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    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    5.
    发明申请
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 有权
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US20050221229A1

    公开(公告)日：2005-10-06

    申请号：US11086048

    申请日：2005-03-22

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chuang

    IPC分类号： A61N5/00 ,  G01N1/32 ,  G03C5/00 ,  G03F9/00 ,  G21G5/00 ,  H01J37/30

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    Spare Tire Assembly
    6.
    发明申请
    Spare Tire Assembly 审中-公开

    公开(公告)号：US20170349008A1

    公开(公告)日：2017-12-07

    申请号：US15175203

    申请日：2016-06-07

    申请人： Rudy Garcia

    发明人： Rudy Garcia

    IPC分类号： B60C17/06

    CPC分类号： B60C17/06 ,  B60C2017/063

    摘要： A spare tire assembly for pre-installation in tires to protect tires when flattened includes an insert that is resilient. The insert is toroidally shaped and defines a central opening. The central opening is complementary to a rim of a wheel, such that the insert is positionable between the rim and a tire that is to be coupled to the rim. A cover is positioned over an outer surface of the insert. The cover is configured to shield the insert from potential damage as the wheel rotates with the tire in a deflated condition. A user is able to operate a vehicle having a flattened tire that is configured with the insert for a period of time without damaging the flattened tire.

    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    7.
    发明授权
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 失效
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US08765496B2

    公开(公告)日：2014-07-01

    申请号：US12110759

    申请日：2008-04-28

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    IPC分类号： H01L21/00

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。