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    Megasonic substrate processing module
    1.
    发明授权
    Megasonic substrate processing module 失效
    超声波基板处理模块

    公开(公告)号：US06866051B1

    公开(公告)日：2005-03-15

    申请号：US10259023

    申请日：2002-09-26

    申请人： Afshin Nickhou ,  Randolph E. Treur ,  Michael Ravkin

    发明人： Afshin Nickhou ,  Randolph E. Treur ,  Michael Ravkin

    IPC分类号： B08B3/12 ,  H01L21/00

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  Y10S134/902

    摘要： A megasonic module for substrate processing is provided. Embodiments of the present invention include a tank configured to hold processing fluids in which the substrate is submerged, and a lid configured to mate with and seal the tank. At least two megasonic transducers are positioned within the megasonic module to direct megasonic energy to each of an active surface and a backside surface of the substrate. A pair of drive wheels are configured to receive an edge of the substrate to support and rotate the substrate in a horizontal orientation between the at least two megasonic transducers. The substrate is supported against the pair of drive wheels by a substrate stabilizing arm/wheel which also allows the rotation of the substrate. A drive motor is configured to rotate the pair of drive wheels, and a fluid recirculation system provides for temperature control and use of a plurality of processing fluids.

    摘要翻译： 提供了用于基板处理的兆声模块。 本发明的实施例包括一种被配置为保持其中浸没了基底的处理流体的罐和构造成与罐相配合并密封的盖。 至少两个兆声传感器位于兆声波模块内，以将兆声波能量引导到基板的有源表面和背面。 一对驱动轮被构造成接收基板的边缘以在至少两个兆声换能器之间水平取向地支撑和旋转基板。 基板通过基板稳定臂/轮支撑在一对驱动轮上，基板稳定臂/轮也允许基板旋转。 驱动马达被配置成旋转所述一对驱动轮，并且流体再循环系统提供多个处理流体的温度控制和使用。

    Methods for making and implementing fluid delivery ring
    2.
    发明授权
    Methods for making and implementing fluid delivery ring 有权
    制造和实施流体输送环的方法

    公开(公告)号：US07040017B2

    公开(公告)日：2006-05-09

    申请号：US10251483

    申请日：2002-09-19

    申请人： Stephen M. Smith ,  Randolph E. Treur

    发明人： Stephen M. Smith ,  Randolph E. Treur

    IPC分类号： B21K21/08 ,  B05B1/14

    CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902 ,  Y10T29/49432 ,  Y10T29/49433

    摘要： A fluid delivery module for use in preparing a substrate is provided. The fluid delivery module includes a process bowl designed to contain a substrate to be prepared. The process bowl has a bottom wall and a sidewall. The fluid delivery module further includes a fluid delivery ring configured to be attached to the sidewall of the process bowl. The fluid delivery ring includes a plurality of inlet and outlet pairs. Each of the plurality of inlet and outlet pairs is defined in the fluid ring and is designed to receive a respective supply tube. Each respective supply tube has an end that terminates at each of the outlets of the fluid delivery ring and is configured to direct fluid onto a surface of the substrate.

    摘要翻译： 提供了一种用于制备基板的流体输送模块。 流体输送模块包括设计成容纳要制备的基底的处理碗。 处理碗具有底壁和侧壁。 流体输送模块还包括流体输送环，该流体输送环被配置为附接到处理碗的侧壁。 流体输送环包括多个入口和出口对。 多个入口和出口对中的每一个限定在流体环中并且被设计成容纳相应的供给管。 每个相应的供应管具有终止于流体输送环的每个出口处的端部，并且构造成将流体引导到基板的表面上。

    Angular spin, rinse, and dry module and methods for making and implementing the same
    3.
    发明授权
    Angular spin, rinse, and dry module and methods for making and implementing the same 失效
    角旋转，冲洗和干燥模块及其制造和实施方法

    公开(公告)号：US06748961B2

    公开(公告)日：2004-06-15

    申请号：US09823813

    申请日：2001-03-30

    申请人： Randolph E. Treur

    发明人： Randolph E. Treur

    IPC分类号： B08B302

    CPC分类号： H01L21/67028 ,  Y10S134/902

    摘要： A wafer preparation module is provided. The wafer preparation module includes an enclosure, which contains wafer engaging rollers. The wafer engaging rollers are oriented at an angle and are designed to spin a wafer at an angle during preparation.

    摘要翻译： 提供了晶片制备模块。 晶片制备模块包括一个包含晶圆接合辊的外壳。 晶片接合辊以一定角度取向，并被设计成在制备期间以一定角度旋转晶片。

    Fluid delivery ring and methods for making and implementing the same
    4.
    发明授权
    Fluid delivery ring and methods for making and implementing the same 失效
    流体输送环及其制造和实施方法

    公开(公告)号：US07494550B2

    公开(公告)日：2009-02-24

    申请号：US11285986

    申请日：2005-11-23

    申请人： Stephen M. Smith ,  Randolph E. Treur

    发明人： Stephen M. Smith ,  Randolph E. Treur

    IPC分类号： B08B3/02

    CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902 ,  Y10T29/49432 ,  Y10T29/49433

    摘要： A method for rinsing a semiconductor wafer in a module utilizing a fluid delivery ring is provided. The method includes providing a process bowl having a generally circular shape bottom wall, a sidewall that extends upwardly from the bottom wall to define a cylindrical chamber, and a plurality of channels in the sidewall that extend from the bottom wall to an upper edge of the sidewall. A fluid delivery ring is attached onto the sidewall of the process bowl. Utilizing the process bowl, a plurality of supply tubes is inserted into the fluid delivery ring. The fluid delivery ring has a plurality of ring inlet and outlet pairs and a plurality of respective slots. Fluid is supplied to the supply tubes, and fluid is directed onto a surface of the semiconductor wafer defined within the process bowl.

    摘要翻译： 提供了一种利用流体输送环冲洗模块中的半导体晶片的方法。 该方法包括提供具有大致圆形形状的底壁的过程碗，从底壁向上延伸以限定圆柱形室的侧壁，以及在侧壁中从底壁延伸到上边缘的多个通道 侧壁。 流体输送环附接到处理碗的侧壁上。 利用处理碗，将多个供给管插入到流体输送环中。 流体输送环具有多个环入口和出口对以及多个相应的槽。 流体被供应到供应管，并且流体被引导到在处理碗内限定的半导体晶片的表面上。

    Angular spin, rinse, and dry module and methods for making and implementing the same
    6.
    发明授权
    Angular spin, rinse, and dry module and methods for making and implementing the same 有权
    角旋转，冲洗和干燥模块及其制造和实施的方法

    公开(公告)号：US07029539B2

    公开(公告)日：2006-04-18

    申请号：US10837232

    申请日：2004-04-30

    申请人： Randolph E. Treur

    发明人： Randolph E. Treur

    IPC分类号： B08B3/02

    CPC分类号： H01L21/67028 ,  Y10S134/902

    摘要： A method for processing a wafer in a spin, rinse, and dry (SRD) module is provided. The method includes engaging a wafer in a process plane, spinning the wafer in the process plane, and cleaning a top surface and a bottom surface of the wafer while spinning the wafer in the process plane. The process plane is configured to define a process angle with a horizontal plane. The process angle is configured to optimize the performance of the SRD module.

    摘要翻译： 提供了一种在旋转，冲洗和干燥（SRD）模块中处理晶片的方法。 该方法包括使晶片接合在处理平面中，在晶圆的过程平面中旋转晶片，以及在晶圆在工艺平面中旋转时清洁晶片的顶表面和底表面。 过程平面被配置为与水平面定义过程角度。 过程角度被配置为优化SRD模块的性能。

    Method and apparatus for monitoring a semiconductor wafer during a spin drying operation
    7.
    发明授权
    Method and apparatus for monitoring a semiconductor wafer during a spin drying operation 失效

    公开(公告)号：US06558964B2

    公开(公告)日：2003-05-06

    申请号：US09752614

    申请日：2000-12-27

    申请人： Randolph E. Treur

    发明人： Randolph E. Treur

    IPC分类号： H01L2166

    CPC分类号： H01L21/67253 ,  H01L21/67034 ,  Y10S438/974

    摘要： In one method for monitoring a semiconductor wafer during a spin drying operation, a capacitance value between a capacitance sensor and the wafer is measured as the wafer is being spun to dry a surface thereof. When it is determined that the measured capacitance value has reached a substantially constant level, a signal is generated indicating that the surface of the semiconductor wafer is dry. In another method, light is directed toward a surface of the wafer as the wafer is being spun to dry a surface thereof. The light is directed such that the light that reflects off of the surface of the wafer is substantially perpendicular to the surface of the wafer. The intensity of the light reflected off of the surface of the semiconductor wafer is measured. A signal indicating that the surface of the wafer is dry is generated when the measured intensity of the light reflected off of the surface of the wafer reaches an intensity level that corresponds to a measured intensity of light reflected off of the surface of the wafer when the surface is dry. In methods for spin drying a semiconductor wafer, spinning of the wafer is stopped in response to the signal. Apparatus for spin drying a semiconductor wafer including either a capacitance sensor or an interferometric sensor also are described.

    Fluid delivery ring and methods for making and implementing the same
    9.
    发明授权
    Fluid delivery ring and methods for making and implementing the same 有权
    流体输送环及其制造和实施方法

    公开(公告)号：US06481447B1

    公开(公告)日：2002-11-19

    申请号：US09672173

    申请日：2000-09-27

    申请人： Stephen M. Smith ,  Randolph E. Treur

    发明人： Stephen M. Smith ,  Randolph E. Treur

    IPC分类号： B08B302

    CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902 ,  Y10T29/49432 ,  Y10T29/49433

    摘要： A fluid delivery module for use in preparing a substrate is provided. The fluid delivery module includes a process bowl designed to contain a substrate to be prepared. The process bowl has a bottom wall and a sidewall. The fluid delivery module further includes a fluid delivery ring configured to be attached to the sidewall of the process bowl. The fluid delivery ring includes a plurality of inlet and outlet pairs. Each of the plurality of inlet and outlet pairs is defined in the fluid ring and is designed to receive a respective supply tube. Each respective supply tube has an end that terminates at each of the outlets of the fluid delivery ring and is configured to direct fluid onto a surface of the substrate.

    摘要翻译： 提供了一种用于制备基板的流体输送模块。 流体输送模块包括设计成容纳要制备的基底的处理碗。 处理碗具有底壁和侧壁。 流体输送模块还包括流体输送环，该流体输送环被配置为附接到处理碗的侧壁。 流体输送环包括多个入口和出口对。 多个入口和出口对中的每一个限定在流体环中并且被设计成接收相应的供给管。 每个相应的供应管具有终止于流体输送环的每个出口处的端部，并且构造成将流体引导到基板的表面上。