公开(公告)号：US08045138B2

公开(公告)日：2011-10-25

申请号：US12198719

申请日：2008-08-26

申请人： Makoto Ogusu

发明人： Makoto Ogusu

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.

摘要翻译： 曝光装置通过液体使基板曝光。 该装置包括保持基板并移动的台，以及设置在台上并围绕基板的周边并支撑液体与支撑基板的支撑板。 支撑板包括在其表面上形成斥液剂的防液结构部分，并且其表面上的平坦部分形成为对液体的拒胶性。

公开(公告)号：US20100239963A1

公开(公告)日：2010-09-23

申请号：US12729398

申请日：2010-03-23

申请人： Makoto Ogusu

发明人： Makoto Ogusu

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/24 ,  G03F1/50

摘要： An exposure mask of the present invention is an exposure mask for patterning a three-dimensional shape on a resist. The exposure mask comprises a first region where a plurality of openings having a first size smaller than a resolution limit of an exposure apparatus are arranged, a second region where a plurality of openings having a second size smaller than the first size are arranged, and a third region where the plurality of openings having the first size and the plurality of openings having the second size are mixed and arranged between the first region and the second region.

摘要翻译： 本发明的曝光掩模是用于在抗蚀剂上图形化三维形状的曝光掩模。 曝光掩模包括其中布置有具有小于曝光设备的分辨率极限的第一尺寸的多个开口的第一区域，布置具有小于第一尺寸的第二尺寸的多个开口的第二区域，以及 第三区域，其中具有第一尺寸的多个开口和具有第二尺寸的多个开口被混合并布置在第一区域和第二区域之间。

公开(公告)号：US6043104A

公开(公告)日：2000-03-28

申请号：US339539

申请日：1999-06-24

申请人： Mamoru Uchida ,  Makoto Ogusu

发明人： Mamoru Uchida ,  Makoto Ogusu

IPC分类号： H01S5/062 ,  H01S5/0625 ,  H01S5/10 ,  H01S5/125 ,  H01S5/34 ,  H01S5/40 ,  H01S5/50 ,  H01L21/00

CPC分类号： B82Y20/00 ,  H01S5/06258 ,  H01S5/1021 ,  H01S5/06236 ,  H01S5/1017 ,  H01S5/125 ,  H01S5/3404 ,  H01S5/4031 ,  H01S5/4087 ,  H01S5/5036

摘要： A fabrication method of a semiconductor laser capable of controlling a polarization mode of output light is disclosed. In the fabrication method, after two laser portions are independently formed, the laser portions are positioned to be optically coupled to each other. In another fabrication method of the laser, after at least portions of two laser portions are separately formed, an irregularly-formed portion at a boundary portion therebetween is removed. The fabrication method can be facilitated and a degree of freedom in the polarization control can be increased, since the two laser portions are separately formed.

摘要翻译： 公开了一种能够控制输出光的偏振模式的半导体激光器的制造方法。 在制造方法中，在独立地形成两个激光部分之后，激光部分被定位成彼此光学耦合。 在激光的另一制造方法中，在两个激光部分的至少部分分开形成之后，在其间的边界部分处不规则地形成部分被去除。 由于两个激光部分分别形成，所以可以促进制造方法并且可以提高偏振控制的自由度。

公开(公告)号：US20100118289A1

公开(公告)日：2010-05-13

申请号：US12605951

申请日：2009-10-26

申请人： Makoto Ogusu

发明人： Makoto Ogusu

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03B27/32 ,  G03F7/70341 ,  G03F7/7095

摘要： A member of an immersion exposure apparatus for exposing an image of a pattern of an original on a substrate via a liquid, and configured to be in contact with the liquid, includes a base portion, and a plurality of protruded portions provided on the base portion, wherein a contact angle θ of a material of a surface of the protruded portions before the protruded portions are exposed with light from a light source is larger than 90 degrees with respect to the liquid, and wherein, a value obtained by dividing a sum of a surface area of a face of the base portion on which the plurality of protruded portions are provided and the surface area of the plurality of protruded portions, by an area of the face of the base portion on which the plurality of protruded portions are provided, is r, r>1/|cos θ| is satisfied.

摘要翻译： 浸渍曝光装置的构件，其用于经由液体经由液体将原稿的图案的图像曝光并且被配置为与液体接触的部件包括基部和设置在基部上的多个突出部 ，其中接触角＆ 在来自光源的光暴露突出部分之前的突出部分的表面的材料相对于液体大于90度，并且其中，通过将表面的表面积之和除以 通过设置有多个突出部的基部的面的面积和多个突出部的表面积，设有多个突出部的基部的面积为r，r> 1 / | cos＆thetas; | 满意

公开(公告)号：US20060274297A1

公开(公告)日：2006-12-07

申请号：US11438348

申请日：2006-05-23

申请人： Makoto Ogusu

发明人： Makoto Ogusu

IPC分类号： G03B27/72

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7019

摘要： An exposure apparatus includes a projection optical system configured to project a reticle pattern onto a plate by using a light from a light source, a liquid being filled in a space between the projection optical system and the plate so that the plate is exposed through the projection optical system and the liquid, and a photo detector unit configured to detect the light via the projection optical system and the liquid, wherein the photo detector unit includes a diffuser configured to diffuse the light, a detector configured to detect the light that has been diffused by the diffuser, and a substrate configured to prevent the liquid from contacting the detector, and to introduce the light to the diffuser.

摘要翻译： 曝光装置包括投影光学系统，其被配置为通过使用来自光源的光将光罩图案投影到板上，液体被填充在投影光学系统和板之间的空间中，使得板通过突起 光学系统和液体;以及光检测器单元，被配置为经由投影光学系统和液体检测光，其中光电检测器单元包括扩散器，其配置成扩散光;检测器，被配置为检测被扩散的光 以及被配置为防止液体与检测器接触并将光引入扩散器的基板。

公开(公告)号：US06652781B2

公开(公告)日：2003-11-25

申请号：US09754311

申请日：2001-01-05

申请人： Hideo Kato ,  Hiroshi Maehara ,  Makoto Ogusu

发明人： Hideo Kato ,  Hiroshi Maehara ,  Makoto Ogusu

IPC分类号： B29D1100

CPC分类号： B29D11/00769 ,  B29D11/00009 ,  G02B3/00 ,  G02B5/1852 ,  G03F7/70058 ,  G03F7/70241

摘要： In a method for manufacture of an optical element, a thin film is formed on a surface, such as a grating surface, an aspherical surface or a spherical surface, formed on a mold. Then, a substrate is bonded to the thin film. Subsequently, the thin film and the substrate are separated from the mold.

摘要翻译： 在制造光学元件的方法中，在形成在模具上的表面，例如光栅表面，非球面或球面上形成薄膜。 然后，将基板粘合到薄膜上。 随后，将薄膜和基底与模具分离。

公开(公告)号：US6083650A

公开(公告)日：2000-07-04

申请号：US105047

申请日：1998-06-26

申请人： Makoto Ogusu ,  Kenji Saitoh

发明人： Makoto Ogusu ,  Kenji Saitoh

IPC分类号： G02B5/18 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70425 ,  G03F7/70433 ,  G03F9/70

摘要： A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and-exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.

摘要翻译： 公开了一种通过使用光刻工艺制造具有同心图案的元件的方法，其中该方法包括分别制备具有对应于图案的扇形区域的扇形图案的掩模，该扇形图案可以通过划分扇形区域来限定扇形区域 所述图案与所述图案同心的至少一个圆圈以提供多个区域，然后通过分别使用对应于所述区域的掩模分别对每个区域进行等角度划分和曝光与多个区域对应的基板的区域，同时 以规则的角度旋转基板。

公开(公告)号：US20130313417A1

公开(公告)日：2013-11-28

申请号：US13983754

申请日：2012-01-25

申请人： Makoto Ogusu

发明人： Makoto Ogusu

IPC分类号： G01J1/42 ,  B29D11/00

CPC分类号： G01J1/42 ,  B01L3/502707 ,  B01L2200/0689 ,  B01L2300/0654 ,  B01L2300/0816 ,  B01L2300/0877 ,  B01L2300/1827 ,  B29D11/00 ,  G01N21/0332 ,  G01N21/05 ,  G01N21/645 ,  G01N2021/0346 ,  G01N2201/064

摘要： A light emission detection device having a flow path from which light to be detected is emitted is provided. The device includes a detection-side substrate having a joining surface and a detection surface provided opposite the joining surface, the joining surface having a depression and a light-shielding film provided over an area excluding the depression, the depression forming the flow path, the detection surface transmitting the light emitted from the flow path; and a wiring-side substrate having a joining surface and a conductive pattern provided with a varying thickness on the joining surface, the joining surface of the wiring-side substrate joining the joining surface of the detection-side substrate. In the area over which the light-shielding film is provided, adhesive is provided with a thickness corresponding to the varying thickness of the conductive pattern and the detection-side substrate and the wiring-side substrate are closely joined to each other with the adhesive.

摘要翻译： 提供一种发光检测装置，其具有从其被发射的光的流路。 该装置包括检测侧基板，其具有接合面和与接合面相对设置的检测面，所述接合面具有设置在不包括凹部的区域上的凹部和遮光膜，形成流路的凹部， 检测表面透射从所述流路发射的光; 以及布线侧基板，其具有接合面和在接合面上具有变化厚度的导电图案，所述布线侧基板的接合面与检测侧基板的接合面接合。 在设置有遮光膜的区域中，粘合剂具有与导电图案的变化厚度对应的厚度，并且检测侧基板和布线侧基板用粘合剂彼此紧密接合。

公开(公告)号：US20070153251A1

公开(公告)日：2007-07-05

申请号：US11617487

申请日：2006-12-28

申请人： Makoto OGUSU

发明人： Makoto OGUSU

IPC分类号： G03B27/54

CPC分类号： G03F9/7026 ,  G03F9/7076 ,  G03F9/7088 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： A sensor unit includes a substrate that has a first mark, and a second mark used to specify a position of the first mark, a sensor for detecting light that has transmitted through the first mark and the substrate, and a light shielding portion, provided between the second mark and the sensor, for shielding the light from the second mark against the sensor.

摘要翻译： 传感器单元包括具有第一标记的基板和用于指定第一标记的位置的第二标记，用于检测透过第一标记的光的传感器和基板;以及遮光部， 第二标记和传感器，用于将来自第二标记的光屏蔽在传感器上。

公开(公告)号：US06930834B2

公开(公告)日：2005-08-16

申请号：US10023689

申请日：2001-12-21

申请人： Makoto Ogusu ,  Yuichi Iwasaki

发明人： Makoto Ogusu ,  Yuichi Iwasaki

IPC分类号： C23F1/02 ,  G02B5/18 ,  G03F1/52 ,  G03F1/70 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

CPC分类号： G02B5/1857 ,  C23F1/02 ,  G03F7/0005 ,  G03F7/0035

摘要： A method of manufacturing a diffractive optical element, including a process for forming a resist mask of blazed shape upon a substrate and for etching the substrate by use of the resist mask so that the blazed shape is transferred to the substrate. The method includes a process for forming, before the etching, an element being effective to prevent a taper shape, to be produced at an edge of the blazed shape of the resist mask, from being transformed to the substrate.

摘要翻译： 一种制造衍射光学元件的方法，包括在衬底上形成闪耀形状的抗蚀剂掩模并通过使用抗蚀剂掩模蚀刻衬底的工艺，使得闪耀形状被转印到衬底。 该方法包括在蚀刻之前形成有效防止在抗蚀剂掩模的闪耀形状的边缘处产生的锥形形状的元件被转变为基板的工艺。