 G06K15/1844

    Abstract: In an image processor on multi-level image data, an edge direction of a target pixel is discriminated from differences in density level between the target pixel and adjacent pixels thereof. A pixel is divided into a plurality of sub-pixels, and the image is formed in the unit of sub-pixels. The density level is set for each of the sub-pixels in the target pixel in accordance with the discrimination on the edge direction of the target pixel so that the center of gravity in density is changed in the target level. Then a character edge portion is reproduced more smoothly.

    Abstract translation: 在多级图像数据中的图像处理器中,目标像素的边缘方向与目标像素与其相邻像素之间的浓度级别的差异区分开。 像素被分成多个子像素,并且以子像素为单位形成图像。 根据对目标像素的边缘方向的鉴别,对目标像素中的每个子像素设定浓度级,使得浓度的重心在目标水平上变化。 然后更平滑地再现字符边缘部分。

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