公开(公告)号：US5019629A

公开(公告)日：1991-05-28

申请号：US432934

申请日：1989-11-06

申请人： John Woods ,  John Rooney ,  Pauline Coakley

发明人： John Woods ,  John Rooney ,  Pauline Coakley

IPC分类号： C08F299/00 ,  C07C43/215 ,  C07C43/23 ,  C07C45/71 ,  C08F12/34 ,  C08F290/00 ,  C08F290/04 ,  C08G18/67

CPC分类号： C08F290/048 ,  C07C43/215 ,  C07C43/23 ,  C07C45/71 ,  C08F12/34

摘要： Cationically polymerizable styryloxy resins having urethane linkages, represented by the formula III ##STR1## wherein R.sup.1 and R.sup.2 are H, or one of R.sup.1 and R.sup.2 is H and the other is methyl;R.sup.3 and R.sup.4 (which may be the same or different) are H, lower alkyl, or alkoxy if R.sup.2 is not methyl;R.sup.5 is a divalent hydrocarbon radical;G.sup.1 is an n-valent hydrocarbon radical free of amino, aliphatic thiol, aliphatic hydroxyl or other groups which interfere with cationic polymerization;and n is an integer of 2 or more.G.sup.1 is a hydrocarbon backbone which is not interrupted by a hetero atom. Preferably G.sup.1 is a residue of a diene homopolymer or copolymer, in which case the resins produce flexible polymers. The resins are polymerized with a cationic polymerization initiator or latent acid catalyst. The resins have utility in the field of electronics.

公开(公告)号：US5187048A

公开(公告)日：1993-02-16

申请号：US751414

申请日：1991-08-28

申请人： John Woods ,  John Guthrie ,  Pauline Coakley

发明人： John Woods ,  John Guthrie ,  Pauline Coakley

IPC分类号： C08F36/04 ,  C08F36/06 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/167 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

摘要： A photoresist coating for use in microlithography comprises a polymer of a monomer of the formula ##STR1## wherein X and Y are strong electron withdrawing groups and R.sup.4 is H or, providing that X and Y are both --CN, R.sup.4 may be aliphatic hydrocarbyl, aryl or alkaryl. Preferred monomers are of the formula ##STR2## wherein R.sup.7 is a C.sub.1 -C.sub.5 alkyl or C.sub.2 -C.sub.5 alkenyl group, more particularly ethyl 2-cyanopenta-2,4-dienoate or allyl 2-cyanopenta-2,4-dienoate.Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed.

公开(公告)号：US5359101A

公开(公告)日：1994-10-25

申请号：US769511

申请日：1991-10-01

申请人： John Woods ,  Pauline Coakley

发明人： John Woods ,  Pauline Coakley

IPC分类号： C07F7/10 ,  C07F7/08 ,  C07F7/18 ,  C07F7/28 ,  C08F30/04 ,  C08F30/08 ,  C08F130/04 ,  C08F130/08 ,  C08F136/14 ,  C23C16/00 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC分类号： C07F7/0818 ,  C07F7/0854 ,  C07F7/1852 ,  C07F7/28 ,  C08F30/04 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0758

摘要： Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula ##STR1## wherein A is --H or --CH.dbd.CH.sub.2 ; X is a strong electron withdrawing group;Y is a strong electron withdrawing group containing at least one silicon or titanium atom.Preferably Y is ##STR2## wherein n is 1-5 and R.sup.2, R.sup.3 and R.sup.4 are C.sub.1 -C.sub.10 alkyl. A particularly preferred monomer is 3-trimethylsilylpropyl 2-cyanoacrylate.Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed. The imaging layer may be applied over a planarizing layer to form a multilayer photoresist.

摘要翻译： 含有至少一个硅或钛原子的可离子聚合单体形成具有良好的耐干蚀刻性的聚合物光致抗蚀剂，用于微光刻。 单体具有下式其中A是-H或-CH = CH 2; X是强吸电子基团; Y是含有至少一个硅原子或钛原子的强吸电子基团。 Y优选为Y，其中n为1-5且R 2，R 3和R 4为C 1 -C 10烷基。 特别优选的单体是2-氰基丙烯酸3-三甲基甲硅烷基丙酯。 描述了通过气相沉积这些单体并暴露于辐射来施加抗蚀剂涂层的方法。 根据所使用的成像方法，可以产生正或负色调图像。 成像层可以施加在平坦化层上以形成多层光致抗蚀剂。

公开(公告)号：US5113003A

公开(公告)日：1992-05-12

申请号：US672221

申请日：1991-03-20

申请人： John G. Woods ,  Pauline Coakley

发明人： John G. Woods ,  Pauline Coakley

IPC分类号： C07F7/18 ,  C08G8/04 ,  C08G61/00 ,  C08G77/48 ,  C09D183/14 ,  G03F7/075

CPC分类号： C07F7/1844 ,  C07F7/1868 ,  C08G61/00 ,  C08G77/48 ,  C08G8/04 ,  C09D183/14 ,  G03F7/0757

摘要： The silicon-containing phenoxy ethers are of the formula III: ##STR1## wherein R.sup.1 and R.sup.2 which may be the same or different are selected from H, --R.sup.3 --X, aliphatic hydrocarbyl having 1-6 carbon atoms or aryl, or substituted derivatives thereof, provided that not more than one of R.sup.1 and R.sup.2 is H;R.sup.3 is a divalent C.sub.1 -C.sub.30 aliphatic and/or aromatic hydrocarbyl group which may optionally be substituted, or interrupted, by a hetero atom;R.sup.4 and R.sup.5 which may be the same or different are H, ##STR2## or an ortho para directing activating group for aromatic electrophilic substitution, other than an amine;and X is a reactive functional group capable of undergoing an acid-catalyzed electrophilic aromatic substitution reaction with a phenol, for example an aldehyde group. They can be polymerized to produce silicone-modified polymers of the phenol-aldehyde type without the use of free aldehyde. One-part compositions containing a compound of the formula III and a latent acid catalyst (e.g. for photoinitiation or thermal initiation of polymerization) are described. The compositions are intended for use as coatings, sealants, adhesives, potting compositions or photoresists.Exemplified compounds are of the formula VII: ##STR3##