-
公开(公告)号：US20080083878A1
公开(公告)日：2008-04-10
申请号：US11544931
申请日：2006-10-10
申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
发明人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
IPC分类号： G01J1/42
CPC分类号： G03F7/70925
摘要： A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
摘要翻译： 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投影到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对较低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。
-
公开(公告)号：US08717535B2
公开(公告)日：2014-05-06
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投射到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
-
3.发明申请公开(公告)号：US20090231707A1
公开(公告)日：2009-09-17
申请号：US12403233
申请日：2009-03-12
申请人： Dirk Heinrich EHM , Stephan MUELLENDER , Thomas STEIN , Johannes Hubertus Josephina MOORS , Bastiaan Theodoor WOLSCHRIJN , Dieter KRAUS , Richard VERSLUIS , Marcus Gerhardus Hendrikus MEIJERINK
发明人： Dirk Heinrich EHM , Stephan MUELLENDER , Thomas STEIN , Johannes Hubertus Josephina MOORS , Bastiaan Theodoor WOLSCHRIJN , Dieter KRAUS , Richard VERSLUIS , Marcus Gerhardus Hendrikus MEIJERINK
IPC分类号： B60R1/06
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
摘要翻译： 光学装置，特别是用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个特别是反射的光学元件（4至10,12,14.1至14.6）; 至少一个用于在所述壳体（2）的内部空间（15）中产生真空的真空发生单元（3）; 以及布置在所述壳体（2）的内部空间（15）中并且至少包围所述光学元件（4）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1至18.10） 至10,12,14.1至14.5），其中污染减少单元与真空壳体（18.1至18.10）相关联，该污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于内部空间（15）中的污染物质的分压紧邻光学表面（17,17.1,17.2）。
-
公开(公告)号：US20080111981A1
公开(公告)日：2008-05-15
申请号：US11847928
申请日：2007-08-30
申请人： Huibert VISSER , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi Andre Maria Schreel , Cornelis Cornelia De Bruijn
发明人： Huibert VISSER , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi Andre Maria Schreel , Cornelis Cornelia De Bruijn
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
摘要翻译： 一个系统用于执行快速和慢速的应用，例如快速应用可以进行脉冲修整。 该系统包括辐射源，电光调制器和分束器。 辐射源被配置为产生偏振的辐射束。 由结晶石英形成的电光调制器被配置成调制辐射束。 分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。
-
5.发明申请Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control 有权包括允许剂量控制的多个光路的激光束调节系统公开(公告)号：US20080291417A1
公开(公告)日：2008-11-27
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译： 一种辐射束调节系统，包括至少三个光路，其中辐射被调节。
-
公开(公告)号：US08382301B2
公开(公告)日：2013-02-26
申请号：US12403233
申请日：2009-03-12
申请人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
发明人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
-
公开(公告)号：US07826037B2
公开(公告)日：2010-11-02
申请号：US11847928
申请日：2007-08-30
申请人： Huibert Visser , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi André Maria Schreel , Cornelis Cornelia De Bruijn
发明人： Huibert Visser , Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink , Koenraad Remi André Maria Schreel , Cornelis Cornelia De Bruijn
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
摘要翻译： 一个系统用于执行快速和慢速的应用，例如快速应用可以进行脉冲修整。 该系统包括辐射源，电光调制器和分束器。 辐射源被配置为产生偏振的辐射束。 由结晶石英形成的电光调制器被配置成调制辐射束。 分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。
-
公开(公告)号：US20090244506A1
公开(公告)日：2009-10-01
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件的阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
-
9.发明授权Laser beam conditioning system comprising multiple optical paths allowing for dose control 有权激光束调节系统包括允许剂量控制的多个光路公开(公告)号：US07714986B2
公开(公告)日：2010-05-11
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译： 一种辐射束调节系统，包括至少三个光路，其中辐射被调节。
-
公开(公告)号：US07671347B2
公开(公告)日：2010-03-02
申请号：US11544931
申请日：2006-10-10
申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
发明人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
IPC分类号： G21K5/00
CPC分类号： G03F7/70925
摘要： A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
摘要翻译： 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投影到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对较低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.043 秒)
