公开(公告)号：US20180308663A1

公开(公告)日：2018-10-25

申请号：US15960372

申请日：2018-04-23

申请人： Kenneth S. Collins ,  Kartik Ramaswamy ,  Yue Guo ,  Shahid Rauf ,  Kallol Bera ,  James D. Carducci ,  Michael R. Rice

发明人： Kenneth S. Collins ,  Kartik Ramaswamy ,  Yue Guo ,  Shahid Rauf ,  Kallol Bera ,  James D. Carducci ,  Michael R. Rice

IPC分类号： H01J37/32 ,  C23C16/455

CPC分类号： H01J37/32137 ,  C23C16/45536 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32715 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6831

摘要： A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpiece support to hold a workpiece, an intra-chamber electrode assembly including a plurality of filaments extending laterally through the plasma chamber between a ceiling of the plasma chamber and the workpiece support, each filament including a conductor surrounded by a cylindrical insulating shell, and an RF power source configured to apply a first RF signal to at least some of the plurality of filaments, to apply a second RF signal of equal frequency to at least some of the plurality of filaments, and to modulate a phase offset between the first RF signal and the second RF signal.

公开(公告)号：US08512509B2

公开(公告)日：2013-08-20

申请号：US12004444

申请日：2007-12-19

申请人： Kallol Bera ,  Shahid Rauf

发明人： Kallol Bera ,  Shahid Rauf

IPC分类号： H01L21/306

CPC分类号： B01J19/26 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32449

摘要： In a showerhead assembly, a path splitting manifold comprises a gas supply inlet and a planar floor and plural gas outlets extending axially through the floor and azimuthally distributed about the floor. The path splitting manifold further comprises a plurality of channels comprising plural paths between the inlet and respective ones of the plural outlets. A gas distribution showerhead underlies the floor of the manifold and is open to the plural outlets. In certain embodiments, the plural paths are of equal lengths.

公开(公告)号：US20130098882A1

公开(公告)日：2013-04-25

申请号：US13595292

申请日：2012-08-27

申请人： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  James D. Carducci ,  Gary Leray ,  Kartik Ramaswamy

发明人： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  James D. Carducci ,  Gary Leray ,  Kartik Ramaswamy

IPC分类号： B23K15/00

CPC分类号： H01J37/3233 ,  G21K5/00 ,  H05H1/46 ,  H05H7/001

摘要： A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented beam dump that is profiled to promote uniformity in the electron beam-produced plasma.

摘要翻译： 通过电子束在工件处理室中产生等离子体的等离子体反应器具有电子束源和分段的束流，其形状是为了促进电子束产生的等离子体中的均匀性。

公开(公告)号：US20130098873A1

公开(公告)日：2013-04-25

申请号：US13595655

申请日：2012-08-27

申请人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

发明人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

IPC分类号： H01L21/3065 ,  C23F1/08

CPC分类号： H01J37/32091 ,  H01J37/32541

摘要： A plasma reactor has a main chamber for processing a workpiece in a processing region bounded between an overhead ceiling and a workpiece support surface, the reactor having an overhead electron beam source that produces an electron beam flowing into the processing region through the ceiling of the main chamber.

摘要翻译： 等离子体反应器具有用于在位于顶棚顶板和工件支撑表面之间的加工区域内加工工件的主室，所述反应器具有塔顶电子束源，其产生通过主体的天花板流入处理区域的电子束 房间。

公开(公告)号：US20130098552A1

公开(公告)日：2013-04-25

申请号：US13595252

申请日：2012-08-27

申请人： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  James D. Carducci ,  Gary Leray ,  Kartik Ramaswamy

发明人： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  James D. Carducci ,  Gary Leray ,  Kartik Ramaswamy

IPC分类号： C23F1/08

CPC分类号： H01J37/3233 ,  H01J2237/06366

摘要： A plasma, reactor that relies on an electron beam as a plasma source employs a profiled electron beam extraction grid in an electron beam source to improve uniformity.

摘要翻译： 依靠电子束作为等离子体源的等离子体反应器采用电子束源中的形状电子束提取栅格来改善均匀性。

公开(公告)号：US20120086464A1

公开(公告)日：2012-04-12

申请号：US13052280

申请日：2011-03-21

申请人： Hiroji Hanawa ,  Satoru Kobayashi ,  Kartik Ramaswamy ,  Shahid Rauf

发明人： Hiroji Hanawa ,  Satoru Kobayashi ,  Kartik Ramaswamy ,  Shahid Rauf

IPC分类号： G01R27/04

CPC分类号： G01R27/32 ,  G01R19/0061 ,  H05H1/0081

摘要： An RE voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement. An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber.

摘要翻译： RE电压探头适于具有长同轴电缆，以允许测量装置远离探头连接，而不会使电压测量失真。 RF电流探针被封装在导电壳体中以允许其放置在等离子体反应器室内。

公开(公告)号：US20120034136A1

公开(公告)日：2012-02-09

申请号：US13050481

申请日：2011-03-17

申请人： Kenneth S. Collins ,  Zhigang Chen ,  Kartik Ramaswamy ,  James D. Carducci ,  Shahid Rauf ,  Andrew Nguyen

发明人： Kenneth S. Collins ,  Zhigang Chen ,  Kartik Ramaswamy ,  James D. Carducci ,  Shahid Rauf ,  Andrew Nguyen

IPC分类号： B01J19/08

CPC分类号： H01J37/32091 ,  H01J37/32577 ,  H05H1/46 ,  H05H2001/4622

摘要： A coaxial VHF power coupler includes conductive element inside a hollow cylindrical outer conductor of the power coupler and surrounding an axial section of a hollow cylindrical inner conductor of the power coupler. Respective plural motor drives contacting the hollow cylindrical outer conductor are connected to respective locations of the movable conductive element.

摘要翻译： 同轴VHF功率耦合器包括在功率耦合器的中空圆柱形外导体内的导电元件，并且包围功率耦合器的中空圆柱形内导体的轴向部分。 与中空圆柱形外部导体接触的多个电机驱动器连接到可移动导电元件的相应位置。

公开(公告)号：US20110097901A1

公开(公告)日：2011-04-28

申请号：US12821636

申请日：2010-06-23

申请人： SAMER BANNA ,  VALENTIN N. TODOROW ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  ZHIGANG CHEN ,  ANKUR AGARWAL ,  ANNIRUDDHA PAL ,  TSE-CHIANG WANG ,  SHAHID RAUF

发明人： SAMER BANNA ,  VALENTIN N. TODOROW ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  ZHIGANG CHEN ,  ANKUR AGARWAL ,  ANNIRUDDHA PAL ,  TSE-CHIANG WANG ,  SHAHID RAUF

IPC分类号： H01L21/465 ,  H01L21/46

CPC分类号： H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

摘要： Embodiments of dual mode inductively coupled plasma reactors and methods of use of same are provided herein. In some embodiments, a dual mode inductively coupled plasma processing system may include a process chamber having a dielectric lid and a plasma source assembly disposed above the dielectric lid. The plasma source assembly includes a plurality of coils configured to inductively couple RF energy into the process chamber to form and maintain a plasma therein, a phase controller for adjusting the relative phase of the RF current applied to each coil in the plurality of coils, and an RF generator coupled to the phase controller and the plurality of coils.

摘要翻译： 本文提供了双模电感耦合等离子体反应器的实施例及其使用方法。 在一些实施例中，双模感应耦合等离子体处理系统可以包括具有电介质盖和设置在电介质盖上方的等离子体源组件的处理室。 等离子体源组件包括多个线圈，其被配置为将RF能量感应耦合到处理室中以在其中形成和维持等离子体;相位控制器，用于调节施加到多个线圈中的每个线圈的RF电流的相对相位;以及 耦合到所述相位控制器和所述多个线圈的RF发生器。

公开(公告)号：US20100101729A1

公开(公告)日：2010-04-29

申请号：US12259981

申请日：2008-10-28

申请人： JONG MUN KIM ,  Xiaoye Zhao ,  Jason Andrew Kenney ,  Shahid Rauf

发明人： JONG MUN KIM ,  Xiaoye Zhao ,  Jason Andrew Kenney ,  Shahid Rauf

IPC分类号： H01L21/3065

CPC分类号： H01J37/32642 ,  H01J37/32623

摘要： Process kits for use in a semiconductor process chambers have been provided herein. In some embodiments, a process kit for a semiconductor process chamber includes a body configured to rest about a periphery of a substrate support and having sidewalls defining an opening corresponding to a central region of the substrate support. A lip extends from the sidewalls of the body into the opening, wherein a portion of an upper surface of the lip is configured to be disposed beneath a substrate during processing. A first distance measured between opposing sidewalls of the body is greater than a width across the upper surface of a substrate to be disposed within the opening by at least about 7.87 mm.

摘要翻译： 本文提供了用于半导体处理室的工艺组件。 在一些实施例中，用于半导体处理室的处理套件包括构造成围绕衬底支撑件的周边搁置并具有限定对应于衬底支撑件的中心区域的开口的侧壁的主体。 唇缘从主体的侧壁延伸到开口中，其中唇缘的上表面的一部分构造成在处理期间设置在基底下方。 在本体的相对侧壁之间测量的第一距离大于跨越衬底的上表面的宽度，以将其布置在开口内至少约7.87mm。

公开(公告)号：US20090321019A1

公开(公告)日：2009-12-31

申请号：US12146189

申请日：2008-06-25

申请人： Zhigang Chen ,  Shahid Rauf ,  Kartik Ramaswamy

发明人： Zhigang Chen ,  Shahid Rauf ,  Kartik Ramaswamy

IPC分类号： C23F1/08

CPC分类号： H01J37/32706 ,  H01J37/32091

摘要： Embodiments of the invention provide an apparatus which provide good RF uniformity within a processing chamber. In one embodiment, an apparatus includes a substrate support assembly, a terminal, and a dielectric insulator. The substrate support assembly has a center passage formed along a center axis. An RF transmission line is provided. The RF transmission line has a substantially vertical portion and a substantially horizontal portion, wherein the terminal is coupled to the substantially horizontal portion of the RF transmission line. The dielectric insulator circumscribes the substantially horizontal portion of the RF transmission line. The dielectric insulator has a first opening through which the terminal passes.

摘要翻译： 本发明的实施例提供一种在处理室内提供良好RF均匀性的装置。 在一个实施例中，装置包括基板支撑组件，端子和电介质绝缘体。 基板支撑组件具有沿中心轴线形成的中心通道。 提供RF传输线。 RF传输线具有基本上垂直的部分和基本上水平的部分，其中端子耦合到RF传输线的基本水平的部分。 电介质绝缘体围绕RF传输线的大致水平部分。 电介质绝缘体具有端子通过的第一开口。