公开(公告)号：US09768010B2

公开(公告)日：2017-09-19

申请号：US13823205

申请日：2012-08-01

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

IPC分类号： H01L21/02 ,  H01L21/465 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/02041 ,  H01L21/465 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68785 ,  H01L21/68792

摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).

公开(公告)号：US20120321514A1

公开(公告)日：2012-12-20

申请号：US13527231

申请日：2012-06-19

申请人： Kenichi ITOU ,  Naoki SHINDO ,  Noriyuki SAITO

发明人： Kenichi ITOU ,  Naoki SHINDO ,  Noriyuki SAITO

IPC分类号： G01N33/48 ,  B65G49/00

CPC分类号： G01N35/00871 ,  B01L3/527 ,  B01L3/5453 ,  B01L9/06 ,  B01L2200/18 ,  B01L2300/021 ,  B01L2300/1805 ,  G01N35/00732 ,  G01N2035/0091

摘要： An analyzer system comprising: a transporting apparatus having a rack stocker for stocking a rack which holds one or more samples, the transporting apparatus being configured to transport the rack in the rack stocker; a measuring apparatus configured to perform a measurement on a sample of the rack transported by the transporting apparatus; an obtaining section configured to obtain identification data of a person who sets the rack on the rack stocker; a data storage; and a system controller, is disclosed. The system controller is configured to store, in the data storage, a result of the measurement of the sample as well as the identification data obtained from the person who had set the rack holding the sample on the rack stocker.

摘要翻译： 一种分析仪系统，包括：运送装置，具有用于存放保持一个或多个样品的齿条的齿条储料器，所述输送装置构造成将所述齿条运送到所述齿条储片器中; 测量装置，被配置为对由所述传送装置传送的所述架子的样本进行测量; 获取部，被配置为获得将所述架子设置在所述架子储存器上的人的识别数据; 数据存储; 和系统控制器。 系统控制器被配置为在数据存储器中存储样品的测量结果以及从将搁置样品的机架放置在机架储盘器上的人获得的识别数据。

公开(公告)号：US20110011425A1

公开(公告)日：2011-01-20

申请号：US12885279

申请日：2010-09-17

申请人： Takayuki TOSHIMA ,  Naoki Shindo ,  Hiroshi Yano ,  Kotaro Tsurusaki

发明人： Takayuki TOSHIMA ,  Naoki Shindo ,  Hiroshi Yano ,  Kotaro Tsurusaki

IPC分类号： B08B3/00

CPC分类号： H01L21/67034 ,  H01L21/67028 ,  H01L21/67757 ,  Y10S134/902

摘要： A substrate processing system 1 comprises: a processing tank 3 for processing substrates W with a processing liquid; a drying unit 6 disposed above the processing tank 3; and a carrying mechanism 8 for carrying the substrates W between the processing tank 3 and the drying unit 6. A processing gas supply line 21 for supplying a processing gas into the drying unit 6 and inert gas supply lines 24 and 25 for supplying an inert gas into the drying unit 6 are connected to the drying unit 6. A first discharge line for discharging an atmosphere purged from the drying unit 6 and a second discharge line 27 for forcibly exhausting the drying unit 6 are connected to the drying unit 6.

摘要翻译： 基板处理系统1包括：用处理液处理基板W的处理槽3; 设置在处理罐3上方的干燥单元6; 以及用于在处理罐3和干燥单元6之间承载基板W的承载机构8.用于向干燥单元6供应处理气体的处理气体供应管线21和用于供应惰性气体的惰性气体供应管线24和25 干燥单元6连接到干燥单元6.用于排出从干燥单元6吹扫的气氛的第一排出管线和用于强制排出干燥单元6的第二排出管线27连接到干燥单元6。

公开(公告)号：US07836900B2

公开(公告)日：2010-11-23

申请号：US10591971

申请日：2005-03-25

申请人： Takayuki Toshima ,  Naoki Shindo ,  Hiroshi Yano ,  Kotaro Tsurusaki

发明人： Takayuki Toshima ,  Naoki Shindo ,  Hiroshi Yano ,  Kotaro Tsurusaki

IPC分类号： B08B5/00

CPC分类号： H01L21/67034 ,  H01L21/67028 ,  H01L21/67757 ,  Y10S134/902

摘要： A substrate processing system 1 comprises: a processing tank 3 for processing substrates W with a processing liquid; a drying unit 6 disposed above the processing tank 3; and a carrying mechanism 8 for carrying the substrates W between the processing tank 3 and the drying unit 6. A processing gas supply line 21 for supplying a processing gas into the drying unit 6 and inert gas supply lines 24 and 25 for supplying an inert gas into the drying unit 6 are connected to the drying unit 6. A first discharge line for discharging an atmosphere purged from the drying unit 6 and a second discharge line 27 for forcibly exhausting the drying unit 6 are connected to the drying unit 6.

摘要翻译： 基板处理系统1包括：用处理液处理基板W的处理槽3; 设置在处理罐3上方的干燥单元6; 以及用于在处理罐3和干燥单元6之间承载基板W的承载机构8.用于向干燥单元6供应处理气体的处理气体供应管线21和用于供应惰性气体的惰性气体供应管线24和25 干燥单元6连接到干燥单元6.用于排出从干燥单元6吹扫的气氛的第一排出管线和用于强制排出干燥单元6的第二排出管线27连接到干燥单元6。

公开(公告)号：US20100206329A1

公开(公告)日：2010-08-19

申请号：US12707098

申请日：2010-02-17

申请人： Tsukasa WATANABE ,  Naoki SHINDO ,  Hiroki OHNO ,  Kenji SEKIGUCHI

发明人： Tsukasa WATANABE ,  Naoki SHINDO ,  Hiroki OHNO ,  Kenji SEKIGUCHI

IPC分类号： B08B7/00

CPC分类号： H01L21/67051 ,  B24C7/0046 ,  H01L21/02057 ,  Y10S134/902

摘要： Disclosed is a substrate cleaning method for prevent damage to a pattern formed on a substrate. The substrate cleaning method includes cleaning the substrate by striking cleaning particulates carried in a flow of dry air or inert gas against a surface of the substrate, and removing the cleaning particulates.

摘要翻译： 公开了一种用于防止对在基板上形成的图案的损坏的基板清洗方法。 基板清洗方法包括通过将干燥空气或惰性气体中携带的清洁微粒冲击到基板的表面上并清除清洁颗粒来清洁基板。

公开(公告)号：US20090101186A1

公开(公告)日：2009-04-23

申请号：US11922502

申请日：2006-06-16

申请人： Koukichi Hiroshiro ,  Yuji Kamikawa ,  Takayuki Toshima ,  Naoki Shindo

发明人： Koukichi Hiroshiro ,  Yuji Kamikawa ,  Takayuki Toshima ,  Naoki Shindo

IPC分类号： B08B3/04

CPC分类号： H01L21/02057 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67057

摘要： Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture.

摘要翻译： 公开了一种用于清洗和干燥诸如半导体晶片的衬底的衬底处理装置。 该基板处理装置包括：液体处理单元，用于通过将基板浸渍在储存的净化水中来处理基板;干燥单元，布置在液体处理单元上方并构造成干燥基板;基板输送装置，用于在液体处理 单元和干燥单元，用于将含有纯净水的蒸气或雾的挥发性有机溶剂的蒸气或雾的流体混合物供给到干燥单元的流体供给机构，以及用于控制流体混合物的供给的控制器。

公开(公告)号：US20070215172A1

公开(公告)日：2007-09-20

申请号：US11717170

申请日：2007-03-13

申请人： Tsukasa Watanabe ,  Naoki Shindo ,  Takahiro Furukawa ,  Yuji Kamikawa

发明人： Tsukasa Watanabe ,  Naoki Shindo ,  Takahiro Furukawa ,  Yuji Kamikawa

IPC分类号： B08B3/12 ,  B08B3/00

CPC分类号： B08B3/12 ,  B01F15/00207 ,  B01F15/0022 ,  B01F15/0429 ,  B08B3/00 ,  C11D11/0047 ,  H01L21/67057

摘要： The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.

摘要翻译： 本发明提供一种能够以高去除效率从待处理基板的整个表面去除颗粒的基板清洗方法。 在本发明的基板清洗方法中，将被处理基板W浸渍在清洗槽12内的清洗液中。 然后，在包含在清洗槽12中的清洗液中产生超声波，使待处理基板W进行超声波清洗处理。 当被处理基板被清洗时，溶解在清洗槽中所含的清洗液中的溶解气体浓度变化。

公开(公告)号：US06599485B1

公开(公告)日：2003-07-29

申请号：US09329591

申请日：1999-06-10

申请人： Yasuhiro Yamauchi ,  Kan Ogata ,  Naoki Shindo ,  Nobuhiro Hokao ,  Yoshihiko Tsuchiyama ,  Masakazu Tateishi ,  Tadatsugu Fukuzumi

发明人： Yasuhiro Yamauchi ,  Kan Ogata ,  Naoki Shindo ,  Nobuhiro Hokao ,  Yoshihiko Tsuchiyama ,  Masakazu Tateishi ,  Tadatsugu Fukuzumi

IPC分类号： B09B300

CPC分类号： A62D3/38 ,  A62D3/35 ,  A62D2101/22 ,  A62D2203/10 ,  B01D3/14 ,  B01D3/4211

摘要： The present invention provides a PCB decomposing apparatus capable of decomposing PCB efficiently. The PCB decomposing apparatus comprises a PCB extracting container for extracting PCB from a PCB-containing material with an organic solvent. A distilling tower provided on the downstream side of the PCB extracting container distills the organic solvent to separate the PCB. A primary reactor provided on the downstream side of the distilling tower includes a nozzle for supplying aqueous Na2CO3 solution and a nozzle for supplying an oxidizing agent into the container. A liquid cyclone provided on the downstream side of the primary reactor can remove Na2CO3 having a large particle size. A secondary reactor formed by a long pipe is connected to the liquid cyclone. A gas-liquid separator provided on the further downstream side of the secondary reactor can separate a gas from a solution. A film separator separates treated water into purified water and a concentrated solution, and the purified water is supplied as circulating water to the upstream side of a pressure pump.

摘要翻译： 本发明提供能够有效地分解PCB的PCB分解装置。 PCB分解装置包括用于从含有PCB的材料用有机溶剂提取PCB的PCB提取容器。 设置在PCB提取容器下游侧的蒸馏塔蒸馏有机溶剂以分离PCB。 设置在蒸馏塔的下游侧的主反应器包括用于供给Na 2 CO 3水溶液的喷嘴和用于将氧化剂供应到容器中的喷嘴。 设置在初级反应器的下游侧的液体旋风分离器可以除去大粒径的Na 2 CO 3。 由长管形成的二次反应器与液体旋风分离器连接。 设置在次级反应器的更下游侧的气液分离器可以将气体与溶液分离。 膜分离器将经处理的水分离成纯水和浓缩溶液，将纯化水作为循环水供给到压力泵的上游侧。

公开(公告)号：US5922138A

公开(公告)日：1999-07-13

申请号：US911353

申请日：1997-08-07

申请人： Naoki Shindo ,  Miyako Yamasaka ,  Yuji Kamikawa

发明人： Naoki Shindo ,  Miyako Yamasaka ,  Yuji Kamikawa

IPC分类号： B08B3/00 ,  B08B9/02 ,  C03C23/00 ,  G02F1/1333 ,  H01L21/00 ,  B08B3/04

CPC分类号： B08B9/027 ,  B08B3/00 ,  C03C23/0075 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/67086 ,  G02F1/1333 ,  Y10S134/902

摘要： Disclosed is a liquid treatment for an object to be processed, such as a semiconductor wafer or a glass LCD substrate, which is designed to remove any chemicals remaining in chemical supply nozzles and also improve the rinse capability and throughput. To that end, a processing liquid supply means is configured as jet nozzle pipes 40, a bottom surface 40c of each of the jet nozzle pipes 40 is inclined so as to slope downward from a chemical supply side thereof to an end portion, and the end portion is connected to a drain pipe 55 by a waste liquid orifice 40d and a drain valve 54. A chemical is supplied from nozzle orifices 40b of the jet nozzle pipes 40, the chemical is brought into contact with wafers W, and a treatment is performed thereby. Thereafter, a chemical-removing agent such as pure water or N.sub.2 is supplied through the jet nozzle pipes 40 to remove any remaining chemical from the jet nozzle pipes 40, then pure water is brought into contact with the wafers W to wash them.

公开(公告)号：US5845660A

公开(公告)日：1998-12-08

申请号：US761752

申请日：1996-12-05

申请人： Naoki Shindo ,  Yuuji Kamikawa ,  Shori Mokuo ,  Yoshio Kumagai

发明人： Naoki Shindo ,  Yuuji Kamikawa ,  Shori Mokuo ,  Yoshio Kumagai

IPC分类号： H01L21/00 ,  B08B3/10

CPC分类号： H01L21/67028 ,  Y10S134/902

摘要： A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.

摘要翻译： 一种基板清洗和干燥装置，其特征在于，包括用于保持晶片的处理部，向所述处理部引入用于将所述晶片干燥的处理液和用于干燥所述晶片的蒸气，用于将所述溶液导入所述处理部的供给排出口， 用于从多种溶液中选择一种的溶液供给机构，具有用于产生干燥产生蒸气的加热器的干燥蒸汽发生部，具有用于从处理部快速排出溶液的开口的排出溶液机构，电阻率检测装置 用于检测处理溶液的电阻率值;以及控制器，用于基于由电阻率检测装置检测的电阻率值来控制对处理部分的溶液的供应。