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公开(公告)号：US20060139585A1
公开(公告)日：2006-06-29
申请号：US11022936
申请日：2004-12-28
IPC分类号： G03B27/68
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本上垂直于光轴的轴线的局部扭矩。
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公开(公告)号：US20050122490A1
公开(公告)日：2005-06-09
申请号：US10729376
申请日：2003-12-08
申请人： Bernardus Luttikhuis , Pertrus Bartray , Wilhelmus Box , Martinus Hendrikus Leenders , Marc Maria Van Der Wijst
发明人： Bernardus Luttikhuis , Pertrus Bartray , Wilhelmus Box , Martinus Hendrikus Leenders , Marc Maria Van Der Wijst
IPC分类号： G21K5/02 , F16F15/04 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70858
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.
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