High aspect ratio patterning of glass film
    1.
    发明授权
    High aspect ratio patterning of glass film 有权
    玻璃膜的高纵横比图案化

    公开(公告)号:US06678453B2

    公开(公告)日:2004-01-13

    申请号:US10128808

    申请日:2002-04-24

    IPC分类号: G03C556

    摘要: A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally crystallizable glass and heat treating the seed material and the layer of thermally crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally crystallizable glass layer at selected portions thereof. After the heat treatment, the layer of thermally crystallizable glass is converted into a desired pattern of glass surrounded by crystalline material. The crystalline material is removed with an etchant to leave a desired glass pattern.

    摘要翻译: 用于图案化玻璃或基底层的相对简便且廉价的方法包括对包含与可结晶玻璃层相邻的成核剂的种子材料进行图案化并热处理种子材料和可热结晶玻璃层以诱导高度取向的晶体生长 从晶种材料通过其可结晶玻璃层的选定部分的厚度。 在热处理之后,可热结晶玻璃层被转变为被结晶材料包围的所需玻璃图案。 用蚀刻剂除去结晶材料以留下所需的玻璃图案。

    Precision manometer gauge
    2.
    发明授权
    Precision manometer gauge 失效
    精密压力表

    公开(公告)号:US4455876A

    公开(公告)日:1984-06-26

    申请号:US425144

    申请日:1982-09-27

    IPC分类号: G01L7/18

    CPC分类号: G01L7/18

    摘要: A precision manometer gauge which locates a zero height and a measured height of liquid using an open tube in communication with a reservoir adapted to receive the pressure to be measured. The open tube has a reference section carried on a positioning plate which is moved vertically with machine tool precision. Double scales are provided to read the height of the positioning plate accurately, the reference section being inclined for accurate meniscus adjustment, and means being provided to accurately locate a zero or reference position.

    摘要翻译: 精密压力计,其使用开口管定位零高度和测量的液体高度,该开口管适于接收待测量的压力。 开放管具有承载在定位板上的参考部分,该定位板以机床精度垂直移动。 提供双标尺以准确地读取定位板的高度,参考部分倾斜以精确的弯月面调节,以及提供用于精确定位零点或参考位置的装置。

    Optical element with an opaque chrome coating having an aperture and method of making same
    3.
    发明授权
    Optical element with an opaque chrome coating having an aperture and method of making same 有权
    具有不透明铬涂层的光学元件具有孔径及其制造方法

    公开(公告)号:US07575798B2

    公开(公告)日:2009-08-18

    申请号:US11198712

    申请日:2005-08-05

    IPC分类号: B32B3/24

    摘要: A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating on a substrate includes depositing an initial thickness of the opaque chrome coating on the substrate without ion-assist or with undetectable ion-assist and depositing the remainder of the opaque chrome coating with or without ion-assist. In one embodiment the invention is directed to an apertured optical element having a substrate transmissive to light and an opaque chrome coating on the substrate defining an aperture. Three- and four-layer opaque coatings of various materials are disclosed, including three-layer chrome/chrome oxide/chrome coatings.

    摘要翻译: 衬底包括在衬底的表面上的不透明的铬涂层,其被干蚀刻以形成孔,其中孔中的铬低于可检测的极限。 在衬底上形成不透明铬涂层的方法包括在衬底上沉积不透明铬涂层的初始厚度,而无需离子辅助或不可检测的离子辅助,并沉积剩余的不透明铬涂层,有或没有离子辅助。 在一个实施例中,本发明涉及一种有孔光学元件,其具有透光的基板和限定孔的基板上的不透明铬涂层。 公开了各种材料的三层和四层不透明涂层,包括三层铬/铬/铬涂层。

    Low drift planar waveguide grating sensor and method for manufacturing same
    4.
    发明授权
    Low drift planar waveguide grating sensor and method for manufacturing same 失效
    低漂移平面波导光栅传感器及其制造方法

    公开(公告)号:US07218802B1

    公开(公告)日:2007-05-15

    申请号:US11292400

    申请日:2005-11-30

    IPC分类号: G02B6/00 G02B6/34 G02B6/10

    摘要: A planar waveguide grating (PWG) sensor is described herein which exhibits a low signal drift and an enhanced sensitivity due to the use of a fully dense silicon-rich nitride surface layer. In the preferred embodiment, the silicon rich silicon nitride surface layer has a composition which includes Si and N, and optionally H, Ge and/or O, where a Si/N atomic ratio is greater than 0.75. In addition, the silicon rich nitride surface layer has a refractive index that is greater than 2.45 and less than 3.2 at a wavelength of operation. A method is also described herein for manufacturing the PWG sensor with acceptable costs and high yields by utilizing well known semiconductor processes and tools.

    摘要翻译: 本文描述了一种平面波导光栅(PWG)传感器,其由于使用完全致密的富硅氮化物表面层而呈现低信号漂移和增强的灵敏度。 在优选实施例中,富硅氮化硅表面层具有包括Si和N以及任选的H,Ge和/或O的组成,其中Si / N原子比大于0.75。 此外,富硅氮化物表面层在工作波长处具有大于2.45且小于3.2的折射率。 本文还描述了通过利用公知的半导体工艺和工具制造具有可接受的成本和高产率的PWG传感器的方法。

    Dehydroxylation and purification of calcium fluoride materials using a halogen containing plasma
    5.
    发明授权
    Dehydroxylation and purification of calcium fluoride materials using a halogen containing plasma 失效
    使用含卤素等离子体对氟化钙材料进行脱羟基化和纯化

    公开(公告)号:US06982001B2

    公开(公告)日:2006-01-03

    申请号:US10856633

    申请日:2004-05-28

    IPC分类号: C30B11/00 C30B11/12

    摘要: The invention is directed to a process of purifying metal fluoride materials used to make metal fluoride single crystals suitable for making optical elements used in the transmission of wavelengths below 200 nm, and in particular to a process of purifying such materials by the use of a halogen containing plasma to convert metal oxygenates contaminating the feedstocks used in the preparation of the crystals to metal fluorides. The invention also is directed to a process of growing a metal fluoride single crystal using a crystal growth furnace to carry out the foregoing purification procedure followed by the steps of melting the purified material and cooling it using s selected time and temperature cycle to from a metal fluoride single crystal. The plasmas used in practicing the invention can be derived from a variety of halogenated materials including, for example, fluorocarbons, chlorocarbons, boron trihalides, chlorine, fluorine, xenon difluoride and other gaseous or easily volatilized halogenated substances known in the art.

    摘要翻译: 本发明涉及一种净化金属氟化物材料的方法,所述金属氟化物材料用于制备适于制造用于波长低于200nm的透射体的光学元件的金属氟化物单晶,并且特别涉及一种通过使用卤素 将等离子体转化成金属氧化物,将用于制备晶体的原料污染成金属氟化物。 本发明还涉及使用晶体生长炉生长金属氟化物单晶的方法,以执行上述纯化程序,然后是将精制材料熔化并使用选定的时间和温度循环冷却至金属 氟化物单晶。 用于实施本发明的等离子体可以衍生自各种卤化物质,包括例如碳氟化合物,氯代烃,三卤化硼,氯,氟,氙二氟化物以及本领域已知的其它气态或易挥发的卤化物质。

    High aspect ratio patterning of glass film
    6.
    发明授权
    High aspect ratio patterning of glass film 失效
    玻璃膜的高纵横比图案化

    公开(公告)号:US06403286B1

    公开(公告)日:2002-06-11

    申请号:US09433215

    申请日:1999-11-04

    IPC分类号: G03C556

    摘要: A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally crystallizable glass and heart treating the seed material and the layer of thermally crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally crystallizable glass layer at selected portions thereof. After the heart treatment, the layer of thermally crystallizable glass is converted into a desired pattern of glass surrounded by crystalline material. The crystalline material is removed with an etchant to leave a desired glass pattern.

    摘要翻译: 用于图案化玻璃或基底层的相对容易且廉价的方法包括将含有成核剂的种子材料图案化在邻近一层可热结晶的玻璃和心脏处理种子材料和热可结晶玻璃层以诱导高度取向的晶体生长 从晶种材料通过其可结晶玻璃层的选定部分的厚度。 在心脏处理之后,可热结晶玻璃层被转变成被结晶材料包围的所需玻璃图案。 用蚀刻剂除去结晶材料以留下所需的玻璃图案。

    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
    7.
    发明申请
    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION 有权
    尺寸二氧化硅多孔硅结构和制造方法

    公开(公告)号:US20120052656A1

    公开(公告)日:2012-03-01

    申请号:US13100593

    申请日:2011-05-04

    摘要: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

    摘要翻译: 考虑制造尺寸二氧化硅基底或包括多孔硅层的结构的方法。 根据一个实施方案,通过在加热的惰性气氛中使金属气体与衬底反应,从石英玻璃衬底的原子元素组合物中提取氧,以沿着衬底的表面形成金属 - 氧络合物。 从石英玻璃基板的表面除去金属 - 氧络合物,得到结晶多孔硅表面部分,并且在石英玻璃基板的结晶多孔硅表面部分上形成一个或多个附加层,得到尺寸二氧化硅基 包括多孔硅层的衬底或结构。 也可以考虑实施方案,其中基材是玻璃基的,但不一定是二氧化硅基玻璃基材。 公开并要求保护附加实施例。

    Dimensional silica-based porous silicon structures and methods of fabrication
    8.
    发明授权
    Dimensional silica-based porous silicon structures and methods of fabrication 有权
    尺寸二氧化硅基多孔硅结构和制造方法

    公开(公告)号:US08415555B2

    公开(公告)日:2013-04-09

    申请号:US13100593

    申请日:2011-05-04

    IPC分类号: H01L31/042

    摘要: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

    摘要翻译: 考虑制造尺寸二氧化硅基底或包括多孔硅层的结构的方法。 根据一个实施方案,通过在加热的惰性气氛中使金属气体与衬底反应,从石英玻璃衬底的原子元素组合物中提取氧,以沿着衬底的表面形成金属 - 氧络合物。 从石英玻璃基板的表面除去金属 - 氧络合物,得到结晶多孔硅表面部分,并且在石英玻璃基板的结晶多孔硅表面部分上形成一个或多个附加层,得到尺寸二氧化硅基 包括多孔硅层的衬底或结构。 也可以考虑实施方案,其中基材是玻璃基的,但不一定是二氧化硅基玻璃基材。 公开并要求保护附加实施例。

    High germanium content waveguide materials
    9.
    发明授权
    High germanium content waveguide materials 有权
    高锗含量波导材料

    公开(公告)号:US06768856B2

    公开(公告)日:2004-07-27

    申请号:US09917039

    申请日:2001-07-27

    IPC分类号: G02B610

    摘要: Germanium-silicon oxide, germanium-silicon oxynitride and silica-germania-titania materials and oxynitride materials suitable for fabricating optical waveguides for liquid crystal based cross-connect optical switching devices have a refractive index of from about 1.48 to about 1.52 at 1550 nm, and a coefficient of thermal expansion at room temperature of from about 3×10−6° C.−1 to about 4.4×10−6° C.−1. The compositions are adjusted so that the refractive index of the germanium-silicon oxide, germanium-silicon oxynitride or silica-germania-titania material is closely matched to the refractive index of a typical liquid crystal material whereby improved optical performance of a liquid crystal based cross-connect optical switching device is achieved. The coefficient of thermal expansion of the germanium-silicon oxide, germanium-silicon oxynitride, or silica-germania-titania material is closely matched to the coefficient of thermal expansion of silicon, whereby strain induced birefringence caused by thermal stresses is reduced or avoided.

    摘要翻译: 锗 - 氧化硅,锗硅氮氧化物和二氧化硅 - 二氧化锗 - 二氧化钛材料和适用于制造用于液晶的交叉连接光开关器件的光波导的氧氮化物材料在1550nm具有约1.48至约1.52的折射率,以及 在室温下的热膨胀系数为约3×10 -6℃至约4.4×10 -6℃。 调整组合物使得锗 - 氧化硅,锗 - 氮氧化硅或二氧化硅 - 二氧化锗 - 二氧化钛材料的折射率与典型液晶材料的折射率紧密匹配,从而改善了基于液晶的交叉的光学性能 实现了连接光开关器件。 锗 - 硅氧化物,锗 - 氮氧化硅或二氧化硅 - 二氧化锗 - 二氧化钛材料的热膨胀系数与硅的热膨胀系数紧密匹配,从而降低或避免了由热应力引起的应变引起的双折射。