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公开(公告)号：US08885147B2
公开(公告)日：2014-11-11
申请号：US12699544
申请日：2010-02-03
申请人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
发明人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
CPC分类号： G03F7/70758 , G03F7/70783 , Y10T74/20354
摘要： A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.
摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 衬底台，其被构造成将衬底保持在中心区域上; 以及投影系统，被配置为将图案化的辐射束在第一方向上投影到基板的目标部分上。 该装置还包括定位装置以定位衬底台，其中定位装置包括多个致动器，其布置成在使用中施加力以定位衬底台，该力基本上被引导在基本上垂直于第一方向的平面 并且其中所述多个致动器布置在所述衬底台的中心体积的外侧，所述中心体积通过沿着所述第一方向突出所述中心区域而获得。
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公开(公告)号：US20100214548A1
公开(公告)日：2010-08-26
申请号：US12699544
申请日：2010-02-03
申请人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
发明人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
CPC分类号： G03F7/70758 , G03F7/70783 , Y10T74/20354
摘要： A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.
摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 衬底台，其被构造成将衬底保持在中心区域上; 以及投影系统，被配置为将图案化的辐射束在第一方向上投影到基板的目标部分上。 该装置还包括定位装置以定位衬底台，其中定位装置包括多个致动器，其布置成在使用中施加力以定位衬底台，该力基本上被引导在基本上垂直于第一方向的平面 并且其中所述多个致动器布置在所述衬底台的中心体积的外侧，所述中心体积通过沿着所述第一方向突出所述中心区域而获得。
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