公开(公告)号：US20080061793A1

公开(公告)日：2008-03-13

申请号：US11925893

申请日：2007-10-27

申请人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Choi

发明人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Choi

IPC分类号： G01R31/08 ,  G01N27/62

CPC分类号： G01R31/1254

摘要： Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.

摘要翻译： 用于检测或抑制连接到电源的负载的电阻抗的电弧或其他异常变化的方法和装置。 优选地，负载是用于制造诸如半导体和平板显示器的电子部件的等离子体室。 通过监视一个或多个传感器来检测电弧。 每个传感器或者响应于由电源提供给等离子体的电力的特性，或者耦合到等离子体室，以便对室内的电磁条件作出响应。 通过在短时间内减少功率输出来抑制电弧。 然后电源增加其功率输出，最好提高到其原始值。 如果电弧恢复，则电源重复减少然后恢复功率输出的步骤。

公开(公告)号：US07292045B2

公开(公告)日：2007-11-06

申请号：US11149896

申请日：2005-06-10

申请人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Young Choi

发明人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Young Choi

IPC分类号： G01R31/08 ,  G01N27/66

CPC分类号： G01R31/1254

摘要： Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.

摘要翻译： 用于检测或抑制连接到电源的负载的电阻抗的电弧或其他异常变化的方法和装置。 优选地，负载是用于制造诸如半导体和平板显示器的电子部件的等离子体室。 通过监视一个或多个传感器来检测电弧。 每个传感器或者响应于由电源提供给等离子体的电力的特性，或者耦合到等离子体室，以便对室内的电磁条件作出响应。 通过在短时间内减少功率输出来抑制电弧。 然后电源增加其功率输出，最好提高到其原始值。 如果电弧恢复，则电源重复减少然后恢复功率输出的步骤。

公开(公告)号：US07514936B2

公开(公告)日：2009-04-07

申请号：US11925893

申请日：2007-10-27

申请人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Young Choi

发明人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Young Choi

IPC分类号： G01N27/62

CPC分类号： G01R31/1254

摘要： Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.

摘要翻译： 用于检测或抑制连接到电源的负载的电阻抗的电弧或其他异常变化的方法和装置。 优选地，负载是用于制造诸如半导体和平板显示器的电子部件的等离子体室。 通过监视一个或多个传感器来检测电弧。 每个传感器或者响应于由电源提供给等离子体的电力的特性，或者耦合到等离子体室，以便对室内的电磁条件作出响应。 通过在短时间内减少功率输出来抑制电弧。 然后电源增加其功率输出，最好提高到其原始值。 如果电弧恢复，则电源重复减少然后恢复功率输出的步骤。

公开(公告)号：US20060049831A1

公开(公告)日：2006-03-09

申请号：US11149896

申请日：2005-06-10

申请人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Choi

发明人： Suhail Anwar ,  Remegio Manacio ,  Chung-Hee Park ,  Dong-Kil Yim ,  Soo Choi

IPC分类号： G01R31/12

CPC分类号： G01R31/1254

摘要： Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.