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公开(公告)号:US20070141486A1
公开(公告)日:2007-06-21
申请号:US11312650
申请日:2005-12-21
IPC分类号: G03C5/00
CPC分类号: G03F7/70466 , G03F7/70558 , G03F7/70625
摘要: In a double exposure process to print features at a reduced pitch, the critical dimension of features printed in the first exposure is measured and used as a target for the second exposure.
摘要翻译: 在以减小的间距打印特征的双重曝光过程中,测量在第一曝光中印刷的特征的临界尺寸并将其用作第二曝光的目标。