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    METHOD AND APPARATUS FOR MURA DETECTION AND METROLOGY
    2.
    发明申请
    METHOD AND APPARATUS FOR MURA DETECTION AND METROLOGY 有权
    MURA检测和方法的方法和装置

    公开(公告)号：US20090028423A1

    公开(公告)日：2009-01-29

    申请号：US12105568

    申请日：2008-09-08

    申请人： Torbjorn Sandstrom ,  Lars Stiblert

    发明人： Torbjorn Sandstrom ,  Lars Stiblert

    IPC分类号： G06K9/00

    CPC分类号： G01N21/956 ,  G01N2021/9513 ,  G02F1/1309 ,  G03F1/84 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/30121 ,  G06T2207/30148 ,  G06T2207/30164

    摘要： The invention addresses the lack of comprehensive and quantitative methods for measurements of unwanted visual “mura” effects in displays and image sensors. Mura is generated by errors that are significantly smaller than what is needed for the function of the device, and sometimes smaller than the random variations in the patterns or structures. Capturing essentially all mura defects in a workpiece in a short time requires a daunting combination of sensitivity, statistical data reduction and speed. The invention devices an inspection method, e.g. optical, which maximizes the sensitivity to mura effects and suppresses artifacts from the mura inspection hardware itself and from noise. It does so by scanning the sensor, e.g. a high-resolution camera, creating a region of high internal accuracy across the mura effects. One important example is for mura related to placement errors, where a stage with better than 10 nanometer precision within a 100 mm range is created. A sampling scheme reduces the data volume and separates between instrument errors and real defects based on their different geometrical signatures. The high-resolution camera scans sparse lines at an angle to the dominating directions of expected mura defects, creating extended sensor fields with high internal precision, and quantifying edge placements in small windows in said extended fields. The mura is classified and presented as type, location and severity.

    摘要翻译： 本发明解决了缺乏用于在显示器和图像传感器中测量不需要的视觉“mura”效果的全面和定量的方法。 Mura由显着小于设备功能所需的错误产生，并且有时小于图案或结构中的随机变化。 在短时间内捕获工件基本上所有的mura缺陷都需要灵敏度，统计数据减少和速度的惊人组合。 本发明装置检查方法，例如 光学，其最大限度地提高对mura效果的敏感性，并抑制mura检测硬件本身的伪影和噪声。 它通过扫描传感器，例如 一个高分辨率的摄像头，创造出一个高度内部准确度的区域的mura效果。 一个重要的例子就是与定位错误相关的mura，其中创建了100mm范围内优于10纳米精度的阶段。 采样方案可以减少数据量，并根据其不同的几何特征分离仪器误差和实际缺陷。 高分辨率摄像机以与预期mura缺陷的主导方向成一定角度扫描稀疏线，创建具有高内部精度的扩展传感器场，并在所述扩展场中的小窗口中量化边缘放置。 mura被分类并呈现为类型，位置和严重性。

    Method for measuring the position of a mark in a deflector system
    5.
    发明授权
    Method for measuring the position of a mark in a deflector system 有权
    用于测量偏转器系统中标记位置的方法

    公开(公告)号：US07912671B2

    公开(公告)日：2011-03-22

    申请号：US10587482

    申请日：2005-01-28

    申请人： Lars Stiblert ,  Peter Ekberg

    发明人： Lars Stiblert ,  Peter Ekberg

    IPC分类号： G01B7/00 ,  G06K9/48

    CPC分类号： G01B11/00

    摘要： The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern. The invention also relates to software implementing the method.

    摘要翻译： 本发明涉及一种用于确定偏转器系统中任意形状图案的坐标的方法。 该方法基本上包括以下步骤：沿着第一方向（X）移动图案，通过对在垂直方向（Y）上执行的微扫描次数进行计数来计算图案边缘的位置，直到检测到边缘 并且通过将计数的微扫描的数量与图案的移动速度相关联来确定坐标。 本发明还涉及实现该方法的软件。

    Method for Measuring the Position of a Mark in a Deflector System
    6.
    发明申请
    Method for Measuring the Position of a Mark in a Deflector System 有权
    用于测量偏转器系统中标记位置的方法

    公开(公告)号：US20080294367A1

    公开(公告)日：2008-11-27

    申请号：US10587482

    申请日：2005-01-28

    申请人： Lars Stiblert ,  Peter Ekberg

    发明人： Lars Stiblert ,  Peter Ekberg

    IPC分类号： G01B11/03

    CPC分类号： G01B11/00

    摘要： The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern. The invention also relates to software implementing the method.

    摘要翻译： 本发明涉及一种用于确定偏转器系统中任意形状图案的坐标的方法。 该方法基本上包括以下步骤：沿着第一方向（X）移动图案，通过对在垂直方向（Y）上执行的微扫描次数进行计数来计算图案边缘的位置，直到检测到边缘 并且通过将计数的微扫描的数量与图案的移动速度相关联来确定坐标。 本发明还涉及实现该方法的软件。

    Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface
    7.
    发明申请
    Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface 审中-公开
    在用于曝光设备的表面上书写图案并测量表面的物理性质的方法

    公开(公告)号：US20050088664A1

    公开(公告)日：2005-04-28

    申请号：US10692863

    申请日：2003-10-27

    申请人： Lars Stiblert ,  Peter Ekberg

    发明人： Lars Stiblert ,  Peter Ekberg

    IPC分类号： B41J2/00 ,  B41J2/435 ,  G01B11/24 ,  G01B11/30 ,  G01B21/04 ,  G03F7/20

    CPC分类号： G03F7/70783 ,  G01B11/306 ,  G01B21/045 ,  G03F7/70383

    摘要： The present invention relates to a method for writing a pattern on a surface intended for use in exposure equipment, including the steps of: arranging an object having a thickness (T) provided with a surface on a stage of a pattern generating apparatus, dividing the surface into a number of measurement points, where two adjacent measurement points being spaced a distance (P) apart not exceeding a predetermined maximum distance, determining the gradient of the surface at each measurement point, calculating a 2-dimensional local offset (d) in the x-y plane for each measurement point as a function of the gradient, and the thickness (T) of object, and correcting the pattern to be written on said surface by using the 2-dimensional local offset (d). The invention also relates to a method for measuring the physical properties of a surface.

    摘要翻译： 本发明涉及一种将图案写入用于曝光设备的表面上的方法，包括以下步骤：将具有表面的厚度（T）的物体排列在图案生成装置的台上， 表面分成多个测量点，其中两个相邻的测量点间隔距离（P）不超过预定的最大距离，确定每个测量点处的表面的坡度，计算二维局部偏移（d）在 作为梯度的函数的每个测量点的xy平面和对象的厚度（T），并且通过使用二维局部偏移（d）来校正要写在所述表面上的图案。 本发明还涉及一种用于测量表面的物理性质的方法。

    Method For Measuring The Position Of A Mark In A Deflector System
    10.
    发明申请
    Method For Measuring The Position Of A Mark In A Deflector System 审中-公开
    用于测量偏转器系统中标记位置的方法

    公开(公告)号：US20110307211A1

    公开(公告)日：2011-12-15

    申请号：US13053026

    申请日：2011-03-21

    申请人： Lars Stiblert ,  Peter Ekberg

    发明人： Lars Stiblert ,  Peter Ekberg

    IPC分类号： G06F15/00

    CPC分类号： G01B11/00

    摘要： The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern. The invention also relates to software implementing the method.

    摘要翻译： 本发明涉及一种用于确定偏转器系统中任意形状图案的坐标的方法。 该方法基本上包括以下步骤：沿着第一方向（X）移动图案，通过对在垂直方向（Y）上执行的微扫描次数进行计数来计算图案边缘的位置，直到检测到边缘 并且通过将计数的微扫描的数量与图案的移动速度相关联来确定坐标。 本发明还涉及实现该方法的软件。