公开(公告)号：US20240260533A1

公开(公告)日：2024-08-08

申请号：US18566323

申请日：2022-05-25

申请人： Pak Chuen CHANG ,  Ryan You Wen BOEY ,  Paulina Li Mei CHANG

发明人： Pak Chuen CHANG ,  Ryan You Wen BOEY ,  Paulina Li Mei CHANG

IPC分类号： A01K1/00 ,  A01G9/24

CPC分类号： A01K1/0047 ,  A01G9/246

摘要： The invention relates to an apparatus for simulating one or more eco habitat conditions. The apparatus includes at least one eco capsule unit and an air inlet chamber for receiving air. The eco capsule unit includes a pressurized water driven turbine, a low-pressure vacuum chamber, a pressurized humid air chamber, where the pressurized water driven turbine is configured to receive pressurized water to propel the pressurized water driven turbine, for generating a highly humidified air-water mixture and a pressurized humid air-water vapor by creating turbulence. The vacuum chamber is configured to enable a wind chill simulation and to remove heat from water for generating a water with reduced temperature by controlling the rate of evaporation of water. The pressurized humid air chamber is configured to capture the turbulence created water-pollutant mixture, highly humidified air-water mixture and the pressurized humid air-water vapor, to be expelled or recycled via an air blower or a humid air exhaust, for removing pollutants from the air to generate purified air with a desirable temperature.

公开(公告)号：USD982978S1

公开(公告)日：2023-04-11

申请号：US29794967

申请日：2021-06-16

申请人： Yu-Mei Chang ,  Cheng-Hui Huang

设计人： Yu-Mei Chang ,  Cheng-Hui Huang

公开(公告)号：US10312570B2

公开(公告)日：2019-06-04

申请号：US15693499

申请日：2017-09-01

申请人： Chi Ju Wu ,  Shirl Mei Chang ,  Alexander Chan ,  Chin Hsien Ting ,  Hsi Jui Chan

发明人： Chi Ju Wu ,  Shirl Mei Chang ,  Alexander Chan ,  Chin Hsien Ting ,  Hsi Jui Chan

IPC分类号： H01Q13/00 ,  H01Q1/22 ,  G06K19/077 ,  H01Q1/38 ,  H01Q7/00 ,  H01Q13/18

摘要： A long-distance radio frequency anti-metal identification tag is provided. When a bottom surface of an insulating spacer plate is attached to the surface of a metal object and an electronic tag reading device is used to read a radio frequency identification chip on a second antenna. A resonant cavity is formed between a slot of a first antenna and the surface of the metal object through the isolation of the insulating spacer plate, such that the second antenna located at the position of the resonant cavity resonates with an electromagnetic wave signal reflected on the surface of the metal object by the first antenna. The electromagnetic wave signal is transmitted to the radio frequency identification chip, or the feedback signal of the radio frequency identification chip is transmitted out. The overall UHF electronic tag is resistant to a metal interference and has the performance of long-distance reading.

公开(公告)号：US09447154B2

公开(公告)日：2016-09-20

申请号：US12358954

申请日：2009-01-23

申请人： Wayne R. Thomas ,  Kaw-Yan Chua ,  Bruce L. Rogers ,  Mei-chang Kuo

发明人： Wayne R. Thomas ,  Kaw-Yan Chua ,  Bruce L. Rogers ,  Mei-chang Kuo

IPC分类号： A61K39/00 ,  A61K39/395 ,  C07K16/00 ,  C12P21/08 ,  C07K14/435 ,  A61K38/00

CPC分类号： C07K14/43531 ,  A61K38/00

摘要： Isolated nucleic acids encoding an allergen of Dermatophagoides pteronyssinus, Der p III, are disclosed. A cDNA encoding a peptide having a Der p III activity and a predicted molecular weight of about 24,985 daltons is also described. The nucleic acids can be used as probes to detect the presence of Der p III nucleic acid in a sample or for the recombinant production of peptides having an activity of Der p III. Peptides having an activity of Der p III can be used in compositions suitable for pharmaceutical administration or methods of diagnosing sensitivity to house dust mites.

摘要翻译： 公开了编码Dermatophagoides pteronyssinus，Der p III的变应原的分离的核酸。 还描述了编码具有Der p III活性和约24,985道尔顿的预测分子量的肽的cDNA。 核酸可以用作探针，以检测样品中Der p III核酸的存在或重组产生具有Der p III活性的肽。 具有Der p III活性的肽可用于适用于药物施用的组合物或诊断对尘螨敏感性的方法。

公开(公告)号：US09274774B2

公开(公告)日：2016-03-01

申请号：US11261953

申请日：2005-10-28

申请人： Sorin Jianu ,  Sundar Pichai ,  Jocelyn Lin ,  Ann Mei Chang ,  Othman Laraki ,  Joerg Heilig ,  John Fu ,  Shankar Ganesh ,  Jian Li ,  Jesse Savage ,  Carl Schedvin

发明人： Sorin Jianu ,  Sundar Pichai ,  Jocelyn Lin ,  Ann Mei Chang ,  Othman Laraki ,  Joerg Heilig ,  John Fu ,  Shankar Ganesh ,  Jian Li ,  Jesse Savage ,  Carl Schedvin

IPC分类号： G06F9/445 ,  H04L29/08

CPC分类号： G06F8/61 ,  G06F8/65 ,  H04L63/123 ,  H04L67/02 ,  H04L67/34

摘要： Systems and techniques to provide for software installation. In general, in one implementation, the technique includes detecting selection of one or more applications by a user; creating a manifest for the one or more applications, the manifest including a reference to the one or more applications and a reference to one or more installers, where each of the one or more applications is associated with a unique one of the one or more installers; and providing the manifest to a target system where each of the one or more applications can be installed, none of the applications or installers being provided in the manifest.

公开(公告)号：US09004006B2

公开(公告)日：2015-04-14

申请号：US13095720

申请日：2011-04-27

申请人： Chien-Teh Kao ,  Hyman W. H. Lam ,  Mei Chang ,  David T. Or ,  Nicholas R. Denny ,  Xiaoxiong Yuan

发明人： Chien-Teh Kao ,  Hyman W. H. Lam ,  Mei Chang ,  David T. Or ,  Nicholas R. Denny ,  Xiaoxiong Yuan

IPC分类号： C23C16/00 ,  C23C16/455 ,  C23C16/505 ,  H01J37/32

CPC分类号： C23C16/45536 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244

摘要： An apparatus and a method for depositing materials, and more particularly a vapor deposition chamber configured to deposit a material during a plasma-enhanced process are provided. In one embodiment a chamber comprises a chamber body defining a process volume, a substrate support disposed in the process volume and configured to support one or more substrates, a process lid assembly disposed over the substrate support, wherein the process lid assembly has a plasma cavity configured to generate a plasma and provide one or more radical species to the process volume, a RF (radio frequency) power source coupled to the gas distribution assembly, a plasma forming gas source coupled with the process lid assembly, and a reactant gas source coupled with the process lid assembly.

摘要翻译： 提供一种用于沉积材料的装置和方法，更具体地，提供了在等离子体增强过程期间配置成沉积材料的气相沉积室。 在一个实施例中，室包括限定处理体积的室主体，设置在处理容积中并被配置为支撑一个或多个基板的基板支撑件，设置在基板支撑件上方的过程盖组件，其中处理盖组件具有等离子体腔 被配置为产生等离子体并且为处理体积提供一个或多个自由基物质，耦合到气体分配组件的RF（射频）功率源，与处理盖组件耦合的等离子体形成气体源，以及反应气体源 与工艺盖组件。

公开(公告)号：US20140283872A1

公开(公告)日：2014-09-25

申请号：US14277010

申请日：2014-05-13

申请人： Martin DEEHAN ,  Matt Cheng-Hsiung TSAI ,  Nan LU ,  David T. OR ,  Mei CHANG

发明人： Martin DEEHAN ,  Matt Cheng-Hsiung TSAI ,  Nan LU ,  David T. OR ,  Mei CHANG

IPC分类号： H01J37/32

CPC分类号： H01J37/32862 ,  B08B7/0035 ,  H01L21/67069

摘要： Embodiments of the present invention generally include an apparatus for plasma cleaning and a method for plasma cleaning. Periodically, a PVD chamber may need to be cleaned to remove material that has built up in undesired locations within the chamber. Additionally, the sputtering target may need to be replaced. By removing the sputtering target and placing a grounded chamber lid in its place, the chamber may be plasma cleaned. The susceptor within the chamber may be electrically biased with an RF current. A stationary magnet assembly may be substantially centered behind the grounded lid to focus the cleaning plasma on the susceptor. Following the plasma cleaning, the magnet and lid may be removed and the sputtering target may be coupled to the chamber to continue processing.

摘要翻译： 本发明的实施例通常包括用于等离子体清洗的装置和等离子体清洗方法。 定期地，可能需要清洁PVD室以除去已经积聚在室内不期望的位置的材料。 此外，可能需要更换溅射靶。 通过去除溅射靶并将接地的室盖放置在其位置，可以对腔室进行等离子体清洁。 室内的基座可以用RF电流电偏置。 固定磁体组件可以基本上位于接地盖的后面，以将清洁等离子体聚焦在基座上。 在等离子体清洁之后，可以去除磁体和盖子，并且溅射靶可以连接到腔室以继续加工。

公开(公告)号：US08747686B2

公开(公告)日：2014-06-10

申请号：US13360633

申请日：2012-01-27

申请人： Bo Zheng ,  Mei Chang ,  Arvind Sundarrajan

发明人： Bo Zheng ,  Mei Chang ,  Arvind Sundarrajan

IPC分类号： G01L21/30 ,  G01R31/00

CPC分类号： C23C14/54 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/4404 ,  C23C16/52

摘要： Methods and substrate processing systems for analyzing an end point of a process are provided. By-products of the process are detected and monitored to determine the completion of various types of reaction processes within a substrate processing chamber. The methods provide real time process monitoring, thereby reducing the need to rigidly constrain other substrate processing parameters, increasing chamber cleaning efficiency, and/or increasing substrate processing throughput.

摘要翻译： 提供了用于分析过程终点的方法和底物处理系统。 检测和监测该方法的副产物以确定基材处理室内各种类型的反应过程的完成。 这些方法提供了实时过程监控，从而减少了刚性限制其他衬底处理参数，提高室清洁效率和/或增加衬底处理生产量的需要。

公开(公告)号：US08721796B2

公开(公告)日：2014-05-13

申请号：US12582905

申请日：2009-10-21

申请人： Martin Deehan ,  Matt Cheng-Hsiung Tsai ,  Nan Lu ,  David T. Or ,  Mei Chang

发明人： Martin Deehan ,  Matt Cheng-Hsiung Tsai ,  Nan Lu ,  David T. Or ,  Mei Chang

IPC分类号： B08B6/00

CPC分类号： H01J37/32862 ,  B08B7/0035 ,  H01L21/67069

摘要： Embodiments of the present invention generally include an apparatus for plasma cleaning and a method for plasma cleaning. The apparatus can include a lid body having a first surface for facing a pedestal during cleaning and a second surface opposite the first surface and substantially parallel to the first surface, the second surface having a first indentation sized to receive a magnet assembly, one or more handles coupled to the second surface of the lid body, and the magnet assembly resting in the first indentation. The method can include removing a sputtering target from the processing chamber, sealing the processing chamber, introducing a gas into the processing chamber, applying an RF bias to a pedestal within the processing chamber, maintaining the pedestal at a substantially constant temperature, and removing material from the pedestal to clean the pedestal.

摘要翻译： 本发明的实施例通常包括用于等离子体清洗的装置和等离子体清洗方法。 该装置可以包括盖体，其具有用于在清洁期间面对基座的第一表面和与第一表面相对的第二表面并且基本上平行于第一表面，第二表面具有第一压痕，其尺寸设置成接收磁体组件，一个或多个 联接到盖体的第二表面的手柄，以及静止在第一压痕中的磁体组件。 该方法可以包括从处理室移除溅射靶，密封处理室，将气体引入处理室，向处理室内的基座施加RF偏压，将基座保持在基本恒定的温度，以及去除材料 从基座上清洁基座。

公开(公告)号：US08642473B2

公开(公告)日：2014-02-04

申请号：US13411398

申请日：2012-03-02

申请人： Mei Chang ,  Linh Thanh ,  Bo Zheng ,  Arvind Sundarrajan ,  John C. Forster ,  Umesh M. Kellkar ,  Murali K. Narasimhan

发明人： Mei Chang ,  Linh Thanh ,  Bo Zheng ,  Arvind Sundarrajan ,  John C. Forster ,  Umesh M. Kellkar ,  Murali K. Narasimhan

IPC分类号： H01L21/311

CPC分类号： H01L21/02063 ,  H01L21/76802 ,  H01L21/76814 ,  H01L21/76829

摘要： Methods and apparatus for removing oxide from a surface, the surface comprising at least one of silicon and germanium, are provided. The method and apparatus are particularly suitable for removing native oxide from a metal silicide layer of a contact structure. The method and apparatus advantageously integrate both the etch stop layer etching process and the native oxide removal process in a single chamber, thereby eliminating native oxide growth or other contaminates redeposit during the substrate transfer processes. Furthermore, the method and the apparatus also provides the improved three-step chemical reaction process to efficiently remove native oxide from the metal silicide layer without adversely altering the geometry of the contact structure and the critical dimension of the trenches or vias formed in the contact structure.

摘要翻译： 提供了从表面除去氧化物的方法和装置，所述表面包括硅和锗中的至少一种。 所述方法和装置特别适用于从接触结构的金属硅化物层去除天然氧化物。 该方法和装置有利地将蚀刻停止层蚀刻工艺和自然氧化物去除工艺集成在单个室中，从而在衬底转移过程期间消除自然氧化物生长或其它污染物再沉积。 此外，该方法和装置还提供了改进的三步化学反应过程，以有效地从金属硅化物层去除天然氧化物，而不会不利地改变接触结构的几何形状和形成在接触结构中的沟槽或通孔的临界尺寸 。