Dry cleaning method for plasma processing apparatus
    1.
    发明授权
    Dry cleaning method for plasma processing apparatus 有权
    等离子体处理设备的干洗方法

    公开(公告)号:US08133325B2

    公开(公告)日:2012-03-13

    申请号:US12598081

    申请日:2008-05-28

    CPC classification number: H01J37/32091 H01J37/321 H01J37/32862 Y10S428/905

    Abstract: This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar electrode and a high-frequency antenna that are provided outside the dielectric member; and a high-frequency power source that supplies high-frequency power to both the high-frequency antenna and the planar electrode, to thereby introduce high-frequency power into the vacuum container via the dielectric member and produce an inductively-coupled plasma, the method comprising the steps of: introducing a gas including fluorine into the vacuum container and also introducing high-frequency power into the vacuum container from the high-frequency power source, to thereby produce an inductively-coupled plasma in the gas including fluorine; and by use of the inductively-coupled plasma, removing a product including at least one of a precious metal and a ferroelectric that is adhered to the dielectric member.

    Abstract translation: 等离子体处理装置的干式清洗方法是等离子体处理装置的干式清洗方法,其特征在于,包括:设置有电介质部件的真空容器; 设置在电介质构件外部的平面电极和高频天线; 以及向高频天线和平面电极提供高频电力的高频电源,从而通过电介质构件将高频电力引入真空容器,并产生电感耦合等离子体,该方法 包括以下步骤:将包含氟的气体引入真空容器,并将高频电力从高频电源引入真空容器中,从而在包括氟的气体中产生电感耦合等离子体; 并且通过使用电感耦合等离子体,去除包括粘附到电介质构件的贵金属和铁电体中的至少一种的产品。

    Silicon wafer cleaning method
    2.
    发明申请
    Silicon wafer cleaning method 有权
    硅片清洗方法

    公开(公告)号:US20070034229A1

    公开(公告)日:2007-02-15

    申请号:US11499142

    申请日:2006-08-04

    Abstract: A silicon wafer cleaning method, comprising a first cleaning process, in which, after completion of mirror polishing of the surface, the silicon wafer is immersed in a non-ionic surfactant aqueous solution; a second cleaning process, in which the wafer, after completion of the first cleaning process, is immersed in a dissolved-ozone aqueous solution; and, a third cleaning process, in which the wafer, after completion of the second cleaning process, is immersed in an aqueous solution containing ammonia and hydrogen peroxide; and in which the processes are performed in succession.

    Abstract translation: 一种硅晶片清洗方法,包括第一清洁工艺,其中在完成表面的镜面抛光之后,将硅晶片浸入非离子表面活性剂水溶液中; 第二清洗工序,将第一清洗工序完成后的晶片浸入溶解的臭氧水溶液中; 以及第三清洗处理,其中在完成第二清洗处理之后将晶片浸入含有氨和过氧化氢的水溶液中; 并且其中连续执行处理。

    Pneumatic booster
    3.
    发明授权
    Pneumatic booster 失效
    气动助力器

    公开(公告)号:US4469009A

    公开(公告)日:1984-09-04

    申请号:US378232

    申请日:1982-05-14

    CPC classification number: B60T13/57 B60T13/5675

    Abstract: A pneumatic booster includes a housing, a power piston and flexible diaphragm assembly partitioning the interior of the housing into two chambers, a poppet valve mechanism for selectively connecting or disconnecting communication between the two chambers and disconnecting or connecting communication between one of the chambers and a reference pressure, an input rod for actuating the poppet valve mechanism and an output rod connected to the power piston. The poppet valve mechanism includes a plunger connected to the inner end of the input rod, a valve member, a valve body having an axial bore therein for slidably receiving the plunger, and a restricting member mounted on the plunger for restricting the relative axial displacement of the plunger and the valve body. A resilient member is interposed between the restricting member and the valve body to avoid impacting abutment between the restricting member and the valve body.

    Abstract translation: 气动升压器包括壳体,动力活塞和将壳体内部分成两个腔室的柔性隔膜组件;提升阀机构,用于选择性地连接或断开两个室之间的连通,并且断开或连接其中一个室和一个室之间的连通 参考压力,用于致动提升阀机构的输入杆和连接到动力活塞的输出杆。 提升阀机构包括连接到输入杆的内端的柱塞,阀构件,其中具有用于可滑动地容纳柱塞的轴向孔的阀体,以及安装在柱塞上用于限制相对轴向位移的限制构件 柱塞和阀体。 弹性构件设置在限制构件和阀体之间,以避免撞击在限制构件与阀体之间的邻接。

    Pneumatic booster
    4.
    发明授权
    Pneumatic booster 有权
    气动助力器

    公开(公告)号:US08631735B2

    公开(公告)日:2014-01-21

    申请号:US12591626

    申请日:2009-11-25

    CPC classification number: B60T13/567

    Abstract: There is provided a pneumatic booster, comprising: a front shell; a rear shell; a housing formed as that respective openings of the front shell and the rear shell are integrally connected to each other, and a power piston arranged in the housing so as to divide an interior of the housing into a constant-pressure chamber on the front shell side and a working-pressure chamber on the rear shell side, wherein thrust force of the power piston generated by pressure difference between the constant-pressure chamber and the working-pressure chamber is applied to inputted force transmitted from a brake pedal to an input rod so as to obtain combined force, the combined force being outputted with a given boost ratio from an output rod, and wherein a thickness of the front shell is made to be thinner than a thickness of the rear shell.

    Abstract translation: 提供一种气动助力器,包括:前壳; 后壳 形成为前壳体和后壳体的相应开口的壳体彼此一体地连接;以及动力活塞,其布置在壳体中,以将壳体的内部分隔成前壳侧的恒压室 以及在后壳侧的工作压力室,其中由定压室和工作压力室之间的压力差产生的动力活塞的推力施加到从制动踏板传递到输入杆的输入力,因此 为了获得组合的力,组合力从输出杆以给定的增压比输出,并且其中前壳的厚度被制成比后壳的厚度薄。

    ETCHING METHOD AND ETCHING APPARATUS
    5.
    发明申请
    ETCHING METHOD AND ETCHING APPARATUS 审中-公开
    蚀刻方法和蚀刻装置

    公开(公告)号:US20100213170A1

    公开(公告)日:2010-08-26

    申请号:US12597602

    申请日:2008-06-19

    Abstract: An etching method which uses an apparatus having a chamber in which an etching gas is excited by plasma; a table arranged in the chamber which heats a substrate mounted thereon; and a frame member which includes etching-endurable material which is arranged around the table, and which has an upper surface arranged at a position lower than an upper surface of the table, the etching method including: arranging the substrate on the upper surface of the table such that a peripheral part of the substrate projects above the table; and arranging the substrate such that a ratio of a height from the upper surface of the frame member to a bottom surface of the substrate and a projecting length from a side surface of the table to an outer circumference of the substrate is 1.5 or more

    Abstract translation: 一种蚀刻方法,其使用具有其中蚀刻气体被等离子体激发的室的装置; 设置在所述室中的加热安装在其上的基板的台; 以及框架构件,其包括布置在工作台周围的耐腐蚀材料,并且具有布置在比工作台的上表面低的位置的上表面,所述蚀刻方法包括:将所述衬底布置在所述衬底的上表面上 使得基板的周边部分在工作台上方突出; 以及将所述基板从所述框架构件的上表面的高度与所述基板的底面的高度与从所述台的侧面到所述基板的外周的突出长度的比例设定为1.5以上

    Pneumatic booster
    6.
    发明申请
    Pneumatic booster 有权
    气动助力器

    公开(公告)号:US20100132543A1

    公开(公告)日:2010-06-03

    申请号:US12591626

    申请日:2009-11-25

    CPC classification number: B60T13/567

    Abstract: There is provided a pneumatic booster, comprising: a front shell; a rear shell; a housing formed as that respective openings of the front shell and the rear shell are integrally connected to each other, and a power piston arranged in the housing so as to divide an interior of the housing into a constant-pressure chamber on the front shell side and a working-pressure chamber on the rear shell side, wherein thrust force of the power piston generated by pressure difference between the constant-pressure chamber and the working-pressure chamber is applied to inputted force transmitted from a brake pedal to an input rod so as to obtain combined force, the combined force being outputted with a given boost ratio from an output rod, and wherein a thickness of the front shell is made to be thinner than a thickness of the rear shell.

    Abstract translation: 提供一种气动助力器,包括:前壳; 后壳 形成为前壳体和后壳体的相应开口的壳体彼此一体地连接;以及动力活塞,其布置在壳体中,以将壳体的内部分隔成前壳侧的恒压室 以及在后壳侧的工作压力室,其中由定压室和工作压力室之间的压力差产生的动力活塞的推力施加到从制动踏板传递到输入杆的输入力,因此 为了获得组合的力,组合力从输出杆以给定的增压比输出,并且其中前壳的厚度被制成比后壳的厚度薄。

    Pneumatic servo booster
    7.
    发明授权
    Pneumatic servo booster 失效
    气动伺服助力器

    公开(公告)号:US4535680A

    公开(公告)日:1985-08-20

    申请号:US566385

    申请日:1983-12-28

    CPC classification number: B60T13/569 B60T13/5675

    Abstract: A pneumatic servo booster including a housing, a power piston unit partitioning the interior of the housing into front and rear chambers and having therein a first passage with one end opening to the front chamber and the other end opening to the interior of the power piston unit and a second passage with one end opening to the rear chamber and the other end opening to the interior of the power piston unit, and a valve mechanism provided in the interior of the power piston unit and being associated with an input rod to control the communication between first and second passages and between the second passage and another passage which is communicated with a source of a first reference pressure. A plurality of diversion channels are provided in at least one of the first and second passages to decrease the speed of the air flow in the passage and to rectify the air flow thereby suppressing noise.

    Abstract translation: 一种气动伺服助力器,包括壳体,动力活塞单元,其将壳体的内部分隔成前室和后室,并且在其中具有第一通道,一端开口到前室,另一端开口通向动力活塞单元的内部 以及第二通道,其一端通向后室,而另一端通向动力活塞单元的内部;以及阀机构,其设置在动力活塞单元的内部并与输入杆相关联以控制通信 在第一和第二通道之间以及在第二通道和与第一参考压力源连通的另一通道之间。 在第一通道和第二通道中的至少一个通道中设置多个转向通道,以降低通道中的空气流速并且整流气流,从而抑制噪音。

    Pneumatic booster with tubular portion for separately directing air to
silencers
    8.
    发明授权
    Pneumatic booster with tubular portion for separately directing air to silencers 失效
    气动助力器,带有管状部分,用于将空气分开引导至消声器

    公开(公告)号:US5090294A

    公开(公告)日:1992-02-25

    申请号:US608485

    申请日:1990-11-01

    Inventor: Mitsuhiro Endou

    CPC classification number: B60T13/52

    Abstract: A pneumatic booster includes a casing, a valve body axially movably disposed in the casing and having a tubular portion extending backward to the outside of the casing and open at the rear end thereof, a set of a power piston and a diaphragm fixedly mounted on the valve body and partitioning the interior of the casing into a constant pressure chamber communicating with a negative pressure source and a variable pressure chamber adapted to selectively communicate with the negative source and the ambient air, a valve unit disposed in the tubular portion of the valve body for selectively placing the variable pressure chamber in communication with the negative pressure source and the ambient air, an input rod extending into the tubular portion of the valve body for actuating the valve unit, and an output rod connected to the valve body. The pneumatic booster further includes a plurality of silencers disposed in the tubular portion between the valve unit and the rear open end of the valve body and a partitioning member disposed in the tubular portion for defining a plurality of air passages for separately directing air to the respective silencers.

    Abstract translation: 气动助力器包括壳体,轴向可移动地设置在壳体中的阀体,并且具有向后延伸到壳体的外部并在其后端开口的管状部分,一组动力活塞和隔膜,固定地安装在壳体上 阀体并将壳体的内部分隔成与负压源连通的恒压室和适于与负源和环境空气选择性连通的可变压力室;阀单元,设置在阀体的管状部分中 用于选择性地将可变压力室与负压源和环境空气连通,延伸到阀体的管状部分中以用于致动阀单元的输入杆和连接到阀体的输出杆。 气动助力器还包括设置在阀单元和阀体的后开口端之间的管状部分中的多个消声器,以及设置在管状部分中的分隔构件,用于限定多个空气通道,用于将空气分别引导到相应的 消声器

    DRY CLEANING METHOD FOR PLASMA PROCESSING APPARATUS
    10.
    发明申请
    DRY CLEANING METHOD FOR PLASMA PROCESSING APPARATUS 有权
    用于等离子体处理装置的干燥清洗方法

    公开(公告)号:US20100083981A1

    公开(公告)日:2010-04-08

    申请号:US12598081

    申请日:2008-05-28

    CPC classification number: H01J37/32091 H01J37/321 H01J37/32862 Y10S428/905

    Abstract: This dry cleaning method for a plasma processing apparatus is a dry cleaning method for a plasma processing apparatus that includes: a vacuum container provided with a dielectric member; a planar electrode and a high-frequency antenna that are provided outside the dielectric member; and a high-frequency power source that supplies high-frequency power to both the high-frequency antenna and the planar electrode, to thereby introduce high-frequency power into the vacuum container via the dielectric member and produce an inductively-coupled plasma, the method comprising the steps of: introducing a gas including fluorine into the vacuum container and also introducing high-frequency power into the vacuum container from the high-frequency power source, to thereby produce an inductively-coupled plasma in the gas including fluorine; and by use of the inductively-coupled plasma, removing a product including at least one of a precious metal and a ferroelectric that is adhered to the dielectric member.

    Abstract translation: 等离子体处理装置的干式清洗方法是等离子体处理装置的干式清洗方法,其特征在于,包括:设置有电介质部件的真空容器; 设置在电介质构件外部的平面电极和高频天线; 以及向高频天线和平面电极提供高频电力的高频电源,从而通过电介质构件将高频电力引入真空容器,并产生电感耦合等离子体,该方法 包括以下步骤:将包含氟的气体引入真空容器,并将高频电力从高频电源引入真空容器中,从而在包括氟的气体中产生电感耦合等离子体; 并且通过使用电感耦合等离子体,去除包括粘附到电介质构件的贵金属和铁电体中的至少一种的产品。

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