公开(公告)号：US20090181322A1

公开(公告)日：2009-07-16

申请号：US12163649

申请日：2008-06-27

申请人： Hiroshi Ito ,  Daniel P. Sanders ,  Linda Sundberg

发明人： Hiroshi Ito ,  Daniel P. Sanders ,  Linda Sundberg

IPC分类号： G03F7/004

CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

摘要翻译： 本发明涉及包含光致抗蚀剂聚合物和含氟聚合物的组合物。 在一个实施方案中，含氟聚合物包含具有选自脂环族双六氟异丙醇和芳基双 - 六氟异丙醇的侧基的第一单体，优选选自氟化苯乙烯和氟化乙烯基醚的第二单体。 本发明组合物具有改进的与浸渍光刻中使用的高折射率烃流体的后退接触角，从而提供浸没式光刻中的改进的性能。

公开(公告)号：US20090179001A1

公开(公告)日：2009-07-16

申请号：US12013444

申请日：2008-01-12

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

IPC分类号： B32B37/14 ,  B32B38/10

CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。

公开(公告)号：US20080026330A1

公开(公告)日：2008-01-31

申请号：US11868320

申请日：2007-10-05

申请人： Robert Allen ,  Phillip Brock ,  Dario Gil ,  William Hinsberg ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

发明人： Robert Allen ,  Phillip Brock ,  Dario Gil ,  William Hinsberg ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

IPC分类号： G03C5/00 ,  C08F20/06

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

公开(公告)号：US20070254237A1

公开(公告)日：2007-11-01

申请号：US11380782

申请日：2006-04-28

申请人： ROBERT ALLEN ,  PHILLIP BROCK ,  SEAN BURNS ,  DARIO GOLDFARB ,  DAVID MEDEIROS ,  DIRK PFEIFFER ,  MATT PINNOW ,  RATNAM SOORIYAKUMARAN ,  LINDA SUNDBERG

发明人： ROBERT ALLEN ,  PHILLIP BROCK ,  SEAN BURNS ,  DARIO GOLDFARB ,  DAVID MEDEIROS ,  DIRK PFEIFFER ,  MATT PINNOW ,  RATNAM SOORIYAKUMARAN ,  LINDA SUNDBERG

IPC分类号： G03C1/00

CPC分类号： G03F7/091 ,  G03F7/11 ,  G03F7/2041

摘要： Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 Å/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.

摘要翻译： 公开了一种面漆组合物，其包含在含水碱性显影剂中溶解速率至少为1500埃的聚合物和至少一种溶剂。 面漆组合物可用于在基板上的材料层上涂覆光致抗蚀剂层，例如半导体芯片。 还公开了在涂覆的基材的材料层中形成图案的方法。

公开(公告)号：US20070023870A1

公开(公告)日：2007-02-01

申请号：US11190644

申请日：2005-07-27

申请人： Geraud Dubois ,  James Hedrick ,  Ho-Cheol Kim ,  Victor Lee ,  Teddie Magbitang ,  Robert Miller ,  Muthumanickam Sankarapandian ,  Linda Sundberg ,  Willi Volksen

发明人： Geraud Dubois ,  James Hedrick ,  Ho-Cheol Kim ,  Victor Lee ,  Teddie Magbitang ,  Robert Miller ,  Muthumanickam Sankarapandian ,  Linda Sundberg ,  Willi Volksen

IPC分类号： H01L23/58 ,  H01L21/4763

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US08491965B2

公开(公告)日：2013-07-23

申请号：US12060516

申请日：2008-04-01

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

IPC分类号： B05D5/00 ,  B05D5/12

CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

公开(公告)号：US20120288797A1

公开(公告)日：2012-11-15

申请号：US13543852

申请日：2012-07-08

申请人： Hiroshi Ito ,  Daniel Paul Sanders ,  Linda Sundberg

发明人： Hiroshi Ito ,  Daniel Paul Sanders ,  Linda Sundberg

IPC分类号： G03F7/004 ,  G03F7/075

CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

摘要翻译： 本发明涉及包含光致抗蚀剂聚合物和含氟聚合物的组合物。 在一个实施方案中，含氟聚合物包含具有选自脂环族双六氟异丙醇和芳基双 - 六氟异丙醇的侧基的第一单体，优选选自氟化苯乙烯和氟化乙烯基醚的第二单体。 本发明组合物具有改进的与浸渍光刻中使用的高折射率烃流体的后退接触角，从而提供浸没式光刻中的改进的性能。

公开(公告)号：US07763319B2

公开(公告)日：2010-07-27

申请号：US12013138

申请日：2008-01-11

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

IPC分类号： B05D5/00 ,  B05D5/12

CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。

公开(公告)号：US20070254236A1

公开(公告)日：2007-11-01

申请号：US11380744

申请日：2006-04-28

申请人： ROBERT ALLEN ,  PHILLIP BROCK ,  CARL LARSON ,  RATNAM SOORIYAKUMARAN ,  LINDA SUNDBERG ,  HOA TRUONG

发明人： ROBERT ALLEN ,  PHILLIP BROCK ,  CARL LARSON ,  RATNAM SOORIYAKUMARAN ,  LINDA SUNDBERG ,  HOA TRUONG

IPC分类号： G03C1/00

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/0752 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

摘要： A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.

摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含酸惰性化合物。 面漆材料还包括聚合物或低聚物或保持架结构，其与成像层混合可忽略，并且可溶于碱性显影液。 还公开了在基材上形成图案化材料层的方法和包含面漆材料的涂布基材。

公开(公告)号：US07989026B2

公开(公告)日：2011-08-02

申请号：US12013444

申请日：2008-01-12

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

IPC分类号： B05D5/00

CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。