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16 条记录 (耗时 0.038 秒)

    MEMS structure with raised electrodes
    1.
    发明授权
    MEMS structure with raised electrodes 有权

    公开(公告)号：US06791742B2

    公开(公告)日：2004-09-14

    申请号：US10700734

    申请日：2003-11-03

    申请人： Bryan P. Staker ,  Lawrence P. Muray ,  Andres Fernandez

    发明人： Bryan P. Staker ,  Lawrence P. Muray ,  Andres Fernandez

    IPC分类号： G02B2600

    CPC分类号： G02B26/0841 ,  B81B3/0086 ,  B81B2201/042

    摘要： In an electrostatically controlled deflection apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric or controllably resistive substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to mitigate the effects of uncontrolled dielectric surface potentials between the MEMS elements and the electrostatic actuation electrodes, the mechanism being raised electrodes relative to the dielectric or controllably resistive surface of the substrate. The aspect ratio of the gaps between elements (element height to element separation ratio) is at least 0.1 and preferably at least 0.5 and preferably between 0.75 and 2.0 with a typical choice of about 1.0, assuming a surface fill factor of 50% or greater. Higher aspect ratios at these fill factors are believed not to provide more than marginal improvement.

    High precision flexure stage
    2.
    发明授权
    High precision flexure stage 失效
    高精度弯曲台

    公开(公告)号：US06555829B1

    公开(公告)日：2003-04-29

    申请号：US09481103

    申请日：2000-01-10

    申请人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

    发明人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

    IPC分类号： G01B902

    CPC分类号： B23Q1/34 ,  B23Q1/621 ,  H01J37/023 ,  H01J2237/20264 ,  H01L21/68

    摘要： Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.

    摘要翻译： 公开了一种用于在有限的旅行范围内（例如，100mum）精确地定位物体的定位台。 作为示例，该级可用于将诸如场致发射体的电子源定位在电子束微柱中。 舞台包括限定通道以允许沿着第一轴弯曲的块。 该块还限定另一个通道，以允许沿垂直于第一轴线的第二轴线弯曲。 使用通道中的致动器来弯曲块的一部分，由块支撑的物体可精确地定位在由第一和第二轴限定的水平平面中的期望位置。

    Integrated microcolumn and scanning probe microscope arrays
    3.
    发明授权
    Integrated microcolumn and scanning probe microscope arrays 失效
    集成微柱和扫描探针显微镜阵列

    公开(公告)号：US06369385B1

    公开(公告)日：2002-04-09

    申请号：US09305975

    申请日：1999-05-05

    申请人： Lawrence P. Muray ,  Ho-Seob Kim ,  T. H. Philip Chang

    发明人： Lawrence P. Muray ,  Ho-Seob Kim ,  T. H. Philip Chang

    IPC分类号： H01J3728

    CPC分类号： G01Q30/02 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/2818 ,  Y10S977/707 ,  Y10S977/849 ,  Y10S977/86 ,  Y10S977/869 ,  Y10S977/874 ,  Y10S977/881 ,  Y10S977/887

    摘要： An apparatus for surface inspection and processing of a wafer includes a microcolumn and an associated scanning probe microscope. The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.

    摘要翻译： 用于表面检查和处理晶片的装置包括微柱和相关联的扫描探针显微镜。 微柱可以以相对高的分辨率高速扫描晶片，而扫描探针显微镜提供晶片的高度局部化区域的原子分辨率。 微柱和扫描探针显微镜可以由相同的基底部分制成。 另外，微柱和扫描探针显微镜可以是微柱阵列和/或扫描探针显微镜的一部分。 该装置可用于成像，光刻和光谱学。

    Method for selectively scaling a field emission electron gun and device formed thereby
    4.
    发明授权
    Method for selectively scaling a field emission electron gun and device formed thereby 失效
    用于选择性地缩放由其形成的场致发射电子枪和装置的方法

    公开(公告)号：US5155412A

    公开(公告)日：1992-10-13

    申请号：US706035

    申请日：1991-05-28

    申请人： Tai-Hon P. Chang ,  Dieter P. Kern ,  Lawrence P. Muray

    发明人： Tai-Hon P. Chang ,  Dieter P. Kern ,  Lawrence P. Muray

    IPC分类号： G01Q60/10 ,  H01J3/02

    CPC分类号： B82Y15/00 ,  H01J3/021

    摘要： The present invention is directed to a method for selectively scaling the dimensions of a field emission electron gun. The electron gun includes a field emission tip followed by a dual electrode immersion lens. The lens consists of two planar electrodes separated by a dielectric layer. A well defined circular hole is present at the center of each electrode and the dielectric layer. A high scaling factor is applied to the region consisting of the first electrode and the emission tip, reducing the first electrode thickness and bore diameter and the distance between the tip and first electrode to the micrometer range. A weaker scaling factor is applied to the bore diameter of the second electrode and the spacing between the electrodes such that the second electrode bore diameter and distance between the electrodes are approximately equal and are greater than the first electrode thickness and bore diameter and the distance between the tip and first electrode.

    摘要翻译： 本发明涉及一种用于选择性地缩放场致发射电子枪尺寸的方法。 电子枪包括场发射尖端，后面是双电极浸没透镜。 该透镜由两层由电介质层隔开的平面电极组成。 在每个电极和电介质层的中心存在明确的圆形孔。 将高比例因子应用于由第一电极和发射尖端组成的区域，将第一电极厚度和孔直径以及尖端和第一电极之间的距离减小到微米范围。 将较小的比例因子应用于第二电极的孔径和电极之间的间隔，使得第二电极孔直径和电极之间的距离近似相等并且大于第一电极厚度和孔直径以及第二电极之间的距离 尖端和第一电极。