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公开(公告)号:USD1047884S1
公开(公告)日:2024-10-22
申请号:US29834638
申请日:2022-04-13
设计人: Yoshiaki Daigo , Takuto Umetsu
摘要: FIG. 1 is a perspective view of a susceptor cover showing our new design,
FIG. 2 is a front elevational view thereof,
FIG. 3 is a rear elevational view thereof,
FIG. 4 is a right side elevational view thereof,
FIG. 5 is a left side elevational view thereof,
FIG. 6 is a top plan view thereof, a bottom plan view being a mirror image thereof; and,
FIG. 7 is an enlarged end face sectional view taken along line 7-7 of FIG. 2.
The broken lines in FIG. 2 are for the purpose of illustrating portions of the susceptor cover in FIG. 7 and form no part of the claimed design.-
公开(公告)号:US20240282550A1
公开(公告)日:2024-08-22
申请号:US18635723
申请日:2024-04-15
发明人: Kei HASEGAWA , Hayato KIMURA
IPC分类号: H01J37/30 , H01J37/304 , H01J37/317
CPC分类号: H01J37/3007 , H01J37/304 , H01J37/3177 , H01J2237/0435
摘要: A blanking aperture array system includes a data output circuit that outputs first data and a first error detection code generated from the first data. A shift register transfers the first data and first error detection code that are input from the data output circuit. A buffer receives the first data from a first register. An electrode receives a voltage based on the first data output from the buffer. An error detection circuit receives the first data and first error detection code from a register of a last stage, generates a second error detection code from the first data received from the register of the last stage, and generate a detection signal indicating a match if the first error detection code from the register of the last stage and the second error detection code match and indicating a mismatch if they do not match.
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3.
公开(公告)号:US20240242932A1
公开(公告)日:2024-07-18
申请号:US18621345
申请日:2024-03-29
发明人: Yasuo KATO , Ryoh KAWANA , Masao HAYAMI
IPC分类号: H01J37/304 , H01J37/317
CPC分类号: H01J37/3045 , H01J37/3177 , H01J2237/24507
摘要: A multi-charged particle beam writing apparatus includes a distribution ratio calculation circuit to calculate, for the each control grid and each combination of combinations, a dose distribution ratio for each beam of at least two beams forming a combination concerned in order to distribute a dose amount, which is to be applied to a control grid concerned, to the at least two beams forming the combination concerned such that a total of distribution dose amounts having been distributed to the at least two beams forming the combination concerned is substantially equivalent to the dose amount to be applied to the control grid concerned, and a combination selection circuit to select, for the each control grid, a combination in which a dose distribution ratio for the first beam is larger than a dose distribution ratio for at least one beam remaining in the at least two beams forming the combination concerned.
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公开(公告)号:US12009174B2
公开(公告)日:2024-06-11
申请号:US17651278
申请日:2022-02-16
发明人: Kazuhiro Kishi , Munehiro Ogasawara
IPC分类号: H01J37/04 , H01J37/26 , H01J37/317
CPC分类号: H01J37/045 , H01J37/3174 , H01J37/26 , H01J2237/0435
摘要: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.
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5.
公开(公告)号:US20240186192A1
公开(公告)日:2024-06-06
申请号:US18523332
申请日:2023-11-29
发明人: Toru WATANABE , Yoshiaki DAIGO
CPC分类号: H01L22/14 , H01L21/67109 , H01L22/34
摘要: A heater life prediction method includes predicting a life of a heater in a semiconductor manufacturing apparatus including a treatment chamber in which a treatment of a substrate is performed, and the heater configured to heat the substrate loaded into the treatment chamber, and prediction of the life of the heater includes calculating a resistance change amount being a difference between a resistance value of the heater and an initial value of the resistance value, or a resistance change rate obtained by dividing the resistance change amount by the initial value in a step in which constant output control is executed on the heater between the treatments of different substrates, and predicting the life of the heater on the basis of the calculated resistance change amount or the calculated resistance change rate.
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公开(公告)号:US20240167194A1
公开(公告)日:2024-05-23
申请号:US18427209
申请日:2024-01-30
发明人: Takuto UMETSU , Masayoshi YAJIMA , Kunihiko SUZUKI
IPC分类号: C30B25/10 , C23C16/455 , C23C16/46 , C30B25/14 , C30B29/36
CPC分类号: C30B25/10 , C23C16/45563 , C23C16/46 , C30B25/14 , C30B29/36
摘要: A reflector unit includes a cylindrical first reflector component having a first engagement portion on an outer circumference side to be supported by a film formation chamber and having a first mounting portion on an inner circumference side, and a cylindrical second reflector component arranged on an inner side of the first reflector component and having a second engagement portion on an outer circumference side to engage with the first reflector component on the first mounting portion to be supported by the first reflector component.
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7.
公开(公告)号:US20240136148A1
公开(公告)日:2024-04-25
申请号:US18461180
申请日:2023-09-04
IPC分类号: H01J37/244 , H01J37/09 , H01J37/317
CPC分类号: H01J37/244 , H01J37/09 , H01J37/3174 , H01J2237/0451 , H01J2237/1501 , H01J2237/24564
摘要: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.
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公开(公告)号:US11961703B2
公开(公告)日:2024-04-16
申请号:US16904798
申请日:2020-06-18
发明人: Chosaku Noda
IPC分类号: H01J37/317 , H01J37/063 , H01J37/10 , H01J37/28
CPC分类号: H01J37/28 , H01J37/063 , H01J37/10 , H01J37/3177 , H01J2237/2817 , H01J2237/31774
摘要: A beam arrangement portion is provided to arrange multiple primary electron beams on a substrate. The beam arrangement portion arranges the multiple primary electron beams in a square lattice along a first moving direction of a stage allowing the substrate to be placed thereon and a second moving direction perpendicular to the first moving direction in a state where, when the multiple primary electron beams are viewed as a whole, beams around four corners of the square lattice are omitted.
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9.
公开(公告)号:US20240096590A1
公开(公告)日:2024-03-21
申请号:US18460139
申请日:2023-09-01
发明人: Yasutaka SATO , Yuto ASAKURA
IPC分类号: H01J37/244 , G01B11/02 , H01J37/20 , H01J37/304 , H01J37/317
CPC分类号: H01J37/244 , G01B11/02 , H01J37/20 , H01J37/3045 , H01J37/3174 , H01J2237/202 , H01J2237/2446 , H01J2237/24578
摘要: In one embodiment, a length measurer includes a first laser interferometer provided in a wall surface of the writing chamber, synthesizes a laser beam with the first frequency which has traveled back and forth between the first laser interferometer and the stage and a laser beam with the second frequency reflected in the first laser interferometer, and outputs a first beat signal. A wall surface displacement measurer includes a second laser interferometer provided in the wall surface of the writing chamber, synthesizes a laser beam with the first frequency which has traveled back and forth between the second laser interferometer and a fixed mirror and a laser beam with the second frequency reflected in the second laser interferometer, and outputs a second beat signal. The position of the stage is calculated based on a difference between the first beat signal and the second beat signal.
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10.
公开(公告)号:US20240071714A1
公开(公告)日:2024-02-29
申请号:US18363072
申请日:2023-08-01
发明人: Yasutaka SATO , Kiminobu AKENO
IPC分类号: H01J37/20 , H01J37/244 , H01J37/28
CPC分类号: H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0437
摘要: According to one embodiment, a beam detector includes a first aperture substrate including a first passage hole smaller than a pitch between beams of a multi charged particle beam, a second aperture substrate including a second passage hole allowing one detection target beam which has passed through the first passage hole, and a sensor detecting a beam current of the detection target beam which has passed through the second passage hole. The second aperture substrate has light permeability, and includes a conductive material.
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