Polyarylene copolymers and proton-conductive membrane
    5.
    发明授权
    Polyarylene copolymers and proton-conductive membrane 有权
    聚亚芳基共聚物和质子传导膜

    公开(公告)号:US06812290B2

    公开(公告)日:2004-11-02

    申请号:US10303821

    申请日:2002-11-26

    IPC分类号: C08F836

    CPC分类号: C08G61/12 C07C45/46 C07C49/84

    摘要: A polyarylene copolymer which comprises (A) aromatic compound units having a main chain containing one or more electron-withdrawing groups therein and (B) aromatic compound units having a main chain containing no electron-withdrawing groups therein, and a proton-conductive membrane comprising the polyarylene copolymer having sulfonic acid groups.

    摘要翻译: 一种聚亚芳基共聚物,其包含(A)具有含有一个或多个吸电子基团的主链的芳香族化合物单元和(B)具有不含吸电子基团的主链的芳香族化合物单元,以及质子传导性膜, 所述聚亚芳基共聚物具有磺酸基。

    Polyarylene copolymers and proton-conductive membrane
    8.
    发明授权
    Polyarylene copolymers and proton-conductive membrane 有权
    聚亚芳基共聚物和质子传导膜

    公开(公告)号:US06555626B2

    公开(公告)日:2003-04-29

    申请号:US09818847

    申请日:2001-03-28

    IPC分类号: C08F836

    CPC分类号: C08G61/12 C07C45/46 C07C49/84

    摘要: A polyarylene copolymer which comprises (A) from 60 to 3 mol % aromatic compound units having a main chain containing one or more electron-withdrawing groups therein and (B) from 40 to 97 mol % aromatic compound units having a main chain containing no electron-withdrawing groups therein (provided that (A)+(B)=100 mol %), and a proton-conductive membrane comprising the polyarylene copolymer having sulfonic acid groups.

    摘要翻译: 一种聚亚芳基共聚物,其包含(A)60〜3摩尔%的含有一个或多个吸电子基团的主链的芳族化合物单元和(B)40〜97摩尔%的不含电子的主链的芳族化合物单元 (A)+(B)= 100摩尔%)和包含具有磺酸基的聚亚芳基共聚物的质子传导膜。

    Composition for film formation and material for insulating film formation
    9.
    发明授权
    Composition for film formation and material for insulating film formation 有权
    用于成膜和用于绝缘膜形成的材料的组合物

    公开(公告)号:US06376634B1

    公开(公告)日:2002-04-23

    申请号:US09585275

    申请日:2000-06-02

    IPC分类号: C09D18304

    CPC分类号: H01B3/46

    摘要: A composition for film formation which is useful as an interlayer insulating film material in the production of semiconductor devices and the like, and gives a coating film having excellent uniformity, low dielectric constant, low leakage current and excellent storage stability; and a material for insulating film formation using the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the formula (1): R1aSi(OR2)4−a, and (A-2) compounds represented by the formula (2): R3b(R4O)3−bSi—(R7)d—Si(OR5)3−cR6c; and (B) a compound represented by the formula (3): R8O (CHCH3CH2O)eR9.

    摘要翻译: 在半导体装置等的制造中,可用作层间绝缘膜材料的成膜用组合物,得到均匀性,低介电常数,低漏电流和优异的储存稳定性的涂膜; 以及使用该组合物的成膜绝缘材料。该组合物包含(A)通过水解和缩合至少一种选自(A-1)由式(1)表示的化合物的化合物 ):R1aSi(OR2)4-a和(A-2)由式(2)表示的化合物:R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c; 和(B)由式(3)表示的化合物:R8O(CHCH 3 CH 2 O)e R 9。