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1.发明申请MEMBER FOR MASKING FILM, PROCESS FOR PRODUCING MASKING FILM USING THE SAME, AND PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN PRINTING PLATE 有权用于掩膜的成员，用于生产遮蔽膜的方法，以及用于生产感光树脂印刷板的方法公开(公告)号：US20120015288A1
公开(公告)日：2012-01-19
申请号：US13258573
申请日：2010-03-25
IPC分类号： G03F7/20
摘要： A member for masking films which includes a base film transparent to ultraviolet rays and, on one surface thereof, an ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and having an average thickness of 0.1 to 30 μm, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) and the layer (B) being located on the base-film side and on the printing-plate side of ultraviolet-shielding resin layer, respectively, and the ultraviolet-shielding resin layer has specific optical properties. This member for masking films has the following features: the accurate and precise removal of the ultraviolet-shielding resin layer using a low-energy laser beam gives areas with uniform light transmittance; the ultraviolet-shielding resin is resistant to scratches; and positioning is easy, and when making close contact with a plate, air trapping is less likely to occur so that the entire surface easily comes into close contact with a printing material.
摘要翻译： 一种用于掩蔽膜的构件，其包括对紫外线透明的基膜，并且在其一个表面上具有能够通过照射激光而被去除的平均厚度为0.1至30μm的紫外线屏蔽树脂层，其中， 紫外线屏蔽树脂层是由具有高炭黑含量的树脂层（A）和具有低炭黑含量的树脂层（B）的两层或更多层构成的多层结构，层（A）和层 （B）分别位于紫外线屏蔽树脂层的基膜侧和印版侧，紫外线屏蔽树脂层具有特定的光学特性。 用于掩模薄膜的部件具有以下特点：使用低能激光束精确和精确地去除紫外线屏蔽树脂层，使区域具有均匀的透光率; 紫外线屏蔽树脂耐划痕; 并且定位容易，并且当与板紧密接触时，不太可能发生空气捕获，使得整个表面容易与印刷材料紧密接触。
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2.发明授权Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask 有权用于掩模膜的构件，使用该构件制造掩模膜的方法和使用该掩模制造感光性树脂的印版的方法公开(公告)号：US06919148B2
公开(公告)日：2005-07-19
申请号：US10348560
申请日：2003-01-21
CPC分类号： G03F1/68
摘要： A member for a mask film comprising a substrate film transmitting ultraviolet light and a resin layer not transmitting ultraviolet light which is disposed on one face of the substrate film, allows elimination of color by irradiation with a laser beam, has a transmittance of ultraviolet light of 0.1% or smaller and has a thickness of 0.1 to 30 μm; a process for producing a mask film using the member; and a process for producing a printing plate of a photosensitive resin using the mask film. The mask is advantageously used for preparing a printing plate such as a photosensitive printing plate. The member for a mask provides the mask film by etching with a laser beam.
摘要翻译： 用于掩模膜的构件包括透射紫外线的基底膜和不透射紫外线的树脂层，其设置在基底膜的一个面上，允许通过用激光束照射来消除颜色，具有紫外线的透射率 0.1％以下，厚度0.1〜30μm; 使用该构件制造掩模膜的方法; 以及使用该掩模膜制造感光性树脂的印版的方法。 掩模有利地用于制备诸如感光印刷版的印刷版。 用于掩模的构件通过用激光束蚀刻提供掩模膜。
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3.发明授权Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate 有权遮光膜用构件，使用其的掩模膜的制造方法以及感光性树脂印刷版的制造方法公开(公告)号：US08628896B2
公开(公告)日：2014-01-14
申请号：US13258573
申请日：2010-03-25
摘要： A member for masking films including a base film transparent to ultraviolet rays, an ultraviolet-shielding resin layer capable of being removed by irradiation with a laser light beam and having an average thickness of 0.1 to 30 μm, and a protective layer having a thickness of 0.05 to 1.5 μm and comprising, as a resin component, a polyester-base resin having a glass-transition temperature of not less than 40° C. laminated to a surface of the outermost layer of the ultraviolet-shielding resin layer, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) and the layer (B) being located on the base-film side and on the printing-plate side of the ultraviolet-shielding resin layer, respectively.
摘要翻译： 一种用于掩蔽膜的构件，其包括对紫外线透明的基膜，能够通过照射激光而被去除的平均厚度为0.1-30μm的紫外线屏蔽树脂层，以及厚度为 0.05〜1.5μm，并且包含作为树脂组分的玻璃化转变温度不低于40℃的聚酯基树脂层压到紫外线屏蔽树脂层的最外层的表面上，其中紫外线 覆层树脂层是由具有高炭黑含量的树脂层（A）和具有低炭黑含量的树脂层（B）的两层或多层构成的多层结构，层（A）和层（ B）分别位于紫外线屏蔽树脂层的基膜侧和印版侧。
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