公开(公告)号：US07195862B2

公开(公告)日：2007-03-27

申请号：US10720965

申请日：2003-11-24

申请人： Max Gmür ,  Thomas Fässler

发明人： Max Gmür ,  Thomas Fässler

IPC分类号： G03F7/00

CPC分类号： B23P15/007 ,  B01L3/5027 ,  B29C45/2628 ,  B29C45/2673 ,  B29C45/372 ,  B29L2031/756 ,  B81C99/0085 ,  B81C99/009

摘要： Process for producing a tool insert for injection molding a microstructured part fabricated of a synthetic material, a metal or a ceramic material and which comprises an arrangement of microchannels and which further comprises an arrangement of through-going orifices extending in a substantially perpendicular manner with respect to the outer surface of the part. The process comprises the following steps: (1) microstructuring the front side of a first wafer by means of plasma etching to form the arrangement of microchannels, which are formed on the front side of the wafer, (2) removing the etching mask from the front side of the first wafer, (3) microstructuring the rear side of the first wafer by means of plasma etching to form the arrangement of through-going orifices which extend in a substantially perpendicular manner with respect to the front side of the first wafer, (4) removing the etching mask from the rear side of the first wafer, (5) bonding the rear side of the first wafer to a carrier substrate to form a master, (6) electrochemically depositing a metal layer on the front side of the first wafer and in the through-going orifices which are present therein, wherein the deposited metal layer achieves a depth which is greater than the depth of the microchannels on the front side of the first wafer, and (7) separating the metal layer from the master, wherein the separated metal layer can be used as a tool insert for injection molding a part and has integrated in the metal layer piercing punches, each such punch having a shape and dimensions defined by the shape and dimensions of a corresponding one of the through-going orifices provided in the first wafer.

摘要翻译： 用于制造用于注射模制由合成材料，金属或陶瓷材料制成的微结构部件的工具插入件的方法，其包括微通道的布置，并且还包括以基本上垂直的方式延伸的贯穿孔的布置， 到零件的外表面。 该过程包括以下st

公开(公告)号：US08380020B2

公开(公告)日：2013-02-19

申请号：US12819598

申请日：2010-06-21

申请人： Tilo Callenbach ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

发明人： Tilo Callenbach ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

IPC分类号： G02B6/00 ,  G02B6/10 ,  G02B6/34

CPC分类号： G02B6/1221 ,  B29C33/38 ,  B29C33/424 ,  B29C45/0001 ,  B29C45/37 ,  B29C45/372 ,  B29C2045/7356 ,  B29D11/00009 ,  B29K2709/08 ,  G02B6/13 ,  G02B6/34 ,  G02B2006/12107 ,  Y10T428/12597 ,  Y10T428/315

摘要： The planar optical structure forms an evanescent-field measuring platform. A body is made from the thermoplastic plastic with a three-dimensionally structured surface, wherein molding is performed directly from a master made of glass coated with metal oxide, without deposition of further coatings on a surface of the master. The planar optical structure forming an evanescent-field measuring platform has a first essentially optically transparent, waveguiding layer (a) with a refractive index n1 and a second essentially optical transparent layer (b) with refractive index n2, where n1>n2, in a case of an embodiment of a planar optical film waveguide, or a metal layer (a′) and a second layer (b), in a case of an embodiment for generating a surface plasmon resonance, wherein the second layer (b) includes a material from a group of cyclo-olefin polymers and cyclo-olefin copolymers.

摘要翻译： 平面光学结构形成消逝场测量平台。 主体由具有三维结构化表面的热塑性塑料制成，其中模制由直接由金属氧化物涂覆的玻璃制成的主体进行，而不会在主体表面上沉积更多的涂层。 形成ev逝场测量平台的平面光学结构具有第一基本上光学透明的波导层（a），折射率n1和第二基本光学透明层（b）具有折射率n2，其中n1> n2，在 在用于产生表面等离子体共振的实施例的情况下，平面光学膜波导或金属层（a'）和第二层（b）的实施例的情况，其中第二层（b）包括材料 来自一组环烯烃聚合物和环烯烃共聚物。

公开(公告)号：US20100255461A1

公开(公告)日：2010-10-07

申请号：US12819598

申请日：2010-06-21

申请人： Tilo CALLENBACH ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

发明人： Tilo CALLENBACH ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

IPC分类号： G02B6/10 ,  G02B6/34 ,  G01N21/00 ,  C12Q1/02 ,  C12Q1/70 ,  G01N21/55

CPC分类号： G02B6/1221 ,  B29C33/38 ,  B29C33/424 ,  B29C45/0001 ,  B29C45/37 ,  B29C45/372 ,  B29C2045/7356 ,  B29D11/00009 ,  B29K2709/08 ,  G02B6/13 ,  G02B6/34 ,  G02B2006/12107 ,  Y10T428/12597 ,  Y10T428/315

摘要： The present invention relates to a method for manufacture a body from a thermoplastic plastic with a three-dimensionally structured surface, wherein molding is performed directly from a master made of glass coated with metal oxide, without deposition of further coatings on a surface of the master. The invention also relates to bodies manufactured with this method from a thermoplastic featuring a three-dimensionally structured surface, as well as to planar optical structures likewise manufactured with this method for generating evanescent-field measuring platforms and to a use thereof. The invention furthermore relates to a planar optical structure for generating an evanescent-field measuring platform, comprising a first essentially optical transparent, waveguiding layer (a) with refractive index n1 and a second essentially optical transparent layer (b) with refractive index n2, where n1>n2, in a case of an embodiment of a planar optical film waveguide, or comprising a metal layer (a′) and a second layer (b), in a case of an embodiment for generating a surface plasmon resonance, wherein the second layer (b) comprises a material from a group comprising cyclo-olefin polymers and cyclo-olefin copolymers.

摘要翻译： 本发明涉及一种由具有三维结构表面的热塑性塑料制造主体的方法，其中模制由直接由金属氧化物涂覆的玻璃制成的母板进行，而不会在母板的表面上沉积更多的涂层 。 本发明还涉及由具有三维结构化表面的热塑性材料制成的主体以及同样利用这种用于产生ev逝场测量平台的方法制造的平面光学结构及其用途。 本发明还涉及一种用于产生ev逝场测量平台的平面光学结构，包括具有折射率n1的第一基本上光学透明的波导层（a）和具有折射率n2的第二基本光学透明层（b），其中 n1> n2，在平面光学膜波导的实施例的情况下，或者在用于产生表面等离子体共振的实施例的情况下，包括金属层（a'）和第二层（b），其中第二 层（b）包括来自包含环烯烃聚合物和环烯烃共聚物的组的材料。

公开(公告)号：US07767131B2

公开(公告)日：2010-08-03

申请号：US10487998

申请日：2002-08-26

申请人： Tilo Callenbach ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

发明人： Tilo Callenbach ,  Max Gmür ,  Heinz Lüthi ,  Martin Andreas Bopp ,  Michael Pawlak ,  Markus Ehrat

IPC分类号： B29C45/16

CPC分类号： G02B6/1221 ,  B29C33/38 ,  B29C33/424 ,  B29C45/0001 ,  B29C45/37 ,  B29C45/372 ,  B29C2045/7356 ,  B29D11/00009 ,  B29K2709/08 ,  G02B6/13 ,  G02B6/34 ,  G02B2006/12107 ,  Y10T428/12597 ,  Y10T428/315

摘要： The present invention relates to a method for manufacture a body from a thermoplastic plastic with a three-dimensionally structured surface, wherein molding is performed directly from a master made of glass coated with metal oxide, without deposition of further coatings on a surface of the master. The invention also relates to bodies manufactured with this method from a thermoplastic featuring a three-dimensionally structured surface, as well as to planar optical structures likewise manufactured with this method for generating evanescent-field measuring platforms and to a use thereof. The invention furthermore relates to a planar optical structure for generating an evanescent-field measuring platform, comprising a first essentially optical transparent, waveguiding layer (a) with refractive index n1 and a second essentially optical transparent layer (b) with refractive index n2, where n1>n2, in a case of an embodiment of a planar optical film waveguide, or comprising a metal layer (a′) and a second layer (b), in a case of an embodiment for generating a surface plasmon resonance, wherein the second layer (b) comprises a material from a group comprising cyclo-olefin polymers and cyclo-olefin copolymers.

摘要翻译： 本发明涉及一种由具有三维结构表面的热塑性塑料制造主体的方法，其中模制由直接由金属氧化物涂覆的玻璃制成的母板进行，而不会在母板的表面上沉积更多的涂层 。 本发明还涉及由具有三维结构化表面的热塑性材料制成的主体以及同样利用这种用于产生ev逝场测量平台的方法制造的平面光学结构及其用途。 本发明还涉及一种用于产生ev逝场测量平台的平面光学结构，包括具有折射率n1的第一基本上光学透明的波导层（a）和具有折射率n2的第二基本光学透明层（b），其中 n1> n2，在平面光学膜波导的实施例的情况下，或者在用于产生表面等离子体共振的实施例的情况下，包括金属层（a'）和第二层（b），其中第二 层（b）包括来自包含环烯烃聚合物和环烯烃共聚物的组的材料。

公开(公告)号：US07425243B2

公开(公告)日：2008-09-16

申请号：US10958340

申请日：2004-10-06

申请人： Max Gmür

发明人： Max Gmür

IPC分类号： B29C65/00

CPC分类号： B29C66/9141 ,  B29C59/16 ,  B29C59/165 ,  B29C65/004 ,  B29C65/006 ,  B29C65/64 ,  B29C66/001 ,  B29C66/0018 ,  B29C66/02 ,  B29C66/026 ,  B29C66/03 ,  B29C66/54 ,  B29C66/71 ,  B29C66/731 ,  B29C66/73111 ,  B29C66/73112 ,  B29C66/7315 ,  B29C66/73921 ,  B29C66/742 ,  B29C66/744 ,  B29C66/7461 ,  B29C66/7465 ,  B29C66/8322 ,  B29C66/9161 ,  B29C66/919 ,  B29C66/91921 ,  B29C66/929 ,  B29C2035/0827 ,  B29K2023/00 ,  B29K2033/12 ,  B29K2705/00 ,  B29K2709/00 ,  B29K2709/02 ,  B29K2709/08 ,  B29L2031/756 ,  C08J5/121 ,  Y10T428/31938 ,  B29C65/00 ,  B29K2023/38

摘要： In a method of joining two workpieces (10, 16) without extraneous materials to produce a workpiece 25 which is joined over a joining area (24) which is formed by two fully adjoining surfaces (13, 13′) of the two workpieces (10, 16), with the first workpiece (16) being of plastic and the second workpiece (10) being of a material different from plastic, a strong bond is achieved even when the coefficients of thermal expansion of the workpieces are different by activating at least the surface (13′) of the first workpiece (16) by irradiation with high-energy radiation in a first step, bringing the surfaces (13, 13′) of the workpieces (10, 16) into contact in a second step and pressing the two workpieces (10, 16) against one another at room temperature, in particular at a temperature of from 15° C. to 30° C., to join them at the surfaces (13, 13′).

摘要翻译： 在没有外来材料的情况下接合两个工件（10,16）的方法中，以产生工件25，工件25在由两个工件（10）的两个完全相邻的表面（13,13'）形成的接合区域（24）上接合 ，16），其中第一工件（16）是塑料的，第二工件（10）是不同于塑料的材料，即使通过至少激活工件的热膨胀系数不同，也能实现强结合 通过第一步骤中的高能辐射照射第一工件（16）的表面（13'），使工件（10,16）的表面（13,13'）在第二步骤中接触并按压 两个工件（10,16）在室温下彼此相对，特别是在15℃至30℃的温度下，以将它们连接在表面（13,13'）处。

公开(公告)号：US07056649B2

公开(公告)日：2006-06-06

申请号：US10720402

申请日：2003-11-24

申请人： Max Gmür

发明人： Max Gmür

IPC分类号： G03C1/73 ,  H01L21/30

CPC分类号： B29C33/424 ,  B23P15/007 ,  B29C33/44 ,  B81C99/009

摘要： A process for producing microstructured tool insert for injection molding a part, the part being fabricated of a synthetic material, a metal or a ceramic material and including an arrangement of microstructures which are formed on an outer surface of the part and have two different predetermined depths. The process comprises the following steps: (1) microstructuring the front side of the first wafer by means of plasma etching to form an arrangement of first microstructures, which are formed on the front side of the wafer and which have a first predetermined depth, (2) microstructuring the rear side of the first wafer by means of plasma etching to form an arrangement of the second microstructures which form cavities which have a first orifice on the rear side of the first wafer and issue into the first microstructures on the front side of the first wafer or have a second orifice on the front side of the first wafer, (3) bonding the rear side of the first wafer to a carrier substrate to form a master, (4) electrochemically depositing a metal layer on the front side of the first wafer and in the cavities which are present therein and are formed by the second microstructures, and (5) separating the metal layer from the master, wherein the separated metal layer can be used as a tool insert for injection molding a part.

摘要翻译： 一种制造用于注射成型零件的微结构化刀具刀片的方法，该部件由合成材料，金属或陶瓷材料制成，并且包括形成在该零件的外表面上并具有两个不同预定深度的微结构的布置 。 该方法包括以下步骤：（1）通过等离子体蚀刻对第一晶片的前侧进行微结构，以形成第一微结构的布置，其形成在晶片的前侧并具有第一预定深度（ 2）通过等离子体蚀刻来微结构化第一晶片的后侧以形成第二微结构的布置，该第二微结构形成空腔，第一微孔在第一晶片的后侧具有第一孔，并发射到第一晶片的正面的第一微结构 第一晶片或在第一晶片的正面上具有第二孔，（3）将第一晶片的后侧粘合到载体基板以形成母板，（4）在前面的电化学沉积金属层 第一晶片和存在于其中并由第二微结构形成的空腔中，以及（5）将金属层与母板分离，其中分离的金属层可用作刀具插入件 用于注射成型零件。

公开(公告)号：US06764924B2

公开(公告)日：2004-07-20

申请号：US10720852

申请日：2003-11-24

申请人： Max Gmür

发明人： Max Gmür

IPC分类号： H01L2130

CPC分类号： B81C99/009 ,  B23P15/007 ,  B29C45/2673 ,  B29C45/372 ,  B29C2045/0094 ,  B29L2031/756

摘要： Process for producing a tool insert for injection molding a part which is produced from a synthetic material, a metal or a ceramic material and which comprises an arrangement of microstructures which are formed on an outer surface of the part and have a predetermined depth. The process comprises the following steps: photo-lithographically masking the front side of a first wafer with a first etching mask which corresponds to an arrangement of microstructures, microstructuring the first wafer by means of plasma etching the front side of the first wafer to form an arrangement of microstructures, the depth of which extends over the entire thickness of the first wafer, so that the microstructures form cavities which have an orifice on the front side and on the rear side of the first wafer respectively, removing the first etching mask from the front side of the first wafer, bonding the front side of the first wafer to a carrier substrate to form a master, electrochemically depositing a metal layer on the rear side of the first wafer and in the cavities which are present therein and are formed by the microstructures, and separating the metal layer from the master, wherein the separated metal layer can be used as a tool insert for injection molding a part.

摘要翻译： 用于制造用于注射成型由工具材料，金属或陶瓷材料制成的零件的工具插入件的方法，其包括形成在所述部件的外表面上并具有预定深度的微结构的布置。 该方法包括以下步骤：用对应于微结构布置的第一蚀刻掩模对第一晶片的前侧进行光刻掩模，通过等离子体蚀刻第一晶片的前侧来对第一晶片进行微结构化，以形成第 微结构的布置，其深度在第一晶片的整个厚度上延伸，使得微结构分别形成在第一晶片的前侧和后侧具有孔口的空腔，从第一晶片的前侧和后侧去除第一蚀刻掩模 在第一晶片的前侧，将第一晶片的前侧接合到载体基板以形成母版，在第一晶片的后侧和存在于其中的空腔中电化学沉积金属层，并由 微结构，并将金属层与母板分开，其中分离的金属层可以用作用于注射成型零件的工具刀片。