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    Wafer support system
    2.
    发明授权
    Wafer support system 失效
    晶圆支撑系统

    公开(公告)号：US07655093B2

    公开(公告)日：2010-02-02

    申请号：US11668409

    申请日：2007-01-29

    申请人： Michael W. Halpin ,  Mark R. Hawkins ,  Derrick W. Foster ,  Robert M. Vyne ,  John F. Wengert ,  Cornelius A. van der Jeugd ,  Loren R. Jacobs ,  Frank B. M. Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason M. Layton

    发明人： Michael W. Halpin ,  Mark R. Hawkins ,  Derrick W. Foster ,  Robert M. Vyne ,  John F. Wengert ,  Cornelius A. van der Jeugd ,  Loren R. Jacobs ,  Frank B. M. Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason M. Layton

    IPC分类号： H01L21/00 ,  C23C14/00 ,  C23C16/00

    CPC分类号： C23C16/4586 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A wafer support system comprising a susceptor having top and bottom sections and gas flow passages therethrough. One or more spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer. Short purge channels may be provided to deliver some of the sweep gas to regions surrounding the spacers to cause a continuous flow of protective purge gas around the spacers.

    摘要翻译： 一种晶片支撑系统，其包括具有顶部和底部部分以及穿过其的气体流动通道的基座。 从形成在基座的顶部的凹部突出的一个或多个间隔件相对于凹部以间隔的关系支撑晶片。 吹扫气体被引入到基座的底部，并且穿过气体流动通道，以在凹槽中的至少一个圆形阵列的出口和在间隔开的晶片之下排出。 吹扫气体在基座和晶片之间径向向外行进，以防止晶片的背面污染。 气体通过中空驱动轴输送到基座下方的多臂感受器支架中。 支撑臂将吹扫气体从驱动轴传导到基座中的气体通道。 气体通道被布置成在散布在晶片之下之前加热吹扫气体。 可以提供短的吹扫通道以将一些吹扫气体输送到围绕间隔物的区域，以引起隔离物周围的保护性吹扫气体的连续流动。

    Low/high temperature substrate holder to reduce edge rolloff and backside damage
    3.
    发明申请
    Low/high temperature substrate holder to reduce edge rolloff and backside damage 审中-公开
    低/高温基板支架，以减少边缘滚降和背面损坏

    公开(公告)号：US20050092439A1

    公开(公告)日：2005-05-05

    申请号：US10697401

    申请日：2003-10-29

    申请人： Tony Keeton ,  Matthew Goodman ,  Michael Stamp

    发明人： Tony Keeton ,  Matthew Goodman ,  Michael Stamp

    IPC分类号： C23C14/50 ,  C23C16/458 ,  H01L21/683 ,  H01L21/687 ,  C23F1/00

    CPC分类号： H01L21/68735 ,  C23C16/4585 ,  H01L21/6833

    摘要： A substrate holder for processing a semiconductor substrate that minimizes substrate non-uniformities as well as backside damage. The substrate holder includes one or more support elements, such as a plurality of veins configured in an annular ring to support an outer edge of a substrate. The veins are configured to support a substrate of a particular size in a support plane defined by the top surfaces of the veins. The substrate holder also has one or more annular grooves formed in the top surface of the holder. In a preferred embodiment, the substrate holder also has a raised annular ring positioned radially inward of the grooves and the support elements. The top surface of the raised annular ring is no higher that the top surfaces of the veins.

    摘要翻译： 一种用于处理半导体衬底的衬底保持器，其使衬底不均匀性以及背面损坏最小化。 衬底保持器包括一个或多个支撑元件，例如构造成环形环中的多个静脉，以支撑衬底的外边缘。 静脉构造成在由静脉的顶部表面限定的支撑平面中支撑特定尺寸的基底。 衬底保持器还具有形成在保持器的顶表面中的一个或多个环形槽。 在优选实施例中，衬底保持器还具有位于凹槽和支撑元件的径向内侧的凸起环形环。 凸起环形圈的顶面不大于静脉的顶面。

    Wafer support system
    4.
    发明授权
    Wafer support system 有权
    晶圆支撑系统

    公开(公告)号：US06343183B1

    公开(公告)日：2002-01-29

    申请号：US09605094

    申请日：2000-06-27

    申请人： Michael W. Halpin ,  Mark R. Hawkins ,  Derrick W. Foster ,  Robert M. Vyne ,  John F. Wengert ,  Cornelius A. van der Jeugd ,  Loren R. Jacobs ,  Frank B. M. Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason M. Layton

    发明人： Michael W. Halpin ,  Mark R. Hawkins ,  Derrick W. Foster ,  Robert M. Vyne ,  John F. Wengert ,  Cornelius A. van der Jeugd ,  Loren R. Jacobs ,  Frank B. M. Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason M. Layton

    IPC分类号： A21B200

    CPC分类号： C23C16/4586 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the segmented susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the segmented susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer. Short purge channels may be provided to deliver some of the sweep gas to regions surrounding the spacers to cause a continuous flow of protective purge gas around the spacers. A common bottom section may cooperate with a plurality of different top sections to form segmented susceptors suitable for supporting various sized wafers.

    摘要翻译： 一种晶片支撑系统，其包括具有顶部和底部部分的分段式基座以及穿过其中的气体流动通道。 从形成在基座的顶部的凹部突出的多个间隔件相对于凹部间隔开地支撑晶片。 吹扫气体被引入到分段基座的底部，并且穿过气体流动通道，在凹槽中的至少一个圆形阵列的出口和间隔开的晶片之下排出。 吹扫气体在基座和晶片之间径向向外行进，以防止晶片的背面污染。 气体通过中空驱动轴输送到基座下方的多臂感受器支架中。 支撑臂将吹扫气体从驱动轴传导到分段基座中的气体通道。 气体通道被布置成在散布在晶片之下之前加热吹扫气体。 可以提供短的吹扫通道以将一些吹扫气体输送到围绕间隔物的区域，以引起隔离物周围的保护性吹扫气体的连续流动。 共同的底部部分可以与多个不同的顶部部分配合以形成适合于支撑各种尺寸的晶片的分段式基座。

    Anti-IL 1- ß Antibody Combination Therapy
    5.
    发明申请
    Anti-IL 1- ß Antibody Combination Therapy 审中-公开
    抗IL 1-抗体组合治疗

    公开(公告)号：US20130122008A1

    公开(公告)日：2013-05-16

    申请号：US13318626

    申请日：2010-05-05

    申请人： Matthew Goodman ,  Mariadele Noè

    发明人： Matthew Goodman ,  Mariadele Noè

    IPC分类号： A61K45/06 ,  A61K31/155 ,  A61K39/395

    CPC分类号： A61K45/06 ,  A61K31/155 ,  A61K39/3955 ,  A61K2039/505 ,  A61K2039/545 ,  C07K16/245 ,  C07K2317/21 ,  A61K2300/00

    摘要： The present invention relates to a new combination comprising a therapeutically effective amount of an anti-IL1β antibody or an antigen-binding fragment thereof and at least one anti-diabetic agent. The anti-diabetic agent can be selected from the group consisting of insulin signaling pathway modulators, such as inhibitors of protein tyrosine phosphatases (PTPases), non-small molecule mimetic compounds and inhibitors of glutamine-fructose-6-phosphate amidotransferase (GFAT), DPP-IV inhibitors, agents influencing a deregulated hepatic glucose production, like inhibitors of glucose-6-phosphatase (G6Pase), inhibitors of fructose-1,6-bisphosphatase (F-1,6-BPase), inhibitors of glycogen phosphorylase (GP), glucagon receptor antagonists and inhibitors of phosphoenolpyruvate carboxykinase (PEPCK), pyruvate dehydrogenase kinase (PDHK) inhibitors, insulin sensitivity enhancers, insulin secretion enhancers, α-glucosidase inhibitors, inhibitors of gastric emptying, insulin, and α2-adrenergic antagonists, for simultaneous, separate or sequential use of the anti-IL-1β antibody or a antigen-binding fragment thereof and the at least one anti-diabetic agent, especially in the prevention, delay of progression or treatment of metabolic conditions mediated by IL1β such as conditions of impaired glucose tolerance (IGT), conditions of impaired fasting plasma glucose, metabolic acidosis, ketosis, arthritis, obesity and osteoporosis, in particular diabetes and specifically type 1 diabetes or type 2 diabetes mellitus. The invention also relates to pharmaceutical composition comprising the combination of the invention and methods of treatment using the combination for the prevention, delay of progression or treatment of metabolic conditions mediated by IL1β such as diabetes or improving the function of beta cell function.

    摘要翻译： 本发明涉及包含治疗有效量的抗IL1beta抗体或其抗原结合片段和至少一种抗糖尿病药的新组合。 抗糖尿病药可以选自胰岛素信号通路调节剂，例如蛋白酪氨酸磷酸酶抑制剂（PTPases），非小分子模拟化合物和谷氨酰胺 - 果糖-6-磷酸酰胺转移酶（GFAT）抑制剂， DPP-IV抑制剂，影响失调的肝葡萄糖产生的药物，如葡萄糖-6-磷酸酶抑制剂（G6Pase），果糖-1,6-二磷酸酶抑制剂（F-1,6-BPase），糖原磷酸化酶抑制剂 ），胰高血糖素受体拮抗剂和磷酸烯醇丙酮酸羧激酶（PEPCK），丙酮酸脱氢酶激酶（PDHK）抑制剂，胰岛素敏感性增强剂，胰岛素分泌增强剂，α-葡糖苷酶抑制剂，胃排空抑制剂，胰岛素和α2-肾上腺素能拮抗剂的抑制剂 ，分离或顺序使用抗IL-1β抗体或其抗原结合片段和至少一种抗糖尿病药，特别是在预防 n，由IL1beta介导的代谢条件的进展或治疗的延迟，例如葡萄糖耐量降低的病症（IGT），空腹血糖，代谢性酸中毒，酮症，关节炎，肥胖症和骨质疏松症的病症，特别是糖尿病和特别是1型糖尿病 或2型糖尿病。 本发明还涉及药物组合物，其包含本发明的组合和使用该组合的治疗方法，用于预防，延缓进展或治疗由IL1beta介导的代谢病症如糖尿病或改善β细胞功能的功能。

    WAFER SUPPORT SYSTEM
    7.
    发明申请
    WAFER SUPPORT SYSTEM 失效
    WAFER支持系统

    公开(公告)号：US20070131173A1

    公开(公告)日：2007-06-14

    申请号：US11668409

    申请日：2007-01-29

    申请人： Michael Halpin ,  Mark Hawkins ,  Derrick Foster ,  Robert Vyne ,  John Wengert ,  Cornelius van der Jeugd ,  Loren Jacobs ,  Frank Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason Layton

    发明人： Michael Halpin ,  Mark Hawkins ,  Derrick Foster ,  Robert Vyne ,  John Wengert ,  Cornelius van der Jeugd ,  Loren Jacobs ,  Frank Van Bilsen ,  Matthew Goodman ,  Hartmann Glenn ,  Jason Layton

    IPC分类号： C23C16/00

    CPC分类号： C23C16/4586 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A wafer support system comprising a susceptor having top and bottom sections and gas flow passages therethrough. One or more spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer. Short purge channels may be provided to deliver some of the sweep gas to regions surrounding the spacers to cause a continuous flow of protective purge gas around the spacers.

    摘要翻译： 一种晶片支撑系统，其包括具有顶部和底部部分以及穿过其的气体流动通道的基座。 从形成在基座的顶部的凹部突出的一个或多个间隔件相对于凹部以间隔的关系支撑晶片。 吹扫气体被引入到基座的底部，并且穿过气体流动通道，以在凹槽中的至少一个圆形阵列的出口和在间隔开的晶片之下排出。 吹扫气体在基座和晶片之间径向向外行进，以防止晶片的背面污染。 气体通过中空驱动轴输送到基座下方的多臂感受器支架中。 支撑臂将吹扫气体从驱动轴传导到基座中的气体通道。 气体通道被布置成在散布在晶片之下之前加热吹扫气体。 可以提供短的吹扫通道以将一些吹扫气体输送到围绕间隔物的区域，以引起隔离物周围的保护性吹扫气体的连续流动。

    Wafer holder with peripheral lift ring
    8.
    发明申请
    Wafer holder with peripheral lift ring 有权
    带外围电梯环的晶圆架

    公开(公告)号：US20050011458A1

    公开(公告)日：2005-01-20

    申请号：US10903083

    申请日：2004-07-30

    申请人： Ravinder Aggarwal ,  Tony Keeton ,  Matthew Goodman

    发明人： Ravinder Aggarwal ,  Tony Keeton ,  Matthew Goodman

    IPC分类号： C23C16/458 ,  C23C16/48 ,  H01L21/687 ,  H01L21/306

    CPC分类号： H01L21/68735 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/481 ,  H01L21/68742

    摘要： A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug having a top flat surface configured to support the wafer during wafer processing. The lift ring has a central aperture configured to closely surround the inner plug. When a wafer is to be loaded onto the wafer holder, the lift ring is elevated above the inner plug. The wafer is loaded onto the lift ring in the elevated position. Then, the lift ring is maintained in the elevated position for a time period sufficient to allow the wafer temperature to rise to a level that is sufficient to significantly reduce or even substantially prevent thermal shock to the wafer when the wafer is brought into contact with the inner plug. The lift ring is then lowered into surrounding engagement with the inner plug. This is the wafer processing position of the wafer holder.

    摘要翻译： 用于在CVD处理室内支撑晶片的晶片保持器包括构造成支撑晶片的底部周边表面的可垂直移动的提升环，以及配置成在晶片处理期间支撑晶片的顶部平坦表面的内部插塞。 提升环具有构造成紧密围绕内塞的中心孔。 当将晶片装载到晶片保持器上时，升降环升高到内塞上方。 晶片在提升位置被装载到提升环上。 然后，提升环保持在升高位置一段足以允许晶片温度上升至足以显着降低甚至基本上防止晶片对晶片的热冲击的水平的时间，当晶片与 内塞 然后升降环下降到与内塞的周围接合。 这是晶片保持器的晶片加工位置。

    Low-mass susceptor improvements
    10.
    发明申请
    Low-mass susceptor improvements 审中-公开
    低质量感受器改进

    公开(公告)号：US20050183829A1

    公开(公告)日：2005-08-25

    申请号：US11095335

    申请日：2005-03-21

    申请人： Matthew Goodman ,  Ivo Raaijmakers ,  Loren Jacobs ,  Franciscus van Bilsen ,  Michael Meyer ,  Eric Barrett

    发明人： Matthew Goodman ,  Ivo Raaijmakers ,  Loren Jacobs ,  Franciscus van Bilsen ,  Michael Meyer ,  Eric Barrett

    IPC分类号： H01L21/683 ,  C23C16/458 ,  C23C16/48 ,  H01L21/205 ,  H01L21/26 ,  H01L21/687 ,  C23F1/00

    CPC分类号： H01L21/68735 ,  C23C16/4581 ,  C23C16/4585 ,  C23C16/481 ,  H01L21/68721 ,  H01L21/68728 ,  H01L21/68785

    摘要： Improvements in the design of a low mass wafer holder are disclosed. The improvements include the use of peripherally located, integral lips to space a wafer or other substrate above the base plate of the wafer holder. A uniform gap is thus provided between the wafer and the base plate, such as will temper rapid heat exchanges, allow gas to flow between the wafer and wafer holder during wafer pick-up, and keep the wafer holder thermally coupled with the wafer. At the same time, thermal disturbance from lip contact with the wafer is reduced. Gas flow during pick-up can be provided through radial channels in a wafer holder upper surface, or through backside gas passages. A thicker ring is provided at the wafer holder perimeter, and is provided in some embodiments as an independent piece to accommodate stresses accompanying thermal gradients. Self-centering mechanisms are provided to keep the wafer holder centered relative to a spider which is subject to differential thermal expansion.

    摘要翻译： 公开了一种低质量晶片支架的设计改进。 这些改进包括使用外围定位的整体式唇缘以将晶片或其它基板放置在晶片保持器的基板之上。 因此，在晶片和基板之间提供均匀的间隙，例如将回火快速热交换，允许气体在晶片拾取期间在晶片和晶片保持器之间流动，并保持晶片保持器与晶片热耦合。 同时，与晶片的唇接触的热扰动减小。 拾取期间的气流可以通过晶片保持器上表面中的径向通道或通过背侧气体通道来提供。 在晶片保持器周边处提供较厚的环，并且在一些实施例中作为独立件提供以适应伴随热梯度的应力。 提供自对中机构以保持晶片保持架相对于经受不同热膨胀的蜘蛛座居中。