公开(公告)号：US20080212238A1

公开(公告)日：2008-09-04

申请号：US12012341

申请日：2008-01-31

申请人： Katsuro Watanabe ,  Satoru Okamoto ,  Masahiro Osugi ,  Koji Okazaki

发明人： Katsuro Watanabe ,  Satoru Okamoto ,  Masahiro Osugi ,  Koji Okazaki

IPC分类号： G11B5/33

CPC分类号： G11B5/59633 ,  G11B5/59666

摘要： Embodiments of the present invention help to efficiently apply a longitudinal biasing with appropriate strength from a longitudinal biasing layer to a free layer even in a small read gap length. According to one embodiment, in the track width direction of the magnetoresistive film, the longitudinal biasing layer excluding its portion close to the magnetoresistive film is made approximately uniform in thickness. An edge toward the magnetoresistive film of the longitudinal biasing layer is positioned more outwardly in the track width direction than an edge in the track width direction of the free layer. A portion closest to the substrate of the interface between the longitudinal biasing layer and the insulator on the track-width sides is positioned lower than the interface between the magnetoresistive film and the lower magnetic shield layer.

摘要翻译： 本发明的实施例有助于即使在小的读取间隙长度中也可以将具有适当强度的纵向偏置从纵向偏置层施加到自由层。 根据一个实施例，在磁阻膜的磁道宽度方向上，除了靠近磁阻膜的部分之外的纵向偏置层的厚度大致均匀。 朝向纵向偏置层的磁阻膜的边缘比沿自由层的轨道宽度方向的边缘更靠外侧位于轨道宽度方向上。 在纵向偏置层和轨道宽度侧的绝缘体之间的界面最靠近的部分位于低于磁阻膜和下部磁屏蔽层之间的界面的位置。

公开(公告)号：US08480911B1

公开(公告)日：2013-07-09

申请号：US13173846

申请日：2011-06-30

申请人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/398 ,  G01R33/0052 ,  G01R33/093 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/3932

摘要： A read sensor for a read transducer is fabricated. The read transducer has field and device regions. A read sensor stack is deposited. A mask covering part of the stack corresponding to the read sensor is provided. The read sensor having inboard and outboard junction angles is defined from the stack in a track width direction. A critical junction (CJ) focused ion beam scan (FIBS) polishing that removes part of the read sensor based on the junction angles is performed. A hard bias structure is deposited and the transducer planarized. A remaining portion of the mask is removed. A stripe height mask covering part of the read sensor and hard bias structure in a stripe height direction is provided. The read sensor stripe height is defined. A tunneling magnetoresistance (TMR) FIBS polishing that removes part of the stack in the field region is performed. An insulating layer is provided.

摘要翻译： 制造用于读取换能器的读取传感器。 读取传感器具有现场和设备区域。 读取传感器堆栈。 提供覆盖对应于读取传感器的堆叠部分的掩模。 具有内侧和外侧接合角的读取传感器从堆叠沿轨道宽度方向限定。 执行基于结合角去除部分读取传感器的临界结（CJ）聚焦离子束扫描（FIBS）抛光。 沉积硬偏压结构，并将传感器平坦化。 去除掩模的剩余部分。 提供覆盖读取传感器的一部分并且条带高度方向上的硬偏置结构的条纹高度掩模。 读取传感器条纹高度被定义。 执行去除场区域中的一部分堆叠的隧道磁阻（TMR）FIBS抛光。 提供绝缘层。

公开(公告)号：US08335057B2

公开(公告)日：2012-12-18

申请号：US12536255

申请日：2009-08-05

申请人： Masahiro Osugi ,  Takayoshi Ohtsu ,  Shigeo Fujita ,  Katsuro Watanabe ,  Koji Kataoka

发明人： Masahiro Osugi ,  Takayoshi Ohtsu ,  Shigeo Fujita ,  Katsuro Watanabe ,  Koji Kataoka

IPC分类号： G11B5/33

CPC分类号： G11B5/3909 ,  B82Y10/00 ,  B82Y25/00 ,  G11B5/3912 ,  G11B2005/3996

摘要： According to one embodiment, a CPP magnetoresistive head includes a magnetoresistive film comprising a free layer above a non-magnetic intermediate layer and a fixed layer below the non-magnetic intermediate layer, wherein the magnetoresistive film is between a lower magnetic shield layer and an upper magnetic shield layer. The CPP magnetoresistive head also includes a domain control film on each side of the magnetoresistive film, wherein a sense current flows through the magnetoresistive film between the upper magnetic shield layer and the lower magnetic shield layer. The CPP magnetoresistive head also includes a high heat conductivity layer, and a heat dissipation layer having a high heat conductivity and a low linear expansion coefficient, the heat dissipation layer being disposed at the back in a device height direction of the magnetoresistive film and on each side of the domain control film.

摘要翻译： 根据一个实施例，CPP磁阻磁头包括磁阻膜，该磁阻膜包括在非磁性中间层上方的自由层和位于非磁性中间层之下的固定层，其中磁阻膜位于下部磁屏蔽层和上部磁屏蔽层之间 磁屏蔽层。 CPP磁阻头还包括在磁阻膜的每一侧的畴控制膜，其中感测电流流过上磁屏蔽层和下磁屏蔽层之间的磁阻膜。 CPP磁阻头还包括高导热层和具有高导热性和低线性膨胀系数的散热层，散热层设置在磁阻膜的器件高度方向的背面，并且在每个 侧面的域控制膜。

公开(公告)号：US07561384B2

公开(公告)日：2009-07-14

申请号：US11289798

申请日：2005-11-29

申请人： Masahiro Osugi ,  Taku Shintani ,  Katsuro Watanabe ,  Nobuo Yoshida

发明人： Masahiro Osugi ,  Taku Shintani ,  Katsuro Watanabe ,  Nobuo Yoshida

IPC分类号： G11B5/39

CPC分类号： G11B5/39 ,  G01R33/09 ,  G11B5/3163 ,  G11B5/3169

摘要： A high output magneto-resistive sensor is provided by suppressing leftover resist mask after lift-off and generation of a fence, and by making it easy to remove the redepositions deposited on the side wall in the track width direction or on the side wall in the sensor height direction of the magnetoresistive film. As a means to solve a fence and lift-off leftover of a resist in a process for forming a track and a process for forming a sensor height, a stopper layer is provided on the magnetoresistive film and the stopper layer on the refill film, and performing lift-off by CMP. By using a metallic material which has a small CMP polishing rate for at least the first stopper layer, the magnetoresistive film and the first stopper layer can be etched simultaneously and a pattern formed. As a result, decrease of the height of the resist mask by RIE can be suppressed and lift-off leftover can be prevented.

摘要翻译： 通过在剥离和产生栅栏之后抑制剩余抗蚀剂掩模来提供高输出磁阻传感器，并且通过使得容易地去除在轨道宽度方向上或侧壁上沉积在侧壁上的再沉积 磁阻膜的传感器高度方向。 作为用于形成轨迹的工序中的抗蚀剂的栅栏和剥离残留的手段以及形成传感器高度的工序，在磁阻膜和再填充膜上的阻挡层上设置有阻挡层， 通过CMP执行剥离。 通过使用对于至少第一阻挡层具有小的CMP抛光速率的金属材料，可以同时蚀刻磁阻膜和第一阻挡层并形成图案。 结果，可以抑制RIE的抗蚀剂掩模的高度的降低，并且可以防止剥离残留物。

公开(公告)号：US09138790B2

公开(公告)日：2015-09-22

申请号：US13899800

申请日：2013-05-22

申请人： Yoshito Isei ,  Tomoya Kato ,  Masahiro Osugi

发明人： Yoshito Isei ,  Tomoya Kato ,  Masahiro Osugi

IPC分类号： B21B38/02 ,  B21C51/00 ,  G01B11/25 ,  G01B11/30

CPC分类号： B21B38/02 ,  B21C51/00 ,  G01B11/2513 ,  G01B11/303 ,  G01B11/306 ,  G01N21/8806 ,  G01N21/89

摘要： A method for measuring flatness of a sheet material in which a light and dark pattern composed by a light portion and a dark portion is projected onto a surface of the sheet material running in a longitudinal direction, a pattern image is acquired by photographing the light and dark pattern by an image pickup device having an image pickup visual field larger than a width of the sheet material, and the flatness of the sheet material is measured by analyzing the acquired pattern image. A staggered pattern is used for the projecting step and for light to be specularly reflected for receipt by the image pickup device. Calculating the flatness also includes steps of setting a shape measurement line, averaging picture element concentrations, calculating a distribution of the concentrations, and calculating the flatness based on surface shape using the distribution.

摘要翻译： 一种用于测量其中由光部分和暗部组成的光和暗图案被投影到沿纵向方向延伸的片材的表面上的片材的平整度的方法，通过拍摄光而获得图案图像， 通过具有大于片材的宽度的图像拾取视野的图像拾取装置的暗图案，并且通过分析所获取的图案图像来测量片材的平坦度。 用于投影步骤的交错图案，并且光被镜面反射以被图像拾取装置接收。 平坦度的计算还包括设置形状测量线，平均图像元素浓度，计算浓度分布以及使用该分布计算基于表面形状的平坦度的步骤。

公开(公告)号：US09003846B2

公开(公告)日：2015-04-14

申请号：US13654907

申请日：2012-10-18

申请人： Yoshito Isei ,  Tomoya Kato ,  Masahiro Osugi ,  Hideyuki Takahashi

发明人： Yoshito Isei ,  Tomoya Kato ,  Masahiro Osugi ,  Hideyuki Takahashi

IPC分类号： B21B37/00 ,  B21C51/00 ,  G01B11/30 ,  G01B11/25 ,  B21B1/22 ,  B21B38/02

CPC分类号： G01B11/303 ,  B21B1/22 ,  B21B38/02 ,  B21C51/00 ,  G01B11/2513 ,  G01B11/306

摘要： Measuring sheet material flatness includes projecting a bright and dark pattern made up of bright parts and dark parts onto a sheet material surface travelling in a lengthwise direction, picking up an image of pattern with image pickup device to acquire a pattern image, with the pickup device having a field of view larger than a sheet material width. The acquired pattern image is analyzed, wherein a pattern in which a bright part is disposed at a predetermined set pitch respectively in longitudinal and lateral directions is formed by an LED light at a predetermined pitch respectively in the longitudinal and lateral directions. The pattern is projected onto the surface such that the longitudinal direction of the pattern lies along a lengthwise direction of the sheet material, and the lateral direction of the pattern lies along a width direction of the sheet material.

摘要翻译： 测量片材平整度包括将由亮部和暗部组成的明暗图案投影到沿长度方向行进的片材表面上，利用摄像装置拾取图案图像以获取图案图像，其中拾取装置 具有比片材宽度大的视场。 分析所获取的图案图像，其中分别在纵向和横向上以预定间距的LED光以纵向和横向方向以预定设定的间距设置明亮部分的图案。 图案被投影到表面上，使得图案的纵向方向沿着片材的长度方向，并且图案的横向方向沿着片材的宽度方向。

公开(公告)号：US08506828B1

公开(公告)日：2013-08-13

申请号：US13171242

申请日：2011-06-28

申请人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/3932 ,  G11B5/3163 ,  G11B5/3909 ,  Y10T29/49043

摘要： A method and system for fabricating a read sensor on a substrate for a read transducer is described. A read sensor stack is deposited on the substrate. A mask is provided on the on the read sensor stack. The mask has a pattern that covers a first portion of the read sensor stack corresponding to the read sensor, covers a second portion of the read sensor stack distal from the read sensor, and exposes a third portion of the read sensor stack between the first and second portions. The read sensor is defined from the read sensor stack. A hard bias layer is deposited. An aperture free mask layer including multiple thicknesses is provided. A focused ion beam scan (FIBS) polishing step is performed on the mask and hard bias layers to remove a portion of the mask and hard bias layers based on the thicknesses.

摘要翻译： 描述了用于在读取换能器的基板上制造读取传感器的方法和系统。 读取传感器堆叠沉积在衬底上。 在读取传感器堆叠上提供掩模。 掩模具有覆盖对应于读取传感器的读取传感器堆叠的第一部分的图案，其覆盖远离读取传感器的读取传感器堆叠的第二部分，并将读取传感器堆叠的第三部分暴露在第一和第 第二部分。 读取传感器由读取传感器堆栈定义。 沉积硬偏压层。 提供包括多个厚度的无孔掩模层。 在掩模和硬偏压层上执行聚焦离子束扫描（FIBS）抛光步骤，以基于厚度去除掩模和硬偏压层的一部分。

公开(公告)号：US20120204614A1

公开(公告)日：2012-08-16

申请号：US13444342

申请日：2012-04-11

申请人： Yoshito ISEI ,  Tomoya KATO ,  Masahiro OSUGI

发明人： Yoshito ISEI ,  Tomoya KATO ,  Masahiro OSUGI

IPC分类号： B21B37/28 ,  G01B11/25

CPC分类号： B21B38/02 ,  B21C51/00 ,  G01B11/2513 ,  G01B11/303 ,  G01B11/306 ,  G01N21/8806 ,  G01N21/89

摘要： A method for measuring flatness of a sheet material in which a light and dark pattern composed by a light portion and a dark portion is projected onto a surface of the sheet material running in a longitudinal direction, a pattern image is acquired by photographing the light and dark pattern by an image pickup device having an image pickup visual field larger than a width of the sheet material, and the flatness of the sheet material is measured by analyzing the acquired pattern image. A staggered pattern is used for the projecting step and for light to be specularly reflected for receipt by the image pickup device. Calculating the flatness also includes steps of setting a shape measurement line, averaging picture element concentrations, calculating a distribution of the concentrations, and calculating the flatness based on surface shape using the distribution.

摘要翻译： 一种用于测量其中由光部分和暗部组成的光和暗图案被投影到沿纵向方向延伸的片材的表面上的片材的平整度的方法，通过拍摄光而获得图案图像， 通过具有大于片材的宽度的图像拾取视野的图像拾取装置的暗图案，并且通过分析所获取的图案图像来测量片材的平坦度。 用于投影步骤的交错图案，并且光被镜面反射以被图像拾取装置接收。 平坦度的计算还包括设置形状测量线，平均图像元素浓度，计算浓度分布以及使用该分布计算基于表面形状的平坦度的步骤。

公开(公告)号：US07859799B2

公开(公告)日：2010-12-28

申请号：US11706152

申请日：2007-02-13

申请人： Katsuro Watanabe ,  Taku Shintani ,  Kazuhiro Ueda ,  Masahiro Osugi

发明人： Katsuro Watanabe ,  Taku Shintani ,  Kazuhiro Ueda ,  Masahiro Osugi

IPC分类号： G11B5/127

CPC分类号： G11B5/3903 ,  G11B5/3163 ,  G11B5/398

摘要： Embodiments in accordance with the present invention reduce the influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, lower the deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer and instability of reproducing property resulting from shield process, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. In an embodiment of a magnetoresistive head of the present invention, length in the sensor height direction of bottom surface of a pinning layer is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer. The angle formed by an edge in the sensor height direction of the pinning layer to the surface extended from a bottom surface of a magnetoresistive film is smaller than the angle formed by an edge in the sensor height direction of a second ferromagnetic layer to the surface extended from a bottom surface of the magnetoresistive film. Height of top surface of a sensor height direction refill film is equal to or higher than the top surface of the magnetoresistive film.

摘要翻译： 根据本发明的实施例减小了在传感器高度方向上的磁阻膜的接合边缘处的蚀刻损伤的影响，降低了上磁屏蔽层和下磁屏蔽层之间的介电击穿电压的劣化以及再现性能的不稳定性 由屏蔽过程产生，并且在CPP磁阻头中将静电容量维持在较小的值。 在本发明的磁阻头的一个实施例中，钉扎层的底表面的传感器高度方向上的长度比第一铁磁层的底表面的传感器高度方向上的长度长。 由钉扎层的传感器高度方向的边缘到从磁阻膜的底面延伸的表面形成的角度小于由第二铁磁层的传感器高度方向上的边缘延伸到表面延伸的角度 从磁阻膜的底表面。 传感器高度方向充填膜的顶表面的高度等于或高于磁阻膜的顶表面。

公开(公告)号：US20140007634A1

公开(公告)日：2014-01-09

申请号：US13899800

申请日：2013-05-22

申请人： Yoshito ISEI ,  Tomoya Kato ,  Masahiro Osugi

发明人： Yoshito ISEI ,  Tomoya Kato ,  Masahiro Osugi

IPC分类号： B21B38/02 ,  G01B11/30

CPC分类号： B21B38/02 ,  B21C51/00 ,  G01B11/2513 ,  G01B11/303 ,  G01B11/306 ,  G01N21/8806 ,  G01N21/89

摘要： A method for measuring flatness of a sheet material in which a light and dark pattern composed by a light portion and a dark portion is projected onto a surface of the sheet material running in a longitudinal direction, a pattern image is acquired by photographing the light and dark pattern by an image pickup device having an image pickup visual field larger than a width of the sheet material, and the flatness of the sheet material is measured by analyzing the acquired pattern image. A staggered pattern is used for the projecting step and for light to be specularly reflected for receipt by the image pickup device. Calculating the flatness also includes steps of setting a shape measurement line, averaging picture element concentrations, calculating a distribution of the concentrations, and calculating the flatness based on surface shape using the distribution.

摘要翻译： 一种用于测量其中由光部分和暗部组成的光和暗图案被投影到沿纵向方向延伸的片材的表面上的片材的平整度的方法，通过拍摄光而获得图案图像， 通过具有大于片材的宽度的图像拾取视野的图像拾取装置的暗图案，并且通过分析所获取的图案图像来测量片材的平坦度。 用于投影步骤的交错图案，并且光被镜面反射以被图像拾取装置接收。 平坦度的计算还包括设置形状测量线，平均图像元素浓度，计算浓度分布以及使用该分布计算基于表面形状的平坦度的步骤。