Abstract:
Provided are a doped phase change material and a phase change memory device including the phase change material. The phase change material, which may be doped with Se, has a higher crystallization temperature than a Ge2Sb2Te5 (GST) material. The phase change material may be InXSbYTeZSe100−(X+Y+Z). The index X of indium (In) is in the range of 25 wt %≦X≦60 wt %. The index Y of antimony (Sb) is in the range of 1 wt %≦Y≦17 wt %. The index Z of tellurium (Te) is in the range of 0 wt %
Abstract translation:提供了掺杂相变材料和包括相变材料的相变存储器件。 可以掺杂有Se的相变材料具有比Ge 2 Sb 2 Sb 5(GST)材料更高的结晶温度 。 相变材料可以是在<! - SIPO - >中,Z 100,(X + Y + Z) 。 铟(In)的指数X在25重量%<= X <= 60重量%的范围内。 锑(Sb)的指数Y在1重量%<= Y <17重量%的范围内。 碲(Te)的指数Z在0重量%
Abstract:
Provided are a doped phase change material and a phase change memory device including the phase change material. The phase change material, which may be doped with Se, has a higher crystallization temperature than a Ge2Sb2Te5 (GST) material. The phase change material may be InXSbYTeZSe100−(X+Y+Z). The index X of indium (In) is in the range of 25 wt %≦X≦60 wt %. The index Y of antimony (Sb) is in the range of 1 wt %≦Y≦17 wt %. The index Z of tellurium (Te) is in the range of 0 wt %
Abstract:
A phase change material layer includes antimony (Sb) and at least one of indium (In) and gallium (Ga). A phase change memory device includes a storage node including a phase change material layer and a switching device connected to the storage node. The phase change material layer includes Sb and at least one of In and Ga.
Abstract:
A phase change material layer includes antimony (Sb) and at least one of indium (In) and gallium (Ga). A phase change memory device includes a storage node including a phase change material layer and a switching device connected to the storage node. The phase change material layer includes Sb and at least one of In and Ga.