公开(公告)号：US20230008834A1

公开(公告)日：2023-01-12

申请号：US17863232

申请日：2022-07-12

申请人： KAUSTAV BANERJEE ,  RAVI IYENGAR ,  NALIN RUPESINGHE ,  SATISH SUNDAR

发明人： KAUSTAV BANERJEE ,  RAVI IYENGAR ,  NALIN RUPESINGHE ,  SATISH SUNDAR

IPC分类号： C23C16/46 ,  H01L21/324 ,  C23C16/26

摘要： In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diffusion material on the wafer. A heatable bottom substrate disk includes a first heating mechanism. The heatable bottom substrate disk is fixed and heatable to a specified temperature. The wafer is placed on the heatable bottom substrate disk. A heatable top substrate disk comprising a second heating mechanism. The heatable top substrate disk is configured to move up and down along an x axis and an x prime axis to apply a mechanical pressure to the wafer on the heatable bottom substrate disk. While the heatable top substrate disk applies the mechanical pressure a chamber pressure is maintained at a specified low value. The first heating mechanism and the second heating mechanism can be independently tuned to any value in the working range.

公开(公告)号：US08224607B2

公开(公告)日：2012-07-17

申请号：US12198076

申请日：2008-08-25

申请人： Vijay Sakhare ,  Sekar Krishnasamy ,  Mordechai Leska ,  Donald Foldenauer ,  Rinat Shimshi ,  Marvin L. Freeman ,  Jeffery Hudgens ,  Satish Sundar

发明人： Vijay Sakhare ,  Sekar Krishnasamy ,  Mordechai Leska ,  Donald Foldenauer ,  Rinat Shimshi ,  Marvin L. Freeman ,  Jeffery Hudgens ,  Satish Sundar

IPC分类号： G01C17/38

CPC分类号： H01L21/681 ,  B25J9/1692 ,  G01B11/03 ,  G01B21/042 ,  G05B2219/37278 ,  G05B2219/37608 ,  G05B2219/39047 ,  G05B2219/39056 ,  H01L21/67742 ,  H01L21/67748

摘要： Described herein is a method and apparatus for performing calibrations on robotic components. In one embodiment, a method for performing robotic calibrations includes moving the calibrating device across a target (e.g., a wafer chuck). Next, the method includes measuring distances between light spots from the sensors and a perimeter of the target using the sensors located on the calibrating device. Next, the method includes determining a displacement of the calibrating device relative to a center of the target. Then, the method includes determining a rotation angle of the calibrating device relative to a system of coordinates of the target. Next, the method includes calibrating a robot position of the robot based on the displacement and rotation angle of the calibrating device with respect to the target.

摘要翻译： 这里描述了一种用于对机器人部件执行校准的方法和装置。 在一个实施例中，用于执行机器人校准的方法包括使校准装置跨越目标（例如，晶片卡盘）移动。 接下来，该方法包括使用位于校准装置上的传感器来测量来自传感器的光点和目标周边之间的距离。 接下来，该方法包括确定校准装置相对于目标的中心的位移。 然后，该方法包括确定校准装置相对于目标坐标系的旋转角度。 接下来，该方法包括基于校准装置相对于目标的位移和旋转角度来校准机器人的机器人位置。

公开(公告)号：US08197443B2

公开(公告)日：2012-06-12

申请号：US11706801

申请日：2007-02-14

申请人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

发明人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

IPC分类号： A61M1/00

CPC分类号： A61B17/3401 ,  A61B2090/065 ,  A61M5/1452

摘要： A detection apparatus for, and a method of, detecting the location of the tip of a tubular element, in particular a needle, within a region, in particular one of the epidural space and the peritoneal cavity.

公开(公告)号：US08147448B2

公开(公告)日：2012-04-03

申请号：US12678426

申请日：2008-09-17

申请人： Satish Sundar ,  Swaminathan Balakrishnan ,  Ivan Melnyk

发明人： Satish Sundar ,  Swaminathan Balakrishnan ,  Ivan Melnyk

IPC分类号： A61M5/168 ,  A61M5/145

CPC分类号： A61M5/16813 ,  A61M5/141 ,  A61M5/1411 ,  A61M5/1454 ,  A61M5/1456 ,  A61M5/14586 ,  A61M5/1684 ,  A61M5/16881 ,  A61M5/1689 ,  A61M5/172 ,  A61M2205/3306 ,  A61M2205/3317 ,  A61M2205/3389 ,  A61M2205/3592 ,  G06F19/00 ,  Y10S128/12 ,  Y10S128/13

摘要： A system architecture for closed loop control of infusion devices is described. The architecture provides means to control the flow from an infusion device as well as in some embodiments the pressure of the delivery. A variety of infusion systems are described that use the closed loop control architecture. In some embodiments the closed loop control may be adapted to current commonly used infusion means such as a gravity feed intravenous system. Other embodiments describe infusion pump system that use biasing or drive mechanisms of springs, elastomers, rotary and linear motors.

摘要翻译： 描述了用于输液装置的闭环控制的系统架构。 该结构提供了控制来自输注装置的流动以及在一些实施例中输送压力的手段。 描述了使用闭环控制架构的各种输注系统。 在一些实施例中，闭环控制可适用于当前常用的输注装置，例如重力给料静脉内系统。 其他实施例描述了使用弹簧，弹性体，旋转和线性电动机的偏置或驱动机构的输注泵系统。

公开(公告)号：US08137312B2

公开(公告)日：2012-03-20

申请号：US10543754

申请日：2004-01-28

申请人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

发明人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

IPC分类号： A61M1/00

CPC分类号： A61B17/3401 ,  A61B2090/065 ,  A61M5/1452

摘要： A detection apparatus for, and a method of, detecting the location of the tip of a tubular element, in particular a needle, within a region, in particular one of the epidural space and the peritoneal cavity.

摘要翻译： 一种用于检测管状元件尖端，特别是针的位置的检测装置，其特征在于在区域内，特别是硬膜外腔和腹膜腔中的一个。

公开(公告)号：US07813832B2

公开(公告)日：2010-10-12

申请号：US11923516

申请日：2007-10-24

申请人： Satish Sundar

发明人： Satish Sundar

IPC分类号： G06F7/00 ,  B65G49/07

CPC分类号： H01L21/68707 ,  H01L21/681 ,  Y10S414/136

摘要： A method and apparatus for positioning a substrate in a substrate processing chamber. The method includes placing the substrate on a substrate transfer blade, moving the substrate transfer blade to a first position located in a transfer chamber, and capturing at least one image that includes at least a portion of the substrate transfer blade and at least a portion of the substrate. The method also includes processing the image to determine a position of a predetermined portion of the substrate transfer blade and a position of predetermined portion of the substrate. The method further includes determining an offset between the position of the predetermined portion of the substrate transfer blade and the position of the predetermined portion of the substrate, and moving the substrate transfer blade to a second position located in the substrate processing chamber, wherein the second position is adjusted to account for the offset.

摘要翻译： 一种用于将衬底定位在衬底处理室中的方法和装置。 该方法包括将衬底放置在衬底转移刀片上，将衬底转移刀片移动到位于转移腔室中的第一位置，以及捕获包括至少一部分衬底转移刀片的至少一个图像，以及至少一部分 底物。 该方法还包括处理图像以确定衬底转移刀片的预定部分的位置和衬底的预定部分的位置。 该方法还包括确定衬底转移刀片的预定部分的位置与衬底的预定部分的位置之间的偏移，以及将衬底转移刀片移动到位于衬底处理室中的第二位置，其中第二 位置被调整以考虑偏移量。

公开(公告)号：US20100178139A1

公开(公告)日：2010-07-15

申请号：US12684733

申请日：2010-01-08

申请人： Satish Sundar ,  Jeffrey C. Hudgens ,  Prudhvi R. Chintalapati ,  William Nixon Taylor, JR. ,  William P. Laceky ,  Jeffrey A. Brodine ,  Dean C. Hruzek ,  Mario Dave Silvetti

发明人： Satish Sundar ,  Jeffrey C. Hudgens ,  Prudhvi R. Chintalapati ,  William Nixon Taylor, JR. ,  William P. Laceky ,  Jeffrey A. Brodine ,  Dean C. Hruzek ,  Mario Dave Silvetti

IPC分类号： H01L21/68 ,  H01L21/677 ,  H01L21/683

CPC分类号： H01L21/6833 ,  H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/68707 ,  Y10S414/141 ,  Y10S901/30 ,  Y10S901/40

摘要： Systems, apparatus and methods for transporting substrates between system components of an electronic device manufacturing system are provided. The systems and apparatus include an electrostatic end effector having a base, an electrode pair on the base, and spacer members for spacing the substrate from the electrode pairs to provide a gap between the electrode pair and the substrate. Methods of the invention as well as numerous other aspects are provided.

摘要翻译： 提供了用于在电子设备制造系统的系统部件之间传送基板的系统，设备和方法。 该系统和装置包括具有基座的静电末端执行器，基座上的电极对和用于将基板与电极对间隔开的隔离构件，以在电极对和基板之间提供间隙。 提供了本发明的方法以及许多其它方面。

公开(公告)号：US20080077271A1

公开(公告)日：2008-03-27

申请号：US11923516

申请日：2007-10-24

申请人： Satish Sundar

发明人： Satish Sundar

IPC分类号： G06F19/00

CPC分类号： H01L21/68707 ,  H01L21/681 ,  Y10S414/136

摘要： A method and apparatus for positioning a substrate in a substrate processing chamber. The method includes placing the substrate on a substrate transfer blade, moving the substrate transfer blade to a first position located in a transfer chamber, and capturing at least one image that includes at least a portion of the substrate transfer blade and at least a portion of the substrate. The method also includes processing the image to determine a position of a predetermined portion of the substrate transfer blade and a position of predetermined portion of the substrate. The method further includes determining an offset between the position of the predetermined portion of the substrate transfer blade and the position of the predetermined portion of the substrate, and moving the substrate transfer blade to a second position located in the substrate processing chamber, wherein the second position is adjusted to account for the offset.

摘要翻译： 一种用于将衬底定位在衬底处理室中的方法和装置。 该方法包括将衬底放置在衬底转移刀片上，将衬底转移刀片移动到位于转移腔室中的第一位置，以及捕获包括至少一部分衬底转移刀片的至少一个图像，以及至少一部分 底物。 该方法还包括处理图像以确定衬底转移刀片的预定部分的位置和衬底的预定部分的位置。 该方法还包括确定衬底转移刀片的预定部分的位置与衬底的预定部分的位置之间的偏移，以及将衬底转移刀片移动到位于衬底处理室中的第二位置，其中第二 位置被调整以考虑偏移量。

公开(公告)号：US20070213674A1

公开(公告)日：2007-09-13

申请号：US11706801

申请日：2007-02-14

申请人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

发明人： Satish Sundar ,  Swaminathan Balakrishnan ,  Albert Hartman

IPC分类号： A61M5/00

CPC分类号： A61B17/3401 ,  A61B2090/065 ,  A61M5/1452

摘要： A detection apparatus for, and a method of, detecting the location of the tip of a tubular element, in particular a needle, within a region, in particular one of the epidural space and the peritoneal cavity.

公开(公告)号：US20070142766A1

公开(公告)日：2007-06-21

申请号：US10543754

申请日：2004-01-28

申请人： Satish Sundar ,  Bruno Strul

发明人： Satish Sundar ,  Bruno Strul

IPC分类号： A61M31/00

CPC分类号： A61B17/3401 ,  A61B2090/065 ,  A61M5/1452

摘要： A detection apparatus for, and a method of, detecting the location of the tip of a tubular element, in particular a needle, within a region, in particular one of the epidural space and the peritoneal cavity.

摘要翻译： 一种用于检测管状元件尖端，特别是针的位置的检测装置，其特征在于在区域内，特别是硬膜外腔和腹膜腔中的一个。