Lithographic apparatus, measurement system, and device manufacturing method
    1.
    发明授权
    Lithographic apparatus, measurement system, and device manufacturing method 有权
    光刻设备,测量系统和器件制造方法

    公开(公告)号:US07102729B2

    公开(公告)日:2006-09-05

    申请号:US10769992

    申请日:2004-02-03

    IPC分类号: G03B27/42 G01B11/00

    CPC分类号: G03F7/70775

    摘要: The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.

    摘要翻译: 本发明涉及一种用于在至少第一测量方向上测量可移动物体相对于基座的位移的测量系统,所述可移动物体具有至少一个可在相对于基座的运动平面中移动的参考部分, 参考部分的实际运动在由具有形状的封闭轮廓界定的所述运动平面的区域内。 测量系统包括与平面元件可操作地连通的传感器头。 传感器头安装在基座上,平面元件安装在可移动物体的参考部分上,或者相反地安装在其上,其中平面元件具有与封闭轮廓的形状基本相同的形状。