公开(公告)号：US07177770B1

公开(公告)日：2007-02-13

申请号：US11212014

申请日：2005-08-25

申请人： Lary Robert Hocken ,  Gregory Paul Gee ,  David Paul Prawdzik ,  Paul Louis Du Bois ,  James Craig Smith

发明人： Lary Robert Hocken ,  Gregory Paul Gee ,  David Paul Prawdzik ,  Paul Louis Du Bois ,  James Craig Smith

IPC分类号： G06F19/00

CPC分类号： F02D41/187 ,  F02D2041/2072 ,  F02D2041/285 ,  G01F1/68 ,  G01F1/72

摘要： An airflow metering device, including a conventional airflow sensing device signally connected to a signal processor is shown, having an input flow signal correlatable to a magnitude of mass air flowing past the airflow sensing device. The signal processor is operable to determine a flow correction factor based upon a direction and magnitude of the mass air flowing past the airflow sensing device. The output of the airflow metering device is an accurate measure of airflow, and comprises the input flow signal of the airflow sensing device adjusted by the flow correction factor determined by the signal processor.

摘要翻译： 示出了包括信号地连接到信号处理器的常规气流感测装置的气流计量装置，其具有与流过气流感测装置的大量空气的大小相关的输入流量信号。 信号处理器可操作以基于流过气流感测装置的大量空气的方向和大小来确定流量校正系数。 气流计量装置的输出是气流的精确测量，并且包括通过由信号处理器确定的流量校正因子调节的气流感测装置的输入流量信号。

公开(公告)号：US20060009479A1

公开(公告)日：2006-01-12

申请号：US11178717

申请日：2005-07-11

申请人： Timothy Bailey ,  Paul Gee ,  Robert Rezaie

发明人： Timothy Bailey ,  Paul Gee ,  Robert Rezaie

IPC分类号： C07D489/02 ,  A61K31/485

CPC分类号： C07D489/02

摘要： There is described a method for converting oripavine to hydromorphone or a physiologically acceptable salt thereof such as hydromorphone hydrochloride involving generation of 8,14-dihydrooripavine utilising diimine.

摘要翻译： 描述了将oripavine转化为氢吗啡酮或其生理上可接受的盐如氢马洛芬盐酸盐的方法，其涉及利用二亚氨基产生8,14-二氢高磷脂。

公开(公告)号：US06599574B1

公开(公告)日：2003-07-29

申请号：US08627631

申请日：1996-04-04

申请人： Ellie Yieh ,  Paul Gee ,  Li-Qun Xia ,  Francimar Campana ,  Shankar Venkataranan ,  Dana Tribula ,  Bang Nguyen

发明人： Ellie Yieh ,  Paul Gee ,  Li-Qun Xia ,  Francimar Campana ,  Shankar Venkataranan ,  Dana Tribula ,  Bang Nguyen

IPC分类号： C23C1600

CPC分类号： H01L21/02129 ,  C23C16/401 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31625 ,  Y10S438/905 ,  Y10S438/906

摘要： The present invention relates to the deposition of dielectric layers, and more specifically to a method and apparatus for forming dielectric layers such as borophosphosilicate glass (BPSG) having improved film uniformity, higher deposition rate, superior gap fill/reflow capability, and smoother surface morphology. The method forms a dielectric layer with a process using helium carrier gas that produces substantially less downstream residue than conventional methods and apparatus, thereby reducing the need for chamber cleaning and increasing throughput of processed wafers. The present invention utilizes helium instead of nitrogen as carrier gas in a process for forming a dielectric layer such as BPSG to provide various unexpected benefits. According to one aspect, the present invention forms a dielectric film on a substrate, and prolongs a period between chamber cleanings in a system by using helium which produces substantially less downstream and upstream residue than a process using nitrogen. The method includes introducing a process gas containing silicon, oxygen, and first dopant atoms into the chamber; using helium as the carrier gas in the system; and processing more substrates between cleanings than a process using nitrogen as carrier gas. A further aspect of the invention includes annealing the dielectric films formed on the substrates at a lower temperature than required by the process using nitrogen as carrier gas.

摘要翻译： 本发明涉及电介质层的沉积，更具体地涉及一种用于形成介电层的方法和装置，例如具有改进的膜均匀性，较高沉积速率，优异的间隙填充/回流能力和更平滑的表面形态的硼磷硅酸盐玻璃（BPSG） 。 该方法形成具有使用氦载气的方法的电介质层，其产生比常规方法和设备基本上更少的下游残留物，从而减少对室清洁的需要并增加处理的晶片的生产量。 本发明在形成诸如BPSG的介电层的工艺中使用氦代替氮作为载气，以提供各种意想不到的好处。 根据一个方面，本发明在衬底上形成介电膜，并且通过使用产生比使用氮的方法显着更少的下游和上游残留物的氦来延长系统中的室清洁之间的时间。 该方法包括将含有硅，氧和第一掺杂剂原子的工艺气体引入室中; 使用氦气作为系统中的载气; 并且在清洗之前处理比使用氮气作为载气的工艺更多的衬底。 本发明的另一方面包括在比使用氮作为载气的方法所要求的温度更低的温度下退火形成在基板上的电介质膜。

公开(公告)号：US06316541B1

公开(公告)日：2001-11-13

申请号：US08270345

申请日：1994-07-05

申请人： Ronald Paul Gee

发明人： Ronald Paul Gee

IPC分类号： C08L8300

CPC分类号： C08G77/06

摘要： A method for making oil free polysiloxane standard, fine and microemulsions using emulsion polymerization is disclosed. The method comprises reacting a cyclicsiloxane in the presence of a catalyst, ionic surfactant and nonionic surfactant within a certain operating window. Emulsions containing silicone copolymers can also be produced using the method of the instant invention.

摘要翻译： 公开了一种制备无油聚硅氧烷标准的方法，使用乳液聚合的精细和微乳液。 该方法包括在一定操作窗口内在催化剂，离子表面活性剂和非离子表面活性剂存在下使环硅氧烷反应。 含有硅氧烷共聚物的乳液也可以使用本发明的方法制备。

公开(公告)号：US6099647A

公开(公告)日：2000-08-08

申请号：US409763

申请日：1999-09-30

申请人： Ellie Yieh ,  Li-Qun Xia ,  Paul Gee ,  Bang Nguyen

发明人： Ellie Yieh ,  Li-Qun Xia ,  Paul Gee ,  Bang Nguyen

IPC分类号： C23C16/40 ,  C23C16/44 ,  C23C16/509 ,  C23C16/52 ,  H01L21/225 ,  H01L21/31 ,  H01L21/316 ,  H01L21/336 ,  H01L21/762 ,  C23C16/00

CPC分类号： C23C16/401 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/5096 ,  C23C16/52 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02301 ,  H01L21/02312 ,  H01L21/02315 ,  H01L21/0234 ,  H01L21/02362 ,  H01L21/2255 ,  H01L21/31625 ,  H01L21/76237 ,  H01L29/66575

摘要： The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same chamber to reduce total processing time and to ensure high quality processing for high aspect ratio devices. Performing multiple process steps in the same chamber also increases the control of the process parameters and reduces device damage. In particular, the present invention can provide high temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.

摘要翻译： 本发明提供用于半导体晶片的高温（至少约500-800℃）处理的系统，方法和装置。 本发明的系统，方法和装置允许多个工艺步骤在相同的腔室中原位进行，以减少总处理时间，并确保对高宽比装置的高质量处理。 在同一个室内执行多个工艺步骤也可以增加工艺参数的控制并减少设备损坏。 特别地，本发明可以提供用于形成具有厚度均匀性，良好间隙填充能力，高密度，低湿度和其它所需特性的介电膜的高温沉积，加热和有效清洁。

公开(公告)号：US5994209A

公开(公告)日：1999-11-30

申请号：US748094

申请日：1996-11-13

申请人： Ellie Yieh ,  Li-Qun Xia ,  Paul Gee ,  Bang Nguyen

发明人： Ellie Yieh ,  Li-Qun Xia ,  Paul Gee ,  Bang Nguyen

IPC分类号： C23C16/40 ,  C23C16/44 ,  C23C16/509 ,  C23C16/52 ,  H01L21/225 ,  H01L21/31 ,  H01L21/316 ,  H01L21/336 ,  H01L21/762 ,  H01L21/24 ,  H01L21/40

CPC分类号： C23C16/401 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/5096 ,  C23C16/52 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02301 ,  H01L21/02312 ,  H01L21/02315 ,  H01L21/0234 ,  H01L21/02362 ,  H01L21/2255 ,  H01L21/31625 ,  H01L21/76237 ,  H01L29/66575

摘要： The present invention provides systems, methods and apparatus for high temperature (at least about 500-800.degree. C.) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same chamber to reduce total processing time and to ensure high quality processing for high aspect ratio devices. Performing multiple process steps in the same chamber also increases the control of the process parameters and reduces device damage. In particular, the present invention can provide high temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.

公开(公告)号：US06465568B1

公开(公告)日：2002-10-15

申请号：US09659813

申请日：2000-09-11

申请人： Ronald Paul Gee ,  Burt Michael Wrolson ,  Brett Lee Zimmerman

发明人： Ronald Paul Gee ,  Burt Michael Wrolson ,  Brett Lee Zimmerman

IPC分类号： C08L8300

CPC分类号： C08G77/06 ,  Y10S516/924

摘要： Emulsions and microemulsions containing particles of siloxane polymers are prepared by an emulsion polymerization process involving (i) the formation of a mixture by combining a siloxane oligomer, an ionic surfactant, no nonionic surfactant, and water; (ii) agitating the mixture without using high shearing forces (homogenization) to form droplets of oligomer prior to polymerization that have an average diameter of greater than 10 micron/10,000 nanometer; (iii) adding a siloxane polymerization catalyst to the oligomer mixture; (iv) agitating the mixture without using high shearing forces; (v) polymerizing the oligomer to form new particles of polymer; and (vi) continuing step (v) until the polymer has increased in viscosity or molecular weight.

摘要翻译： 包含硅氧烷聚合物颗粒的乳液和微乳液通过乳液聚合方法制备，所述乳液聚合方法包括（i）通过组合硅氧烷低聚物，离子表面活性剂，非离子表面活性剂和水来形成混合物; （ii）搅拌混合物而不使用高剪切力（均质化）以在聚合之前形成平均直径大于10微米/ 10,000纳米的低聚物液滴; （iii）向所述低聚物混合物中加入硅氧烷聚合催化剂; （iv）搅拌混合物而不使用高剪切力; （v）使低聚物聚合以形成新的聚合物颗粒; 和（vi）继续步骤（v），直到聚合物的粘度或分子量增加。

公开(公告)号：US5852110A

公开(公告)日：1998-12-22

申请号：US668797

申请日：1996-06-24

申请人： Ronald Paul Gee

发明人： Ronald Paul Gee

IPC分类号： C08G77/26 ,  C08L83/08

CPC分类号： C08G77/26

摘要： The instant invention pertains to a method for making amino-functional polysiloxane emulsions wherein said method comprises the emulsion polymerization of a mixture comprising cyclosiloxanes and an aminosilane having an amino-functional group solubility parameter equal to or less than 10.0. Said emulsion polymerization is carried out in the presence of water, at least one cationic surfactant and a basic polymerization catalyst. By using an aminosilane having an amino-functional group solubility parameter of equal to or less than 10.0 it is possible to produce emulsions with higher amine concentrations in the resulting polymer.

摘要翻译： 本发明涉及一种制备氨基官能聚硅氧烷乳液的方法，其中所述方法包括含有环硅氧烷和氨基官能团溶解度参数等于或小于10.0的氨基硅烷的混合物的乳液聚合。 所述乳液聚合在水，至少一种阳离子表面活性剂和碱性聚合催化​​剂的存在下进行。 通过使用具有等于或小于10.0的氨基官能团溶解度参数的氨基硅烷，可以在所得聚合物中产生具有较高胺浓度的乳液。

公开(公告)号：US20090031953A1

公开(公告)日：2009-02-05

申请号：US12249816

申请日：2008-10-10

申请人： Nitin K. Ingle ,  Zheng Yuan ,  Paul Gee ,  Kedar Sapre

发明人： Nitin K. Ingle ,  Zheng Yuan ,  Paul Gee ,  Kedar Sapre

IPC分类号： C23C16/513

CPC分类号： C23C16/401 ,  C23C16/452 ,  C23C16/56 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/02337 ,  H01L21/31612

摘要： Methods of depositing a silicon oxide layer on a substrate are described. The methods may include the steps of providing a substrate to a deposition chamber, generating an atomic oxygen precursor outside the deposition chamber, and introducing the atomic oxygen precursor into the chamber. The methods may also include introducing a silicon precursor to the deposition chamber, where the silicon precursor and the atomic oxygen precursor are first mixed in the chamber. The silicon precursor and the atomic oxygen precursor react to form the silicon oxide layer on the substrate, and the deposited silicon oxide layer may be annealed. Systems to deposit a silicon oxide layer on a substrate are also described.

摘要翻译： 描述了在衬底上沉积氧化硅层的方法。 所述方法可以包括以下步骤：向沉积室提供衬底，在沉积室外产生原子氧前体，以及将原子氧前体引入室中。 所述方法还可以包括将硅前体引入沉积室，其中硅前体和原子氧前体首先在室中混合。 硅前体和原子氧前体反应以在衬底上形成氧化硅层，并且沉积的氧化硅层可以退火。 还描述了在衬底上沉积氧化硅层的系统。

公开(公告)号：US6087317A

公开(公告)日：2000-07-11

申请号：US209515

申请日：1998-12-10

申请人： Ronald Paul Gee

发明人： Ronald Paul Gee

IPC分类号： C08L83/04 ,  C08J3/03 ,  C11D17/00

CPC分类号： C08J3/03 ,  C08J2383/04

摘要： By using a nonionic surfactant as the primary emulsifier having an hydrophilic-lipophilic balance (HLB) greater than about 13, at a concentration sufficient to provide about 0.5-3 molecules per 100 square .ANG. of surface area of silicone particles; and a nonionic cosurfactant having an HLB less than about 11, at a concentration sufficient to provide 5-15 molecules of emulsifier per 100 square .ANG. of surface area of silicone particles; aqueous emulsions containing low molecular weight silicones can be prepared which possess improved particle size stability. In particular, the low molecular weight silicones have a molecular weight less than about 1,000, and a viscosity of not greater than about 5 mm.sup.2 /sec. These emulsions can be used in applications relating to laundry pre-spotting, automotive bug and tar removal, and hard surface cleaning.

摘要翻译： 通过使用非离子表面活性剂作为具有大于约13的亲水亲油平衡（HLB）的主要乳化剂，其浓度足以提供约0.5-3分子/ 100平方毫米的硅氧烷颗粒表面积; 和HLB小于约11的非离子辅助表面活性剂，其浓度足以提供5-15分子的乳化剂/ 100平方厘米的硅氧烷颗粒的表面积; 可以制备含有低分子量硅氧烷的水乳液，其具有改善的粒度稳定性。 特别地，低分子量有机硅的分子量小于约1,000，粘度不大于约5平方毫米/秒。 这些乳液可用于与洗衣预先检测，汽车臭氧和焦油去除以及硬表面清洁有关的应用。