LATERAL SEMICONDUCTOR DEVICE
    2.
    发明申请
    LATERAL SEMICONDUCTOR DEVICE 有权
    横向半导体器件

    公开(公告)号:US20140048911A1

    公开(公告)日:2014-02-20

    申请号:US14113419

    申请日:2012-05-10

    IPC分类号: H01L29/06

    摘要: A lateral semiconductor device includes a semiconductor layer, an insulating layer, and a resistive field plate. The semiconductor layer includes a first semiconductor region and a second semiconductor region at a surface portion, and the second semiconductor region makes a circuit around the first semiconductor region. The insulating layer is formed on a surface of the semiconductor layer and is disposed between the first and second semiconductor regions. The resistive field plate is formed on a surface of the insulating layer. Between the first and second semiconductor regions, a first section and a second section are adjacent to each other along a circumferential direction around the first semiconductor region. The resistive field plate includes first and second resistive field plate sections respectively formed in the first and second sections, and the first and second resistive field plate sections are separated from each other.

    摘要翻译: 横向半导体器件包括半导体层,绝缘层和电阻场板。 半导体层包括在表面部分处的第一半导体区域和第二半导体区域,并且第二半导体区域在第一半导体区域周围形成电路。 绝缘层形成在半导体层的表面上并且设置在第一和第二半导体区之间。 电阻场板形成在绝缘层的表面上。 在第一和第二半导体区域之间,第一部分和第二部分沿着围绕第一半导体区域的圆周方向彼此相邻。 电阻场板包括分别形成在第一和第二部分中的第一和第二电阻场板部分,并且第一和第二电阻场板部分彼此分离。

    Diode
    3.
    发明授权
    Diode 有权
    二极管

    公开(公告)号:US08476673B2

    公开(公告)日:2013-07-02

    申请号:US13296832

    申请日:2011-11-15

    摘要: A diode has a semiconductor layer and cathode and anode electrodes on a surface of the semiconductor layer. The semiconductor layer has cathode and anode regions respectively contacting the cathode and anode electrodes. The anode region has a first diffusion region having high surface concentration, a second diffusion region having intermediate surface concentration, and a third diffusion region having low surface concentration. The first diffusion region is covered with the second and third diffusion regions. The second diffusion region has a first side surface facing the cathode region, a second side surface opposite to the cathode region, and a bottom surface extending between the first and second side surfaces. The third diffusion region covers at least one of the first corner part connecting the first side surface with the bottom surface and the second corner part connecting the second side surface with the bottom surface.

    摘要翻译: 二极管在半导体层的表面上具有半导体层和阴极和阳极电极。 半导体层具有分别与阴极和阳极电极接触的阴极和阳极区域。 阳极区域具有表面浓度高的第一扩散区域,具有中间表面浓度的第二扩散区域和具有低表面浓度的第三扩散区域。 第一扩散区被第二和第三扩散区覆盖。 第二扩散区域具有面对阴极区域的第一侧表面,与阴极区域相对的第二侧表面和在第一和第二侧表面之间延伸的底表面。 第三扩散区域覆盖连接第一侧表面与底表面的第一角部和将第二侧表面与底表面连接的第二角部中的至少一个。

    Level shift circuit
    5.
    发明授权
    Level shift circuit 有权
    电平移位电路

    公开(公告)号:US07639060B2

    公开(公告)日:2009-12-29

    申请号:US12076521

    申请日:2008-03-19

    IPC分类号: H03L5/00

    摘要: A level shift circuit includes a first capacitor circuit including capacitors connected in series between a ground and a predetermined potential, a first trigger circuit coupled to the predetermined potential side of the first capacitor circuit, an input terminal coupled to the ground side of the first capacitor circuit, a second capacitor circuit including capacitors connected in series between the ground and the predetermined potential, a second trigger circuit coupled to the predetermined potential side of the second capacitor circuit, an inverter coupled between the input terminal and the ground potential side of the second capacitor circuit, and a SR latch circuit having a first input coupled to an output of the first trigger circuit and a second input coupled to an output of the second trigger circuit.

    摘要翻译: 电平移位电路包括:第一电容器电路,包括串联连接在接地和预定电位之间的电容器;耦合到第一电容器电路的预定电位侧的第一触发电路;耦合到第一电容器的接地侧的输入端子 电路,包括串联连接在接地和预定电位之间的电容器的第二电容器电路,耦合到第二电容器电路的预定电位侧的第二触发电路,耦合在第二电容器的输入端子和地电位侧之间的反相器 电容器电路和SR锁存电路,其具有耦合到第一触发电路的输出的第一输入和耦合到第二触发电路的输出的第二输入。

    Lateral semiconductor device
    8.
    发明授权
    Lateral semiconductor device 有权
    侧面半导体器件

    公开(公告)号:US09240445B2

    公开(公告)日:2016-01-19

    申请号:US14113419

    申请日:2012-05-10

    摘要: A lateral semiconductor device includes a semiconductor layer, an insulating layer, and a resistive field plate. The semiconductor layer includes a first semiconductor region and a second semiconductor region at a surface portion, and the second semiconductor region makes a circuit around the first semiconductor region. The insulating layer is formed on a surface of the semiconductor layer and is disposed between the first and second semiconductor regions. The resistive field plate is formed on a surface of the insulating layer. Between the first and second semiconductor regions, a first section and a second section are adjacent to each other along a circumferential direction around the first semiconductor region. The resistive field plate includes first and second resistive field plate sections respectively formed in the first and second sections, and the first and second resistive field plate sections are separated from each other.

    摘要翻译: 横向半导体器件包括半导体层,绝缘层和电阻场板。 半导体层包括在表面部分处的第一半导体区域和第二半导体区域,并且第二半导体区域在第一半导体区域周围形成电路。 绝缘层形成在半导体层的表面上并且设置在第一和第二半导体区之间。 电阻场板形成在绝缘层的表面上。 在第一和第二半导体区域之间,第一部分和第二部分沿着围绕第一半导体区域的圆周方向彼此相邻。 电阻场板包括分别形成在第一和第二部分中的第一和第二电阻场板部分,并且第一和第二电阻场板部分彼此分离。

    Method of etching metallic thin film on thin film resistor
    10.
    发明授权
    Method of etching metallic thin film on thin film resistor 有权
    在薄膜电阻上蚀刻金属薄膜的方法

    公开(公告)号:US07223668B2

    公开(公告)日:2007-05-29

    申请号:US10944665

    申请日:2004-09-17

    IPC分类号: H01L21/467

    CPC分类号: H01L28/24 H01L21/32139

    摘要: An Al film is formed on a barrier metal covering a thin film resistor to have a first opening. A photo-resist is formed on the Al film and in the opening, and is patterned to have a second opening having an opening area smaller than that of the first opening and open in the first opening to expose the barrier metal therefrom. Then, the barrier metal is etched through the second opening. Because the barrier metal is etched from an inner portion more than the opening end of the first opening, under-cut of the barrier metal is prevented.

    摘要翻译: 在覆盖薄膜电阻器的阻挡金属上形成具有第一开口的Al膜。 在Al膜和开口中形成光致抗蚀剂,并且被图案化以具有开口面积小于第一开口的开口面积并在第一开口中开口的第二开口,以暴露出阻挡金属。 然后,通过第二开口蚀刻阻挡金属。 由于阻挡金属从第一开口的开口端的内部蚀刻,因此防止了阻挡金属的切割。