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公开(公告)号：US11894429B2
公开(公告)日：2024-02-06
申请号：US17851868
申请日：2022-06-28
发明人： Yoshiomi Hiroi , Shinichi Maeda
IPC分类号： H01L29/24 , H01L21/02 , H01L29/786 , C04B35/626 , C04B35/01 , C04B35/453
CPC分类号： H01L29/247 , C04B35/01 , C04B35/453 , C04B35/62625 , C04B35/62675 , H01L21/02554 , H01L21/02565 , H01L21/02592 , H01L21/02628 , H01L29/78693 , C04B2235/3284 , C04B2235/3286 , C04B2235/3293
摘要： Methods for producing the amorphous metal oxide semiconductor layer where amorphous metal oxide semiconductor layer is formed by use of a precursor composition containing a metal salt, a primary amide, and a water-based solution. The methodology for producing the amorphous metal oxide semiconductor layer includes applying the precursor composition onto a substrate to form a precursor film, and firing the film at a temperature of 150° C. or higher and lower than 300° C.
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公开(公告)号：US20230324802A1
公开(公告)日：2023-10-12
申请号：US18207934
申请日：2023-06-09
IPC分类号： G03F7/11 , C08G12/26 , C09D161/26 , G03F7/20 , G03F7/40 , C08G16/02 , H01L21/027
CPC分类号： G03F7/11 , C08G12/26 , C09D161/26 , G03F7/2002 , G03F7/40 , C08G16/0268 , G03F7/2059 , H01L21/0274
摘要： A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):
wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.-
公开(公告)号：US11771645B2
公开(公告)日：2023-10-03
申请号：US17469958
申请日：2021-09-09
IPC分类号： A61K9/00 , A61K47/10 , A61K47/12 , A61K47/42 , A61K9/06 , A61K38/28 , A61K47/18 , A61K31/728 , A61K8/02 , A61K8/34 , A61K8/36 , A61K8/60 , A61K8/64 , A61K47/26 , A61Q19/00
CPC分类号： A61K9/0014 , A61K8/0229 , A61K8/345 , A61K8/361 , A61K8/608 , A61K8/64 , A61K9/06 , A61K31/728 , A61K38/28 , A61K47/10 , A61K47/12 , A61K47/183 , A61K47/26 , A61K47/42 , A61Q19/00 , A61K2800/10
摘要： A transdermally absorbable base material including: a lipid peptide compound including at least one of compound of Formula (1) below and the similar compounds or pharmaceutically usable salts thereof; a surfactant; a specific polyhydric alcohol; a fatty acid; and water,
wherein R1 is a C9-23 aliphatic group; R2 is a hydrogen atom or a C1-4 alkyl group that optionally has a branched chain having a carbon atom number of 1 or 2; R3 is a —(CH2)n—X group; n is a number of 1 to 4; and X is amino group, guanidino group, —CONH2 group, or a 5-membered cyclic group optionally having 1 to 3 nitrogen atoms, a 6-membered cyclic group optionally having 1 to 3 nitrogen atoms, or a condensed heterocyclic group constituted by a 5-membered cyclic group and a 6-membered cyclic group which optionally have 1 to 3 nitrogen atoms.-
公开(公告)号：US11674053B2
公开(公告)日：2023-06-13
申请号：US14917853
申请日：2014-09-16
IPC分类号： C09D165/00 , C09D5/00 , C09D201/02 , C08L101/02 , C09J133/06 , G03F7/00 , C09D145/00 , G03F7/11 , G03F7/09 , B05D1/38 , B05D3/02 , B05D1/18 , B05D7/00 , C09D201/00 , C08G83/00
CPC分类号： C09D165/00 , B05D1/38 , B05D3/0254 , C08L101/02 , C09D5/00 , C09D145/00 , C09D201/00 , C09D201/02 , C09J133/066 , G03F7/0002 , G03F7/091 , G03F7/11 , B05D1/185 , B05D7/52 , C08G83/008 , C08G2261/148 , C08G2261/1422 , C08G2261/1426 , C08G2261/312 , C08G2261/3142 , C08G2261/3162 , C08G2261/3241 , C08G2261/3246 , C08G2261/3325
摘要： A composition for forming an underlayer film necessary for facilitating alignment of self-assembled film into desired vertical pattern. Composition for forming an underlayer film of self-assembled film including a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound in main chain. The polymer is a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound with aromatic ring structure of aromatic ring-containing compound or polymer chain derived from vinyl group of vinyl group-containing compound in main chain. The polymer has unit structure of Formula (1):
X—Y Formula (1)
wherein X is single bond, divalent group having vinyl structure as polymer chain, or divalent group having aromatic ring-containing structure as polymer chain, and Y is divalent group having aliphatic polycyclic structure as polymer chain. The aliphatic polycyclic compound is bi- to hexa-cyclic diene compound. The aliphatic polycyclic compound is dicyclopentadiene or norbornadiene.-
公开(公告)号：US11479627B2
公开(公告)日：2022-10-25
申请号：US15116550
申请日：2015-01-30
发明人： Makiko Umezaki , Ryo Karasawa , Shuhei Shigaki , Ryuta Mizuochi
IPC分类号： C09D133/12 , H01L21/027 , C08F220/14 , G03F7/11 , C08L33/14 , G03F7/09 , G03F7/075 , G03F7/16 , G03F7/20 , G03F7/30 , C08L101/04 , C08L101/00
摘要： A film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process includes a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure may further include an alkyl partial structure. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further includes a coating film resin, the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.
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公开(公告)号：US20220267480A1
公开(公告)日：2022-08-25
申请号：US17742130
申请日：2022-05-11
摘要： The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
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公开(公告)号：US11359220B2
公开(公告)日：2022-06-14
申请号：US15777469
申请日：2017-10-12
摘要： A saccharification reaction mixture wherein the reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group including a polyhydric alcohol compound represented by the following formula (1) or a derivative thereof and an acetylene glycol represented by formula (2) or an alkylene oxide adduct thereof. The symbols in the chemical formulas are defined in the specification.
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公开(公告)号：US11345762B2
公开(公告)日：2022-05-31
申请号：US15565022
申请日：2016-04-07
摘要： The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.
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公开(公告)号：US20220135814A1
公开(公告)日：2022-05-05
申请号：US17574966
申请日：2022-01-13
发明人： Yoshinari KOYAMA , Tomoki FURUKAWA , Motoko ASADA
IPC分类号： C09D7/62 , C09D175/04 , C09D5/00 , B82Y30/00 , C01G23/047 , C09D7/40 , C08G18/08 , C09C1/36 , C01G23/053
摘要： A substrate is coated with a transparent coating film using a coating liquid for forming a transparent coating film including metal oxide particles and a matrix formation component. The metal oxide particles each include a metal oxide particle containing titanium oxide coated with silicon dioxide-stannic oxide complex oxide, including a titanium oxide-containing core particle; and a coating layer with which the titanium oxide-containing core particle is coated and that is made of silicon dioxide-stannic oxide complex oxide colloidal particles having a mass ratio of silicon dioxide/stannic oxide of 0.1 to 5.0, where one or more intermediate thin film layers that are made of any one of an oxide; a complex oxide of at least one element selected from Si, Al, Sn, Zr, Zn, Sb, Nb, Ta, and W; and a mixture of the oxide and the complex oxide are interposed between the core particle and the coating layer.
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公开(公告)号：US11279624B2
公开(公告)日：2022-03-22
申请号：US15962381
申请日：2018-04-25
发明人： Tadayuki Isaji , Takashi Ogihara , Takayuki Kodera
摘要： A method for producing forsterite microparticles having a primary particle size of 1, to 50 nm, as determined through electron microscopy. The method includes spray-drying, in an atmosphere of 50° C. or higher and lower than 300° C., a solution containing a water-soluble magnesium salt and colloidal silica at a mole ratio of magnesium atoms to silicon atoms (Mg/Si) of 2; and subsequently, firing the spray-dried product in air at 800 to 1,000° C.
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