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公开(公告)号：US08222614B2
公开(公告)日：2012-07-17
申请号：US12992082
申请日：2008-05-12
申请人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
发明人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
IPC分类号： H01J37/20
摘要： The apparatus has a rotating body 11 in an irradiation processing chamber 10. Outside the rotating body 11, plural retaining mechanisms 2 are installed at regular interval to retain open-mouthed containers. Above the conveying path, an electron beam generating means 40 is arranged. The rotating body 11 has a rotary shaft 12 that penetrates into the electron beam generating means 40. On the rotary shaft 12, a grid plate 45 of an electron beam source 41 of the electron beam generating means 40 is rotatively installed. On the grid plate 45, plural emission holes 46 are provided at the same interval as that of the retaining mechanisms 2 on the rotating body 11. In an predetermined irradiation area, the emission holes 46 and a irradiation windows 43 on the irradiation processing chamber 10 and the retaining mechanism 2 for holding the container are aligned approximately on the same axes.
摘要翻译： 该装置在照射处理室10中具有旋转体11.在旋转体11的外侧，以规定的间隔设置多个保持机构2，以保持开口容器。 在输送路径上方布置有电子束产生装置40。 旋转体11具有穿过电子束产生装置40的旋转轴12.在旋转轴12上，电子束产生装置40的电子束源41的格栅45被旋转地安装。 在栅格板45上，以与旋转体11上的保持机构2相同的间隔设置有多个发射孔46.在预定照射区域中，发射孔46和照射窗口43在照射处理室10 并且用于保持容器的保持机构2大致对齐在同一轴线上。
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公开(公告)号：US4299855A
公开(公告)日：1981-11-10
申请号：US125836
申请日：1980-02-29
申请人： Takanori Wada , Hitoshi Sano , Shigekatsu Sato , Yukihiro Saiki , Keisuke Shimizu , Masanori Hirata , Junichi Naka , Takayoshi Takahashi , Toshiaki Ishii , Toshikazu Kamiki
发明人： Takanori Wada , Hitoshi Sano , Shigekatsu Sato , Yukihiro Saiki , Keisuke Shimizu , Masanori Hirata , Junichi Naka , Takayoshi Takahashi , Toshiaki Ishii , Toshikazu Kamiki
IPC分类号： A23C19/09 , A23C19/06 , A23C19/082 , A23C19/084 , A23C19/00
CPC分类号： A23C19/084 , A23C19/06
摘要： A method of producing a cheese product in snack-sized form comprising the steps of cooling a molten cheese to a temperature of about 45.degree. C. to 35.degree. C., heating a surface area extending in the radial direction from the surface of the cheese to a thickness of 1/8 to 1/6 of the cheese diameter of the cooled cheese to a temperature of about 52.degree. C. to 39.degree. C., cutting the heated cheese into snack sized pieces by rolling within a mold die for rounding the pieces of cheese, and forming each of the snack sized pieces into a rounded shape without corners, thereby providing a snack sized cheese product formed into a desirable rounded shape such as spherical, ellipsoidal, and barrel shape and having good appearance without creases and cracks on the surface thereof as well as a homogeneous texture.
摘要翻译： 一种以小吃形式生产干酪产品的方法，包括以下步骤：将熔融干酪冷却至约45℃至35℃的温度，加热从径向方向延伸的表面区域， 至冷冻干酪的干酪直径的1/8至1/6的厚度至约52℃至39℃的温度，通过在模具内滚动将加热的干酪切成小吃尺寸的切片，以进行四舍五入 奶酪片，并将每个小吃尺寸片形成无圆角的圆形，从而提供形成为期望的圆形，如球形，椭圆形和筒状的小吃尺寸的芝士产品，并且具有良好的外观而没有褶皱和裂缝 在其表面上以及均匀的质地。
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公开(公告)号：US20110084221A1
公开(公告)日：2011-04-14
申请号：US12992082
申请日：2008-05-12
申请人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
发明人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
IPC分类号： B65B55/08
摘要： The apparatus has a rotating body 11 in an irradiation processing chamber 10. Outside the rotating body 11, plural retaining mechanisms 2 are installed at regular interval to retain open-mouthed containers. Above the conveying path, an electron beam generating means 40 is arranged. The rotating body 11 has a rotary shaft 12 that penetrates into the electron beam generating means 40. On the rotary shaft 12, a grid plate 45 of an electron beam source 41 of the electron beam generating means 40 is rotatively installed. On the grid plate 45, plural emission holes 46 are provided at the same interval as that of the retaining mechanisms 2 on the rotating body 11. In an predetermined irradiation area, the emission holes 46 and a irradiation windows 43 on the irradiation processing chamber 10 and the retaining mechanism 2 for holding the container are aligned approximately on the same axes.
摘要翻译： 该装置在照射处理室10中具有旋转体11.在旋转体11的外侧，以规定的间隔设置多个保持机构2，以保持开口容器。 在输送路径上方布置有电子束产生装置40。 旋转体11具有穿过电子束产生装置40的旋转轴12.在旋转轴12上，电子束产生装置40的电子束源41的格栅45被旋转地安装。 在栅格板45上，以与旋转体11上的保持机构2相同的间隔设置有多个发射孔46.在预定照射区域中，发射孔46和照射窗口43在照射处理室10 并且用于保持容器的保持机构2大致对齐在同一轴线上。
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公开(公告)号：US20110062347A1
公开(公告)日：2011-03-17
申请号：US12992084
申请日：2008-05-12
申请人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
发明人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
摘要： At a conveying path 10 for continuously carrying a sheet material 1, an electron beam irradiation means 20 is arranged in opposition to at least one surface of the sheet material 1, and at least one surface of the sheet material 1 is sterilized using such an electron beam. The conveying path 10 takes shape of a hollow box surrounding the sheet material, and has an electron beam irradiation area 11 at a part of this area, while keeping a reduced-pressure state ranging from 10 to 80,000 Pa using a pressure reduction means 16. Further, the electron beam irradiation area 11 where the electron beam irradiation means 20 is arranged at least one sub area 12 at each of adjacent hollow box-shaped conveying path 10 at carry-in side and carry-out side of the sheet material, providing the pressure reduction means 16 for depressurizing the sub area 12.
摘要翻译： 在用于连续输送片材1的传送路径10上，电子束照射装置20与片材1的至少一个表面相对地布置，并且片材1的至少一个表面使用这种电子 光束。 传送路径10形成围绕片材的中空盒，并且在该区域的一部分具有电子束照射区域11，同时使用减压装置16保持10〜80,000Pa的减压状态。 此外，电子束照射装置20在片材的输入侧和输出侧的相邻的中空盒状输送路径10的每一个处配置有至少一个子区域12的电子束照射区域11， 用于减压副区域12的减压装置16。
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5.发明授权公开(公告)号：US07767987B2
公开(公告)日：2010-08-03
申请号：US12065681
申请日：2006-09-21
申请人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
发明人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
CPC分类号： A23L3/26 , A61L2/087 , A61L2202/122 , A61L2202/21 , A61L2202/23 , B65B55/027 , B65B55/08 , G21K5/00
摘要： There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
摘要翻译： 提供了即使电子束具有低能量也能够均匀地向物体施加电子束的电子束施加方法和电子束施加装置。 为此，电子束（EB）被施加到通过组合在电子束施加区域中产生的多个磁场而形成的磁屏障（MF）内的饮料容器（30）（物体）。
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6.发明申请公开(公告)号：US20090134338A1
公开(公告)日：2009-05-28
申请号：US12065681
申请日：2006-09-21
申请人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
发明人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
CPC分类号： A23L3/26 , A61L2/087 , A61L2202/122 , A61L2202/21 , A61L2202/23 , B65B55/027 , B65B55/08 , G21K5/00
摘要： There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
摘要翻译： 提供了即使电子束具有低能量也能够均匀地向物体施加电子束的电子束施加方法和电子束施加装置。 为此，电子束（EB）被施加到通过组合在电子束施加区域中产生的多个磁场而形成的磁屏障（MF）内的饮料容器（30）（物体）。
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7.发明授权
公开(公告)号：US5774228A
公开(公告)日：1998-06-30
申请号：US883317
申请日：1997-06-26
申请人： Yoshitaka Takezawa , Yuzo Ito , Shigekatsu Sato
发明人： Yoshitaka Takezawa , Yuzo Ito , Shigekatsu Sato
CPC分类号： G01N21/31 , G01R31/1218
摘要： In order to diagnose non-distructively the deterioration degree of such as insulation oil and insulation paper during operation of an oil filled electrical machine and apparatus without stopping the operation thereof, a deterioration degree disgnosis method for the oil filled electrical machine and apparatus makes use of optical fibers (6, 7) and oil immersed probe (5) and diagnoses the deterioration degree of an insulation paper non-distructively based on reflection absorbance difference between those for any two wavelengths of the insulation paper.
摘要翻译： 为了在不停止其运行的情况下非充分地诊断填充油的电机和设备的操作期间的绝缘油和绝缘纸的劣化程度，填充油的电机和设备的劣化程度的判断方法使用 光纤（6,7）和油浸式探针（5），并且基于绝缘纸的任意两个波长的反射吸光度差异，非绝缘地诊断绝缘纸的劣化程度。
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公开(公告)号：US08344332B2
公开(公告)日：2013-01-01
申请号：US12992084
申请日：2008-05-12
申请人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
发明人： Shiro Eguchi , Tomoyuki Hikosaka , Satoru Gohzaki , Takayuki Suzuki , Shigekatsu Sato , Isao Hashimoto
IPC分类号： B65B55/08
摘要： At a conveying path 10 for continuously carrying a sheet material 1, an electron beam irradiation means 20 is arranged in opposition to at least one surface of the sheet material 1, and at least one surface of the sheet material 1 is sterilized using such an electron beam. The conveying path 10 takes shape of a hollow box surrounding the sheet material, and has an electron beam irradiation area 11 at a part of this area, while keeping a reduced-pressure state ranging from 10 to 80,000 Pa using a pressure reduction means 16. Further, the electron beam irradiation area 11 where the electron beam irradiation means 20 is arranged at least one sub area 12 at each of adjacent hollow box-shaped conveying path 10 at carry-in side and carry-out side of the sheet material, providing the pressure reduction means 16 for depressurizing the sub area 12.
摘要翻译： 在用于连续输送片材1的传送路径10上，电子束照射装置20与片材1的至少一个表面相对地布置，并且片材1的至少一个表面使用这种电子 光束。 传送路径10形成围绕片材的中空盒，并且在该区域的一部分具有电子束照射区域11，同时使用减压装置16保持10〜80,000Pa的减压状态。 此外，电子束照射装置20在片材的输入侧和输出侧的相邻的中空盒状输送路径10的每一个处配置有至少一个子区域12的电子束照射区域11， 用于减压副区域12的减压装置16。
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公开(公告)号：US08227776B2
公开(公告)日：2012-07-24
申请号：US12992036
申请日：2009-05-01
申请人： Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
发明人： Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
IPC分类号： G21K5/04
摘要： The electron beam irradiating apparatus with the monitoring device has an electron beam irradiating means for irradiating materials in an irradiation chamber. The monitoring device has a photographing means for imaging a lights emitted by irradiating an electron beam to the materials; a storage means that stores state of electron beam irradiation in advance; and a calculating means that processes an image, which is captured by the photographing means, to decide a state of electron beam irradiation. The storage means has stored at least three state of electron beam irradiation and also has stored image luminance associated with those states of electron beam irradiation. The calculating means loads the image, which is captured by the photographing means, to compare the loaded image with the image luminance stored in the storage means, thereby deciding a state of electron beam irradiation.
摘要翻译： 具有监视装置的电子束照射装置具有用于在照射室中照射材料的电子束照射装置。 监视装置具有拍摄装置，用于对通过向材料照射电子束而发射的光进行成像; 预先存储电子束照射状态的存储装置; 以及处理由拍摄装置拍摄的图像来决定电子束照射的状态的计算装置。 存储装置已经存储了至少三种电子束照射状态，并且还存储与这些电子束照射状态相关联的图像亮度。 计算装置加载由拍摄装置拍摄的图像，以将加载的图像与存储在存储装置中的图像亮度进行比较，从而确定电子束照射的状态。
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公开(公告)号：US20110062351A1
公开(公告)日：2011-03-17
申请号：US12992036
申请日：2009-05-01
申请人： Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
发明人： Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
IPC分类号： G21K5/04
摘要： The electron beam irradiating apparatus with the monitoring device has an electron beam irradiating means for irradiating materials in an irradiation chamber. The monitoring device has a photographing means for imaging a lights emitted by irradiating an electron beam to the materials; a storage means that stores state of electron beam irradiation in advance; and a calculating means that processes an image, which is captured by the photographing means, to decide a state of electron beam irradiation. The storage means has stored at least three state of electron beam irradiation and also has stored image luminance associated with those states of electron beam irradiation. The calculating means loads the image, which is captured by the photographing means, to compare the loaded image with the image luminance stored in the storage means, thereby deciding a state of electron beam irradiation.
摘要翻译： 具有监视装置的电子束照射装置具有用于在照射室中照射材料的电子束照射装置。 监视装置具有拍摄装置，用于对通过向材料照射电子束而发射的光进行成像; 预先存储电子束照射状态的存储装置; 以及处理由拍摄装置拍摄的图像来决定电子束照射的状态的计算装置。 存储装置已经存储了至少三种电子束照射状态，并且还存储与这些电子束照射状态相关联的图像亮度。 计算装置加载由拍摄装置拍摄的图像，以将加载的图像与存储在存储装置中的图像亮度进行比较，从而确定电子束照射的状态。
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