METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA
    1.
    发明申请
    METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA 有权
    用于控制等离子体特性的方法和装置

    公开(公告)号:US20090140828A1

    公开(公告)日:2009-06-04

    申请号:US11934197

    申请日:2007-11-02

    IPC分类号: H01P7/04

    摘要: Methods and apparatus for controlling characteristics of a plasma, such as the spatial distribution of RF power and plasma uniformity, are provided herein. In some embodiments, an apparatus for controlling characteristics of a plasma includes a resonator for use in conjunction with a plasma reactor, the resonator including a source resonator for receiving an RF signal having a first frequency; a return path resonator disposed substantially coaxially with, and at least partially within, the source resonator; and an outer conductor having the source resonator and the return path resonator disposed substantially coaxially with, and at least partially within, the outer conductor, the outer conductor for providing an RF ground connection.

    摘要翻译: 本文提供了用于控制等离子体特性的方法和装置,例如RF功率和等离子体均匀性的空间分布。 在一些实施例中,用于控制等离子体特性的装置包括与等离子体电抗器结合使用的谐振器,所述谐振器包括用于接收具有第一频率的RF信号的源谐振器; 与所述源谐振器基本同轴并且至少部分地在所述源谐振器内设置的返回路径谐振器; 以及具有源极谐振器和返回路径谐振器的外部导体,该外部导体与外部导体大致同轴并至少部分地设置,外部导体用于提供RF接地连接。