公开(公告)号：US12235881B2

公开(公告)日：2025-02-25

申请号：US17669625

申请日：2022-02-11

Applicant: SCREEN HOLDINGS CO., LTD.

Inventor： Koki Umehara ,  Kiyotaka Kasubuchi ,  Akiko Yoshida ,  Manri Terada ,  Yuki Sumiya

IPC: G06F16/335 ,  G06F16/334 ,  G06F16/355 ,  G06F40/247 ,  G06F40/53 ,  G06N20/00

Abstract: A vector acquisition method includes: inputting, into a learned model, at least one piece of text including at least two of a plurality of words obtained by dividing a compound, the compound being a word divisible into the plurality of words; outputting, from the learned model, an adjusted vector corresponding to at least one of the words obtained by dividing the compound in the input piece of text; and acquiring a compound vector corresponding to the compound using the adjusted vector output from the learned model. Classification accuracy of vectors corresponding to words can thereby be enhanced.

公开(公告)号：US20250062116A1

公开(公告)日：2025-02-20

申请号：US18722502

申请日：2022-11-16

Applicant: SCREEN HOLDINGS CO., LTD.

Inventor： Noritake SUMI ,  Hajime SHIRAKAWA ,  Masaki INABA ,  Koji ANDO ,  Tomohiro MOTONO

IPC: H01L21/02 ,  B08B7/00 ,  H01L21/67

Abstract: A substrate processing apparatus with a support part that has a substrate-facing surface and supports the substrate in a state of being spaced from the substrate-facing surface. The support part is accommodated into a processing space of a processing chamber. A processing fluid flows in a certain direction in the processing space. In a path for a laminar flow of the processing fluid between the substrate and the support part, a downstream path positioned on a downstream side in the certain direction is wider than an upstream path positioned on an upstream side in the certain direction to reduce the pressure loss of the processing fluid flowing from the upstream path to the downstream path to prevent re-adhesion of the liquid to the substrate.

公开(公告)号：US20250054772A1

公开(公告)日：2025-02-13

申请号：US18677613

申请日：2024-05-29

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hideaki TANIMURA

IPC: H01L21/324 ,  H01L21/67 ,  H01L21/687

Abstract: A semiconductor wafer is preheated to a predetermined preheating temperature. Thereafter, flash heating for heating a front surface of the semiconductor wafer is performed by irradiating the front surface with flashes of light. The flash heating includes a first flash heating process in which the temperature of the front surface of the semiconductor wafer is increased at a first temperature increase rate, and a second flash heating process in which the temperature of the front surface of the semiconductor wafer is increased at a second temperature increase rate higher than the first temperature increase rate. The preheating temperature is made lower than a reaction temperature, and a shortage of the preheating is compensated for by the first flash heating process. Finally, the second flash heating process increases the temperature of the front surface of the semiconductor wafer to a target treatment temperature.

公开(公告)号：US20250054133A1

公开(公告)日：2025-02-13

申请号：US18720523

申请日：2023-01-25

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Shinji SHIMIZU

IPC: G06T7/00 ,  H04N7/18

Abstract: A substrate processing apparatus includes a chamber, a substrate holder, a camera, and a controller. The substrate holder holds a substrate in the chamber. The camera captures an image of an imaging region including the monitoring target in the chamber, and generates captured image data. The controller specifies an environmental state in an imaging region, monitors the state of the monitoring target based on the captured image data in a first determination procedure corresponding to a first environmental state when the environmental state is in the first environmental state, and monitors the state of the monitoring target based on the captured image data in a second determination procedure corresponding to a second environmental state and different from the first determination procedure when the environmental state is the second environmental state different from the first environmental state.

公开(公告)号：US12219670B2

公开(公告)日：2025-02-04

申请号：US17325906

申请日：2021-05-20

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Makoto Abe ,  Hikaru Kawarazaki ,  Hideaki Tanimura ,  Masashi Furukawa

IPC: H05B3/00 ,  F27B17/00 ,  F27D11/12 ,  H01L21/67

Abstract: A semiconductor wafer held by a holding part in a chamber is irradiated and heated with halogen light emitted from a plurality of halogen lamps. A cylindrical louver and an annular light-shielding member, both made of opaque quartz, are provided between the halogen lamps and the semiconductor wafer. The outer diameter of the light-shielding member is smaller than the inner diameter of the louver. Light emitted from the halogen lamps and passing through a clearance between the inner wall surface of the louver and the outer circumference of the light-shielding member is applied to a peripheral portion of the semiconductor wafer where a temperature drop is likely to occur. On the other hand, light travelling toward an overheat region that has a higher temperature than the other region and appears in the surface of the semiconductor wafer when only a louver is installed is blocked off by the light-shielding member.

公开(公告)号：US12216954B2

公开(公告)日：2025-02-04

申请号：US18088992

申请日：2022-12-27

Applicant: SCREEN HOLDINGS CO., LTD.

Inventor： Hiroshi Ogi ,  Saya Shibata ,  Tomoyasu Furuta

IPC: G06F3/14 ,  G06F3/0482 ,  G06F3/04842 ,  G06T7/00 ,  G06T7/30

Abstract: An image display method according to this invention includes obtaining an image set including a plurality of stained images, the plurality of stained images being obtained by imaging a multiple immunostained tissue specimen, a registration processing being performed for mutual registration for the plurality of stained images, and switching and displaying the stained images included in the image set on a screen in accordance with a predetermined switch rule with a result of the registration processing reflected. An image includes at least one of the stained images and a graphical user interface for receiving an operation input from a user for editing the switch rule being displayed on the screen. The switch rule is changed and set according to the operation input. The image is displayed on the screen in accordance with the changed and set switch rule.

公开(公告)号：US20250033053A1

公开(公告)日：2025-01-30

申请号：US18781251

申请日：2024-07-23

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Katsuaki KAWARA

IPC: B01L3/00

Abstract: A channel chip includes a main channel and a plurality of auxiliary channels. A liquid containing particles flows through the main channel. The plurality of auxiliary channels branch from the main channel. A channel width in each of the plurality of auxiliary channels is fixed. Lengths of the plurality of auxiliary channels become shorter toward the downstream side in a flow direction of the liquid flowing through the main channel.

公开(公告)号：US12211687B2

公开(公告)日：2025-01-28

申请号：US17558595

申请日：2021-12-22

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Shigeru Yamamoto ,  Daiki Fujii ,  Keiji Iwata ,  Kenji Edamitsu ,  Yuya Kawai ,  Kenichi Ito

IPC: H01L21/02 ,  B08B3/04 ,  H01L21/67

Abstract: A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.

公开(公告)号：US20250029861A1

公开(公告)日：2025-01-23

申请号：US18755641

申请日：2024-06-26

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Akihiro IWASAKI ,  Tsuyoshi TOMITA ,  Shinichi TANIGUCHI

IPC: H01L21/677

Abstract: In a substrate treatment system, a stocker device, a single-wafer treatment device, an interface device, and a batch treatment device are disposed in a line and linearly in this order. A first transport robot of the stocker device transports a carrier placed on a load port to a stocker device side position. A carrier transport mechanism transports the carrier from the stocker device side position to an interface device side position. A second transport robot of the interface device transports the carrier from the interface device side position to a shelf. The batch treatment device takes out a plurality of substrates from the carrier transported to the shelf, and performs predetermined batch treatment on the plurality of taken-out substrates. The single-wafer treatment device performs treatment on a plurality of substrates one by one.

公开(公告)号：US12204802B2

公开(公告)日：2025-01-21

申请号：US18477048

申请日：2023-09-28

Applicant: SCREEN HOLDINGS CO., LTD.

Inventor： Susumu Takahashi ,  Tetsuya Ishida

IPC: G06K15/00 ,  B41J13/00 ,  G06F3/12 ,  G06K15/02 ,  G06K15/10 ,  G06K15/16

Abstract: When a printing interruption cause occurs during printing of an image on a printing medium, printing of a page being printed is completed, and further only a position mark is printed on a printing resumption page. Then, a printing unit is stopped, and a conveyance speed is decelerated to stop conveyance of the printing medium. Next, the printing medium is rewound so that printing is resumed from the printing resumption page. Thereafter, the conveyance speed is accelerated to a predetermined speed, and printing is resumed from the printing resumption page on which the position mark is printed.