公开(公告)号：US07824536B2

公开(公告)日：2010-11-02

申请号：US11449953

申请日：2006-06-09

Applicant: Shekar Balagopal ,  Justin Pendleton ,  Robin Richards

Inventor： Shekar Balagopal ,  Justin Pendleton ,  Robin Richards

IPC: C25B3/00

CPC classification number: B01D61/44 ,  B01D69/02 ,  B01D69/04 ,  B01D71/02 ,  B01D2323/12 ,  B01D2325/26 ,  C04B35/16 ,  C04B35/447 ,  C04B35/481 ,  C04B2235/3201 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3244 ,  C04B2235/3286 ,  C04B2235/3418 ,  C04B2235/447 ,  C04B2235/79 ,  C25B3/12 ,  C25B9/08 ,  C25B13/04

Abstract: Disclosed are processes of making solutions of alkali alkoxides in their corresponding alcohols using an electrolytic process. In one embodiment, sodium methoxide in methanol is made from methanol and aqueous sodium hydroxide solution, where the aqueous sodium hydroxide solution is present in the anolyte compartment and a solution of sodium methoxide in methanol is present in the catholyte compartment, the two compartments are separated by a ceramic membrane that selectively transports sodium ions under the influence of an electric potential, and wherein the composition of the solution of sodium methoxide in methanol in the catholyte compartment of the electrolytic cell comprises between at least about 2% by weight sodium methoxide and at most about 20% by weight sodium methoxide.

Abstract translation: 公开了使用电解方法在其相应的醇中制备碱金属醇溶液的方法。 在一个实施方案中，甲醇中的甲醇钠由甲醇和氢氧化钠水溶液制成，其中氢氧化钠水溶液存在于阳极电解液室中，甲醇钠在甲醇中的溶液存在于阴极电解液室中，两个隔室被分离 通过选择性地在电势的影响下输送钠离子的陶瓷膜，并且其中电解池的阴极电解液室中的甲醇钠在甲醇中的溶液的组成包含至少约2重量％的甲醇钠和在 最多约20重量％的甲醇钠。

公开(公告)号：US20060162261A1

公开(公告)日：2006-07-27

申请号：US11233110

申请日：2005-09-22

Applicant: Junaid Siddiqui ,  Daniel Castillo ,  Robin Richards ,  Timothy Compton

Inventor： Junaid Siddiqui ,  Daniel Castillo ,  Robin Richards ,  Timothy Compton

IPC: C09K3/14 ,  H01L21/302 ,  B24D3/02

CPC classification number: H01L21/31053 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1463

Abstract: A low solids-content slurry for polishing (e.g., chemical mechanical planarization) of substrates comprising a dielectric and an associated method using the slurry are described. The slurry and associated method afford high removal rates of dielectric during polishing even though the slurry has low solids-content. The slurry comprises a bicarbonate salt, which acts as a catalyst for increasing removal rates of dielectric films during polishing of these substrates.

Abstract translation: 描述了一种用于抛光（例如化学机械平面化）的含固体含量低的浆料，其包含电介质和使用该浆料的相关方法。 浆料和相关方法在抛光过程中提供高电介质的去除速率，即使浆料具有低的固体含量。 该浆料包括碳酸氢盐，其作为用于在抛光这些基材期间提高介电膜的去除速率的催化剂。

公开(公告)号：US20050076579A1

公开(公告)日：2005-04-14

申请号：US10683233

申请日：2003-10-10

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/321 ,  B24D3/02 ,  H01L21/302 ,  H01L21/461

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).

公开(公告)号：US20050194563A1

公开(公告)日：2005-09-08

申请号：US11032593

申请日：2005-01-10

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/321 ,  C09K13/00 ,  B44C1/22 ,  C23F1/00 ,  H01L21/302

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).

Abstract translation: 描述了用于化学机械平面化（或其它抛光）的组合物和相关方法。 组合物包含研磨剂和三羟甲基型或二亚胺型化合物。 该组合物具有相对于钽和介电材料去除铜的高选择性，同时最小化CMP中的局部凹陷和侵蚀效应。 组合物还可以包含氧化剂，在这种情况下，组合物特别适用于金属CMP应用的相关方法（例如，铜CMP）。

公开(公告)号：US20090220122A1

公开(公告)日：2009-09-03

申请号：US12093311

申请日：2006-11-10

Applicant: Robin Richards ,  Andrew McCance

Inventor： Robin Richards ,  Andrew McCance

IPC: G06K9/00

CPC classification number: A61C19/045 ,  A61B5/1114 ,  A61B5/1127 ,  A61B5/4504 ,  A61B5/4547 ,  A61B34/20 ,  A61B2034/105 ,  A61B2034/2055 ,  A61B2034/2065

Abstract: Systems and methods are provided for measuring relative movement between two portions of the facial skeleton. A target (4) is fixed in position relative t a one of the portions of the facial skeleton, the target comprising three or more light sources having a known geometric relationship with one another. An image capture device (2) is fixed in position relative to the other of the portions of the facial skeleton for capturing images of the three or more light sources of the target. The captured images can be used to determine relative changes in portion and orientation of the two portions of the facial skeleton.

Abstract translation: 提供了用于测量面部骨骼的两个部分之间的相对运动的系统和方法。 目标（4）相对于面部骨骼的一部分固定在适当位置，目标包括具有彼此已知几何关系的三个或更多个光源。 图像捕获装置（2）相对于面部骨骼的另一部分被固定在适当位置以捕获目标的三个或更多个光源的图像。 捕获的图像可以用于确定面部骨骼的两个部分的部分和取向的相对变化。

公开(公告)号：US20060226022A1

公开(公告)日：2006-10-12

申请号：US11449953

申请日：2006-06-09

Applicant: Shekar Balagopal ,  Justin Pendleton ,  Robin Richards

Inventor： Shekar Balagopal ,  Justin Pendleton ,  Robin Richards

IPC: C25B3/12

CPC classification number: B01D61/44 ,  B01D69/02 ,  B01D69/04 ,  B01D71/02 ,  B01D2323/12 ,  B01D2325/26 ,  C04B35/16 ,  C04B35/447 ,  C04B35/481 ,  C04B2235/3201 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3244 ,  C04B2235/3286 ,  C04B2235/3418 ,  C04B2235/447 ,  C04B2235/79 ,  C25B3/12 ,  C25B9/08 ,  C25B13/04

Abstract: Disclosed are processes of making solutions of alkali alkoxides in their corresponding alcohols using an electrolytic process. In one embodiment, sodium methoxide in methanol is made from methanol and aqueous sodium hydroxide solution, where the aqueous sodium hydroxide solution is present in the anolyte compartment and a solution of sodium methoxide in methanol is present in the catholyte compartment, the two compartments are separated by a ceramic membrane that selectively transports sodium ions under the influence of an electric potential, and wherein the composition of the solution of sodium methoxide in methanol in the catholyte compartment of the electrolytic cell comprises between at least about 2% by weight sodium methoxide and at most about 20% by weight sodium methoxide.

Abstract translation: 公开了使用电解方法在其相应的醇中制备碱金属醇溶液的方法。 在一个实施方案中，甲醇中的甲醇钠由甲醇和氢氧化钠水溶液制成，其中氢氧化钠水溶液存在于阳极电解液室中，甲醇钠在甲醇中的溶液存在于阴极电解液室中，两个隔室被分离 通过选择性地在电势的影响下输送钠离子的陶瓷膜，并且其中电解池的阴极电解液室中的甲醇钠在甲醇中的溶液的组成包含至少约2重量％的甲醇钠和在 最多约20重量％的甲醇钠。

公开(公告)号：US20200038818A1

公开(公告)日：2020-02-06

申请号：US16601213

申请日：2019-10-14

Applicant: Cara Armstrong ,  Robin Richards ,  Richard Nanula ,  Ravi Sawhney ,  Lance Hussey ,  John Elam ,  Harnish Jani ,  Alexander Gilbert ,  Derek Wong ,  Jonathan Gjemso ,  Michael Schuffert ,  Scott Clear ,  Stephen Miczak

Inventor： Cara Armstrong ,  Robin Richards ,  Richard Nanula ,  Ravi Sawhney ,  Lance Hussey ,  John Elam ,  Harnish Jani ,  Alexander Gilbert ,  Derek Wong ,  Jonathan Gjemso ,  Michael Schuffert ,  Scott Clear ,  Stephen Miczak

IPC: B01F3/08 ,  B01F5/00 ,  A47J31/40 ,  B01F15/02 ,  B01F5/20

Abstract: Described is an apparatus for preparing baby formula using a liquid concentrate solution. The apparatus includes a housing with a cavity for receiving and holding a container liquid concentrate solution. A motor is attached with the housing for forcing liquid concentrate solution from the container and into a mixing chamber. A pump and a water tank are also included. A spray head is attached with the housing. The spray head includes a plurality of spray jets in fluid connection with the pump for receiving water from the water tank and dispensing water from the spray jets into the mixing chamber. Finally, the mixing chamber receives the liquid concentrate solution and water, such that when the water and the liquid concentrate solution are introduced into the mixing chamber, the water and liquid concentrate solution mix into a baby formula and are dispensed from an outlet in the mixing chamber.

公开(公告)号：US20130072940A1

公开(公告)日：2013-03-21

申请号：US13636818

申请日：2011-03-24

Applicant: Andrew Joseph Stanley Dawood ,  Stephen Robin Richards ,  Alister James Hart

Inventor： Andrew Joseph Stanley Dawood ,  Stephen Robin Richards ,  Alister James Hart

IPC: A61B17/56

CPC classification number: A61B17/1746 ,  A61B17/1666 ,  A61B34/10 ,  A61B2034/104 ,  A61B2034/105 ,  A61B2034/108 ,  B33Y80/00

Abstract: Apparatus for guiding a shaping tool for shaping an acetabulum comprises locating means (40) arranged to be located in the acetabulum, guide means (50) for guiding the shaping tool, and support means (80) for supporting the guide means, wherein the guide means is arranged to locate against the locating means in a target position, and the support means is arranged to support the guide means in the target position after removal of the locating means.

Abstract translation: 用于引导用于成形髋臼的成形工具的装置包括布置成位于髋臼中的定位装置（40），用于引导成形工具的引导装置（50）和用于支撑引导装置的支撑装置（80），其中导向件 装置布置成在目标位置抵靠定位装置定位，并且支撑装置被布置成在移除定位装置之后将引导装置支撑在目标位置。

公开(公告)号：US20060270235A1

公开(公告)日：2006-11-30

申请号：US11387934

申请日：2006-03-24

Applicant: Junaid Siddiqui ,  Daniel Castillo ,  Steven Aragaki ,  Robin Richards

Inventor： Junaid Siddiqui ,  Daniel Castillo ,  Steven Aragaki ,  Robin Richards

IPC: C09K13/00 ,  H01L21/461 ,  H01L21/302 ,  C09K13/06

CPC classification number: C09K3/1463 ,  C09G1/02 ,  H01L21/02074 ,  H01L21/3212 ,  H01L21/32125

Abstract: A chemical mechanical polishing composition contains 1) water, 2) optionally an abrasive material, 3) an oxidizer, preferably a per-type oxidizer, 4) a small amount of soluble metal-ion oxidizer/polishing accelerator, a metal-ion polishing accelerator bound to particles such as to abrasive particles, or both; and 5) at least one of the group selected from a) a small amount of a chelator, b) a small amount of a dihydroxy enolic compound, and c) a small amount of an organic accelerator. Ascorbic acid in an amount less than 800 ppm, preferably between about 100 ppm and 500 ppm, is the preferred dihydroxy enolic compound. The polishing compositions and processes are useful for substantially all metals and metallic compounds found in integrated circuits, but is particularly useful for tungsten. The present invention also pertains to surface-modified colloidal abrasive polishing compositions and associated methods of using these compositions, particularly for chemical mechanical planarization, wherein the slurry comprises low levels of chelating free radical quenchers, non-chelating free radical quenchers, or both.

公开(公告)号：US20050076578A1

公开(公告)日：2005-04-14

申请号：US10683232

申请日：2003-10-10

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  B24D3/02

CPC classification number: C09G1/02

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.

Abstract translation: 描述了用于化学机械平面化（或其他抛光）的组合物和相关方法，其在铜CMP中提供高的钽到铜选择性，并且其可调谐（相对于抛光性能）。 该组合物包含磨料和N-酰基-N-烃氧烷基天冬氨酸化合物和/或甲苯基三唑衍生物。