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    INSPECTION APPARATUS AND INSPECTION SYSTEM
    2.
    发明申请
    INSPECTION APPARATUS AND INSPECTION SYSTEM 审中-公开
    检查装置和检查系统

    公开(公告)号：US20130250297A1

    公开(公告)日：2013-09-26

    申请号：US13990103

    申请日：2011-10-11

    申请人： Masaaki Ito ,  Minori Noguchi

    发明人： Masaaki Ito ,  Minori Noguchi

    IPC分类号： G01N21/95

    CPC分类号： G01N21/9501 ,  G01N21/95607

    摘要： Disclosed here is a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed thereon, the apparatus being capable of detecting abnormalities in dimension and size with high sensitivity.The inspection apparatus for a sample having pattern formed thereon includes: an illumination optical system which illuminates the sample having the pattern formed thereon; a detection optical system which receives scattered light from the pattern; an imaging device which is disposed over a pupil plane of the detection optical system, the imaging device acquiring Fourier images of the pattern; and a processing unit which compares the Fourier images with the Fourier image of the normal pattern to detect an irregularity of the pattern.

    摘要翻译： 这里公开了一种用于诸如其上形成有图案的半导体晶片的样品的宏观检查装置，该装置能够以高灵敏度检测尺寸和尺寸的异常。 用于其上形成有图案的样品的检查装置包括：照射具有形成在其上的图案的样品的照明光学系统; 检测光学系统，其接收来自图案的散射光; 成像装置，其设置在所述检测光学系统的光瞳平面上，所述成像装置获取所述图案的付里叶图像; 以及处理单元，其将傅立叶图像与正常图案的傅里叶图像进行比较，以检测图案的不规则性。

    Inspection Equipment and Inspection Method
    3.
    发明申请
    Inspection Equipment and Inspection Method 有权
    检验设备检验方法

    公开(公告)号：US20130187667A1

    公开(公告)日：2013-07-25

    申请号：US13701678

    申请日：2011-06-17

    申请人： Masami Makuuchi ,  Minori Noguchi ,  Hiroshi Kawaguchi

    发明人： Masami Makuuchi ,  Minori Noguchi ,  Hiroshi Kawaguchi

    IPC分类号： G01N27/24

    CPC分类号： G01N27/24 ,  H01M10/052 ,  H01M10/058 ,  H01M10/4285 ,  H01M10/44 ,  H01M10/48 ,  Y02T10/7011

    摘要： Foreign metal inspection equipment is provided with: a conveying device for conveying a sample to be subjected to inspection; electrodes positioned so as to face the surface of the sample; a measurement device for measuring the capacitance between the electrodes and the sample being conveyed by the conveying device; and a processing unit that inspects for foreign metal mixed in the sample on the basis of the change in capacitance measured by the measurement device.

    摘要翻译： 外国金属检验设备设有：用于输送要进行检查的样品的输送装置; 电极定位成面对样品的表面; 用于测量由所述输送装置输送的所述电极和所述样品之间的电容的测量装置; 以及处理单元，其基于由测量装置测量的电容变化来检查样品中混合的外来金属。

    PATTERN DEFECT INSPECTION APPARATUS AND METHOD
    4.
    发明申请
    PATTERN DEFECT INSPECTION APPARATUS AND METHOD 有权
    图案缺陷检查装置及方法

    公开(公告)号：US20120268734A1

    公开(公告)日：2012-10-25

    申请号：US13535955

    申请日：2012-06-28

    申请人： Hidetoshi NISHIYAMA ,  Kei SHIMURA ,  Sachio UTO ,  Minori NOGUCHI

    发明人： Hidetoshi NISHIYAMA ,  Kei SHIMURA ,  Sachio UTO ,  Minori NOGUCHI

    IPC分类号： G01N21/01

    CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

    摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

    摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

    SURFACE INSPECTION APPARATUS AND METHOD THEREOF
    6.
    发明申请
    SURFACE INSPECTION APPARATUS AND METHOD THEREOF 有权
    表面检查装置及其方法

    公开(公告)号：US20120069329A1

    公开(公告)日：2012-03-22

    申请号：US13114160

    申请日：2011-05-24

    申请人： Ichiro ISHIMARU ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

    发明人： Ichiro ISHIMARU ,  Minori Noguchi ,  Ichiro Moriyama ,  Yoshikazu Tanabe ,  Yasuo Yatsugake ,  Yukio Kenbou ,  Kenji Watanabe ,  Hirofumi Tsuchiyama

    IPC分类号： G01N21/88

    CPC分类号： G01N21/88 ,  G01N21/474 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8825 ,  G01N2021/8854

    摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.

    摘要翻译： 一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光 从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。