Lithographic apparatus and device manufacturing method
    1.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US09013673B2

    公开(公告)日:2015-04-21

    申请号:US12953113

    申请日:2010-11-23

    IPC分类号: G03F7/20

    CPC分类号: G03F7/7085 G03F7/70341

    摘要: An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.

    摘要翻译: 提供一种浸没式光刻设备,其具有构造成支撑衬底的工作台; 用于传感器的传感器或目标设置在工作台的表面上,并且设置从工作台的边缘延伸的盖; 此外,提供了一种液体置换装置,其包括气体出口,该气体出口构造成将局部气体流引向传感器或靶,以便将来自传感器或靶的液体置于盖上并离开工作台。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:US20110129782A1

    公开(公告)日:2011-06-02

    申请号:US12953113

    申请日:2010-11-23

    IPC分类号: G03F7/20 G03B27/52

    CPC分类号: G03F7/7085 G03F7/70341

    摘要: An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.

    摘要翻译: 提供一种浸没式光刻设备,其具有构造成支撑衬底的工作台; 用于传感器的传感器或目标设置在工作台的表面上,并且设置从工作台的边缘延伸的盖; 此外,提供了一种液体置换装置,其包括气体出口,该气体出口构造成将局部气体流引向传感器或靶,以便将来自传感器或靶的液体置于盖上并离开工作台。