公开(公告)号：US08405051B2

公开(公告)日：2013-03-26

申请号：US12997149

申请日：2009-06-09

申请人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

发明人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC分类号： G03F7/20

CPC分类号： G03F7/70925

摘要： A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

摘要翻译： 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包括H2，D2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。

公开(公告)号：US08400627B2

公开(公告)日：2013-03-19

申请号：US12922721

申请日：2009-03-11

申请人： Martin Jacobus Johan Jak ,  Theodorus Johannes Petrus Van Den Biggelaar ,  Eduard Johannes Meijer ,  Eugene Timmering

发明人： Martin Jacobus Johan Jak ,  Theodorus Johannes Petrus Van Den Biggelaar ,  Eduard Johannes Meijer ,  Eugene Timmering

IPC分类号： G01J1/42

CPC分类号： G01J1/06 ,  G01J1/02 ,  G01J1/0204 ,  G01J1/0411 ,  G01J1/0437 ,  G01J1/0448 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/0229 ,  G01J3/0237 ,  G01J3/0256 ,  G01J3/06 ,  G01J3/505 ,  G01J3/51 ,  G01J3/513 ,  G02B13/22 ,  G02B26/004

摘要： Proposed is a light sensor (1), comprising at least one wavelength selective photo-detector (10), a lens (20) and an aperture (30).The wavelength selective photo-detector allows detecting light within a predefined wavelength range falling on the sensor. The lens project light on the photo-detector and the aperture defines a field of view of the light sensor. The photo-detector (10), the lens (20), and the aperture (30) are arranged in a telecentric configuration. Advantageously, this allows light to impinge on the wavelength selective photo-detector within a predefined range of angles irrespective of the direction of the light incident on the aperture, thus removing the angle dependent response of the wavelength selective photo-detector.

摘要翻译： 提出了一种光传感器（1），包括至少一个波长选择性光电检测器（10），透镜（20）和孔径（30）。波长选择光电检测器允许检测在预定波长范围内的光 传感器。 光学检测器和光圈上的透镜投射光限定了光传感器的视场。 光检测器（10），透镜（20）和孔（30）以远心配置布置。 有利的是，这允许光在预定范围的角度内照射波长选择性光检测器，而与入射在孔径上的光的方向无关，从而消除波长选择性光检测器的角度相关响应。

公开(公告)号：US20100328639A1

公开(公告)日：2010-12-30

申请号：US12826459

申请日：2010-06-29

申请人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

发明人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Denis Alexandrovich Glushkov ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/72 ,  G02B5/20 ,  B29D11/00

CPC分类号： G03B27/72 ,  G02B5/204 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride Si3N4, or silicon dioxide SiO2 is provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures. The diffusion barrier layer may also serve as a hydrogen-resistant layer on parts of the semiconductor which are not beneath the reflective layer, and/or enhance emissivity for removal of heat from the structure.

摘要翻译： 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔以便透射极紫外辐射并抑制第二类辐射的透射的滤光器部分。 孔可以通过各向异性蚀刻工艺在诸如硅的载体材料中制成，并且覆盖有诸如Mo金属，Ru金属，TiN或RuO的反射层。 在金属和半导体之间设置有诸如氮化硅Si 3 N 4或二氧化硅SiO 2的扩散阻挡层，以防止金属在升高的温度下扩散和硅化。 扩散阻挡层还可以在半导体的不在反射层下面的部分上用作耐氢层，和/或增加用于从结构去除热量的发射率。

公开(公告)号：US20080265802A1

公开(公告)日：2008-10-30

申请号：US12097524

申请日：2006-12-13

申请人： Bartel Marinus Van de Sluis ,  Galileo June Destura ,  Martin Jacobus Johan Jak

发明人： Bartel Marinus Van de Sluis ,  Galileo June Destura ,  Martin Jacobus Johan Jak

IPC分类号： G05F1/10

CPC分类号： H05B33/08 ,  H05B37/0272

摘要： A light panel (115, 215, 403, 503, 513, 603, 605) having a predetermined number of emitted color options and a processor (113, 213) operably coupled to the light panel (115, 215, 403, 503, 513, 603, 605). The processor (113, 213) responds to a first color selection actuation by controlling the light panel (115, 215, 403, 503, 513, 603, 605) to display each of the predetermined emitted light options within different portions of the light panel (115, 215, 403, 503, 513, 603, 605). Thereafter, the processor (113, 213) responds to a second color selection actuation by controlling the light panel (115, 215, 403, 503, 513, 603, 605) to display a selected one of the predetermined emitted light options substantially over the light panel (115, 215, 403, 503, 513, 603, 605), wherein the selected one of the predetermined emitted light options is indicated by the second color selection actuation.

摘要翻译： 具有预定数量的发射颜色选择的光板（115,215,403,503,513,603,605）和可操作地耦合到所述光板（115,215,403,503,513）的处理器（113,213） ，603,605）。 处理器（113,213）通过控制光板（115,215,403,503,513,603,605）来响应于第一颜色选择致动，以在光板的不同部分内显示每个预定的发射光选项 （115,215,403,503,513,603,605）。 此后，处理器（113,213）通过控制光板（115,215,403,503,513,603,605）来响应于第二颜色选择致动，以基本上覆盖所述预定发射光选项中的所选择的一个 光面板（115,215,403,503,513,603,605），其中所选择的预定发射光选项之一由第二颜色选择致动指示。

公开(公告)号：US11549651B2

公开(公告)日：2023-01-10

申请号：US14848306

申请日：2015-09-08

申请人： Marcellinus Petrus Carolus Michael Krijn ,  Martin Jacobus Johan Jak

发明人： Marcellinus Petrus Carolus Michael Krijn ,  Martin Jacobus Johan Jak

IPC分类号： F21K9/64 ,  F21V23/04 ,  F21S45/70 ,  F21S41/16 ,  H01S5/0683 ,  F21V25/02 ,  H01S5/068 ,  H01S5/00 ,  F21Y115/30 ,  F21V25/00

摘要： A laser-based light source includes a laser device configured to generate laser light of a predetermined laser wavelength and emit this laser light as a laser beam. A light-conversion device is configured to convert at least part of the laser light into converted light and a laser-output sensor is configured to determine a laser-output signal proportional to the output of laser light emitted by the laser device. Further, a converted-light sensor is configured to determine a converted-light signal proportional to the output of converted light emitted by the light-conversion device. A controller is configured to receive the laser-output signal and the converted-light signal, to determine a safe-to-operate parameter, based on the laser-output signal and the converted-light signal, and to control the operation of the laser-based light source based on a comparison of the safe-to-operate parameter with a at least one predefined threshold.

公开(公告)号：US09805666B2

公开(公告)日：2017-10-31

申请号：US12513517

申请日：2007-11-02

申请人： Jurgen Jean Louis Hoppenbrouwers ,  Martin Jacobus Johan Jak ,  Wilhelmus Henricus Maria Van Beek

发明人： Jurgen Jean Louis Hoppenbrouwers ,  Martin Jacobus Johan Jak ,  Wilhelmus Henricus Maria Van Beek

IPC分类号： G09G5/10 ,  G09G3/34

CPC分类号： G09G3/3426 ,  G09G2320/0646 ,  G09G2330/021 ,  G09G2360/16

摘要： A display system (1) for generating a picture in accordance with image information (10) derived from a video signal has a light modulation device (20), an illumination device (30) and a control circuit (40) for driving both devices. The algorithm implemented in the control circuit (40) distributes the image information (10) over the light modulation device (20) and the illumination device (30) in order to minimize the power consumption of the display system.

公开(公告)号：US20150380899A1

公开(公告)日：2015-12-31

申请号：US14848306

申请日：2015-09-08

申请人： Marcellinus Petrus Carolus Michael KRIJN ,  Martin Jacobus Johan JAK

发明人： Marcellinus Petrus Carolus Michael KRIJN ,  Martin Jacobus Johan JAK

IPC分类号： H01S5/0683 ,  F21V23/04 ,  F21K99/00 ,  H01S5/00 ,  H01S5/068

CPC分类号： H01S5/0683 ,  F21K9/64 ,  F21S41/16 ,  F21S45/70 ,  F21V23/0457 ,  F21V25/00 ,  F21V25/02 ,  F21Y2115/30 ,  H01S5/005 ,  H01S5/06808 ,  H01S5/06825

摘要： A laser-based light source includes a laser device configured to generate laser light of a predetermined laser wavelength and emit this laser light as a laser beam. A light-conversion device is configured to convert at least part of the laser light into converted light and a laser-output sensor is configured to determine a laser-output signal proportional to the output of laser light emitted by the laser device. Further, a converted-light sensor is configured to determine a converted-light signal proportional to the output of converted light emitted by the light-conversion device. A controller is configured to receive the laser-output signal and the converted-light signal, to determine a safe-to-operate parameter, based on the laser-output signal and the converted-light signal, and to control the operation of the laser-based light source based on a comparison of the safe-to-operate parameter with a at least one predefined threshold.

摘要翻译： 基于激光的光源包括被配置为产生预定激光波长的激光并将该激光作为激光束发射的激光装置。 光转换装置被配置为将至少一部分激光转换成转换的光，并且激光输出传感器被配置为确定与激光装置发射的激光的输出成比例的激光输出信号。 此外，转换光传感器被配置为确定与由光转换装置发射的转换光的输出成比例的转换光信号。 控制器被配置为基于激光输出信号和转换光信号接收激光输出信号和转换光信号以确定安全操作参数，并且控制激光器的操作 基于对安全操作参数与至少一个预定阈值的比较的基于光的光源。

公开(公告)号：US20130010363A1

公开(公告)日：2013-01-10

申请号：US13617705

申请日：2012-09-14

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B27/42

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

摘要翻译： 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔径的直径大于20μm。

公开(公告)号：US08263950B2

公开(公告)日：2012-09-11

申请号：US12788903

申请日：2010-05-27

申请人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Kurt Gielissen ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Kurt Gielissen ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/54 ,  G21K5/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70858 ,  G21K2201/06

摘要： A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.

摘要翻译： 辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。

公开(公告)号：US20120182537A1

公开(公告)日：2012-07-19

申请号：US13497735

申请日：2010-08-02

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G03B27/32 ,  G02B5/20

CPC分类号： G03F7/70575 ,  G02B5/201 ,  G02B5/208

摘要： A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

摘要翻译： 光谱纯度滤光器，特别是在用于投影光束的EUV辐射的光刻设备中使用的光谱纯度滤光器包括衬底中的多个孔。 孔由具有倾斜到基底正面的法线侧面的壁限定。