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1.发明授权Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby 有权平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置公开(公告)号：US07248337B2
公开(公告)日：2007-07-24
申请号：US10756841
申请日：2004-01-14
Applicant: Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
Inventor： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
CPC classification number: G03F9/7034
Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
Abstract translation: 根据本发明的一个实施例的用于光刻投影设备的液位传感器包括光源，第一反射器，第二反射器和检测器。 第一反射器被定位成将来自光源的光朝向晶片表面引导，并且第二反射器被定位成将从晶片表面反射的光引导到检测器。 选择第一和第二反射器以产生最小的过程依赖的表观凹陷。
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公开(公告)号：US06924884B2
公开(公告)日：2005-08-02
申请号：US10683454
申请日：2003-10-14
Applicant: Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
Inventor： Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
CPC classification number: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
Abstract: In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.
Abstract translation: 在离轴调平程序中，在测量站产生掩模的高度图。 高度图参考掩模支持的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定掩模支架的最佳高度和/或倾斜度，以便在曝光期间以最佳聚焦将曝光区域放置在掩模上。
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3.发明授权Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby 有权平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置
公开(公告)号：US07646471B2
公开(公告)日：2010-01-12
申请号：US11812165
申请日：2007-06-15
Applicant: Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
Inventor： Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
CPC classification number: G03F9/7034
Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
Abstract translation: 根据本发明的一个实施例的用于光刻投影设备的液位传感器包括光源，第一反射器，第二反射器和检测器。 第一反射器被定位成将来自光源的光朝向晶片表面引导，并且第二反射器被定位成将从晶片表面反射的光引导到检测器。 选择第一和第二反射器以产生最小的过程依赖的表观凹陷。
