Superlattice nanopatterning of wires and complex patterns
    5.
    发明授权
    Superlattice nanopatterning of wires and complex patterns 有权
    电线和复杂图案的超晶格纳米图案

    公开(公告)号:US07906775B2

    公开(公告)日:2011-03-15

    申请号:US11633043

    申请日:2006-12-04

    Abstract: Fabrication of metallic or non-metallic wires with nanometer widths and nanometer separation distances without the use of lithography. Wires are created in a two-step process involving forming the wires at the desired dimensions and transferring them to a planar substrate. The dimensions and separation of the wires are determined by the thicknesses of alternating layers of different materials that are in the form of a superlattice. Wires are created by evaporating the desired material onto the superlattice that has been selectively etched to provide height contrast between layers. The wires thus formed upon one set of superlattice layers are then transferred to a substrate.

    Abstract translation: 制造具有纳米宽度和纳米分离距离的金属或非金属线,无需光刻。 电线是以两步法制成的,包括以所需尺寸形成电线并将其转移到平面衬底。 导线的尺寸和间距由超晶格形式的不同材料的交替层的厚度决定。 通过将期望的材料蒸发到已经被选择性蚀刻以提供层之间的高度对比度的超晶格上来产生电线。 然后将由此形成在一组超晶格层上的电线转移到基底。

    Superlattice nanopatterning of wires and complex patterns
    8.
    发明授权
    Superlattice nanopatterning of wires and complex patterns 有权
    电线和复杂图案的超晶格纳米图案

    公开(公告)号:US07161168B2

    公开(公告)日:2007-01-09

    申请号:US10521714

    申请日:2003-07-28

    Abstract: Fabrication of metallic or non-metallic wires with nanometer widths and nanometer separation distances without the use of lithography. Wires are created in a two-step process involving forming the wires at the desired dimensions and transferring them to a planar substrate. The dimensions and separation of the wires are determined by the thicknesses of alternating layers of different materials that are in the form of a superlattice. Wires are created by evaporating the desired material onto the superlattice that has been selectively etched to provide height contrast between layers. The wires thus formed upon one set of superlattice layers are then transferred to a substrate.

    Abstract translation: 制造具有纳米宽度和纳米分离距离的金属或非金属线,无需光刻。 电线是以两步法制成的,包括以所需尺寸形成电线并将其转移到平面衬底。 导线的尺寸和间距由超晶格形式的不同材料的交替层的厚度决定。 通过将期望的材料蒸发到已经被选择性蚀刻以提供层之间的高度对比度的超晶格上来产生电线。 然后将由此形成在一组超晶格层上的电线转移到基底。

    Mid infrared and near infrared light upconverter using self-assembled quantum dots
    9.
    发明授权
    Mid infrared and near infrared light upconverter using self-assembled quantum dots 有权
    使用自组装量子点的中红外和近红外光上变频器

    公开(公告)号:US06541788B2

    公开(公告)日:2003-04-01

    申请号:US09428593

    申请日:1999-10-27

    CPC classification number: B82Y20/00 B82Y10/00 G02F2/02 H01L31/0352

    Abstract: A method and device for converting light from a first wavelength to a second wavelength. The method comprises the steps of exciting an electron in a quantum dot with an incident infrared photon having the first wavelength, the excited electron having a first energy, tunneling the excited electron through a barrier into a stress induced quantum dot, and recombining the excited electron with a hole in the stress induced quantum dot, therein producing a photon having the second wavelength, typically in the visible range. The device comprises a substrate, a spacer layer, coupled to the substrate, a second layer, coupled to the spacer layer, wherein the second layer comprises a different material than the spacer layer, a third layer, coupled to the second layer, wherein the third layer comprises at least one quantum dot, a fourth layer, coupled to the third layer, comprising a quantum well corresponding to each quantum dot in the third layer, a fifth layer, coupled to the fourth layer, wherein the fourth layer and fifth layer comprise a strain induced quantum dot corresponding to each quantum dot in the third layer; and a sixth layer, coupled to the fifth layer, the substrate and the sixth layer for contacting the device.

    Abstract translation: 一种用于将来自第一波长的光转换成第二波长的方法和装置。 该方法包括以下步骤:用具有第一波长的入射红外光子激发量子点中的电子,激发的电子具有第一能量,将被激发的电子通过势垒隧穿到应力诱导的量子点中,并将激发的电子 在应力诱导量子点处具有孔,其中产生具有第二波长的光子,通常处于可见光范围内。 该装置包括耦合到衬底的衬底,间隔层,耦合到间隔层的第二层,其中第二层包括与间隔层不同的材料,第三层,耦合到第二层,其中第 第三层包括耦合到第三层的至少一个量子点,第四层,包括与第三层中的每个量子点对应的量子阱,耦合到第四层的第五层,其中第四层和第五层 包括对应于第三层中的每个量子点的应变诱发量子点; 以及耦合到第五层的第六层,用于接触器件的衬底和第六层。

Patent Agency Ranking