公开(公告)号：US08568656B2

公开(公告)日：2013-10-29

申请号：US13039152

申请日：2011-03-02

申请人： Zhenqing Hu ,  Chuankai Xu ,  Qing Lv ,  Nianrun Zhou ,  Jia Long ,  Siqi Zhang

发明人： Zhenqing Hu ,  Chuankai Xu ,  Qing Lv ,  Nianrun Zhou ,  Jia Long ,  Siqi Zhang

IPC分类号： C22C9/04 ,  C22C9/02 ,  B22D7/00 ,  B22D11/00

CPC分类号： C22C9/04 ,  C22F1/08

摘要： The present invention provides an environment-friendly manganese brass alloy, which comprises 55˜65 wt % of Cu, 1.0˜6.5 wt % of Mn, 0.2˜3.0 wt % of Al, 0˜3.0 wt % of Fe, 0.3˜2.0 wt % of Sn, 0.01˜0.3 wt % of Mg, 0˜0.3 wt % of Bi and/or 0˜0.2 wt % of Pb, the balance being Zn and unavoidable impurities. The alloys not only have superior mechanical properties, castability, cutability and corrosion resistance, especially stress corrosion resistance properties, but also have the advantages of low manufacturing costs and simple manufacturing process etc, which is suitable for making components through forging, casting, cutting and other manufacturing methods, especially suitable for making water tap bodies and valves through forging, casting and cutting processes.

摘要翻译： 本发明提供一种环境友好的锰黄铜合金，其包含Cu的55〜65重量％，Mn的1.0〜6.5重量％，Al的0.2〜3.0重量％，Fe的0〜3.0重量％，0.3〜2.0重量％ Sn的百分比，Mg的0.01〜0.3重量％，Bi的0〜0.3重量％和/或0〜0.2重量％的Pb，余量为Zn和不可避免的杂质。 该合金不仅具有优异的机械性能，可浇铸性，可切削性和耐腐蚀性，特别是耐应力腐蚀性能，而且具有制造成本低，制造工艺简单等优点，适用于通过锻造，铸造，切割和 其他制造方法，特别适用于通过锻造，铸造和切割工艺制造水龙头体和阀门。

公开(公告)号：US20110214836A1

公开(公告)日：2011-09-08

申请号：US13039152

申请日：2011-03-02

申请人： Zhenqing Hu ,  Chuankai Xu ,  Qing LV ,  Nianrun Zhou ,  Jia Long ,  Siqi Zhang

发明人： Zhenqing Hu ,  Chuankai Xu ,  Qing LV ,  Nianrun Zhou ,  Jia Long ,  Siqi Zhang

IPC分类号： B22D25/00 ,  C22C9/05 ,  B22D11/00 ,  C22C9/01 ,  C22C9/02 ,  C22C9/04

CPC分类号： C22C9/04 ,  C22F1/08

摘要： The present invention provides an environment-friendly manganese brass alloy, which comprises 55˜65 wt % of Cu, 1.0˜6.5 wt % of Mn, 0.2˜3.0 wt % of Al, 0˜3.0 wt % of Fe, 0.3˜2.0 wt % of Sn, 0.01˜0.3 wt % of Mg, 0˜0.3 wt % of Bi and/or 0˜0.2 wt % of Pb, the balance being Zn and unavoidable impurities. The alloys not only have superior mechanical properties, castability, cutability and corrosion resistance, especially stress corrosion resistance properties, but also have the advantages of low manufacturing costs and simple manufacturing process etc, which is suitable for making components through forging, casting, cutting and other manufacturing methods, especially suitable for making water tap bodies and valves through forging, casting and cutting processes.

摘要翻译： 本发明提供一种环境友好的锰黄铜合金，其包含55〜65重量％的Cu，1.0〜6.5重量％的Mn，0.2〜3.0重量％的Al，0〜3.0重量％的Fe，0.3〜2.0重量％ Sn的％，0.01〜0.3重量％的Mg，0〜0.3重量％的Bi和/或0〜0.2重量％的Pb，余量为Zn和不可避免的杂质。 该合金不仅具有优异的机械性能，可浇铸性，可切削性和耐腐蚀性，特别是耐应力腐蚀性能，而且具有制造成本低，制造工艺简单等优点，适用于通过锻造，铸造，切割和 其他制造方法，特别适用于通过锻造，铸造和切割工艺制造水龙头体和阀门。

公开(公告)号：US07658800B2

公开(公告)日：2010-02-09

申请号：US11602568

申请日：2006-11-20

申请人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

发明人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： C23C16/45565 ,  C23C16/45574

摘要： A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.

摘要翻译： 描述了半导体工件处理反应器，其包括限定沉积区域的处理室; 基座，其在所述处理室的所述沉积区域内支撑并移动待处理的半导体工件; 以及气体分配组件，其安装在所述处理室内并且限定彼此分离的第一和第二反应气体通道，并且将两个反应气体输送到位于所述气体分配组件附近的半导体工件。

公开(公告)号：US20080092815A1

公开(公告)日：2008-04-24

申请号：US11602568

申请日：2006-11-20

申请人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

发明人： AiHua Chen ,  Shulin Wang ,  Henry Ho ,  Gerald Yin ,  Qing Lv ,  Li Fu

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/45574

摘要： A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.

摘要翻译： 描述了半导体工件处理反应器，其包括限定沉积区域的处理室; 基座，其在所述处理室的所述沉积区域内支撑并移动待处理的半导体工件; 以及气体分配组件，其安装在处理室内并且限定彼此分离的第一和第二反应气体通道，并将两个反应气体输送到位于气体分配组件附近的半导体工件。

公开(公告)号：US20070166459A1

公开(公告)日：2007-07-19

申请号：US11361950

申请日：2006-02-23

申请人： Frank Chang ,  Henry Ho ,  Shulin Wang ,  Li Fu ,  Qing Lv

发明人： Frank Chang ,  Henry Ho ,  Shulin Wang ,  Li Fu ,  Qing Lv

IPC分类号： C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/45574

摘要： An assembly and method for delivering a reactant material onto a substrate is described and which includes a delivery member which has a first surface, and an opposite second surface, and wherein the second surface is positioned adjacent to a substrate, and wherein an elongated substantially continuous channel is formed in the second surface of the delivery member, and which is coupled in fluid flowing relation relative to a source of reactant material, and wherein the elongated substantially continuous channel delivers the reactant material onto the substrate.

摘要翻译： 描述了用于将反应物材料递送到基底上的组件和方法，其包括具有第一表面和相对的第二表面的递送构件，并且其中第二表面邻近基底定位，并且其中细长的基本上连续的 通道形成在输送构件的第二表面中，并且相对于反应物材料源以流体流动的关系联接，并且其中细长的基本上连续的通道将反应物材料输送到基底上。