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    Exposure device, exposure method, and semiconductor device manufacturing method
    1.
    发明授权
    Exposure device, exposure method, and semiconductor device manufacturing method 失效
    曝光装置，曝光方法和半导体器件制造方法

    公开(公告)号：US07456031B2

    公开(公告)日：2008-11-25

    申请号：US10534917

    申请日：2003-11-13

    申请人： Shinji Omori ,  Shigeru Moriya ,  Shinichiro Nohdo

    发明人： Shinji Omori ,  Shigeru Moriya ,  Shinichiro Nohdo

    IPC分类号： H01L31/26 ,  H01L21/66

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/20 ,  H01J37/304 ,  H01J37/3174

    摘要： To provide an exposure apparatus and an exposure method able to correct an image-placement error during an exposure which is unable to decrease only by correcting electron beam description data of a mask pattern, and a semiconductor device manufacturing method used the same, wherein an image placement R2 of a mask is measured at an inversion posture against an exposure posture (ST7), the measured image placement R2 is corrected with considering a pattern displacement caused by gravity at the exposure posture and a first correction data Δ1 is prepared based on a difference of the corrected image placement and a designed data (ST10), and an exposure is performed by deflecting charged particle beam to correct a position of a pattern to be exposed to a subject based on the first correction data Δ1 (ST13).

    摘要翻译： 为了提供一种曝光装置和曝光方法，能够通过校正掩膜图案的电子束描述数据而不能减小曝光期间的图像放置误差，以及使用其的半导体器件制造方法，其中图像 以与曝光姿势相反的反转姿势（ST7）测量掩模的放置R 2，考虑由曝光姿势引起的重力引起的图案位移，并且准备第一校正数据Delta 1来校正测量图像布置R 2 基于校正图像放置的差异和设计数据（ST10），并且通过基于第一校正数据Delta 1来对带电粒子束进行偏转来校正要暴露于对象的图案的位置来执行曝光（ ST 13）。

    MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING METHOD, EXPOSURE PROCESS, AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE
    2.
    发明申请
    MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING METHOD, EXPOSURE PROCESS, AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE 审中-公开
    制造成员及其生产方法，掩模及其制造方法，曝光过程和半导体器件的制造方法

    公开(公告)号：US20070114450A1

    公开(公告)日：2007-05-24

    申请号：US11567912

    申请日：2006-12-07

    申请人： Kaoru Koike ,  Shigeru Moriya

    发明人： Kaoru Koike ,  Shigeru Moriya

    IPC分类号： G01N23/00

    CPC分类号： G03F1/20 ,  H01J2237/0435 ,  H01J2237/31791 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10S438/975 ,  H01L2924/00

    摘要： A mask blank has a plurality of pattern formation regions in which mask circuit patterns are to be formed, and a supporting region in which any mask circuit pattern is not to be formed. The supporting region is provided for holding the plurality of pattern formation regions while separating the plurality of pattern formation regions from each other. The supporting region has first and second alignment marks. Exposure of a mask made from the mask blank for forming mask circuit patterns thereon is performed on the basis of the first alignment marks, and exposure of a substrate for forming circuit patterns thereon is performed on the basis of the second alignment marks. With this configuration, a mask used for charged particle beam reduction-and-division transfer exposure can be highly accurately produced at a low cost, and exposure of a substrate can be highly accurately performed by using the mask.

    摘要翻译： 掩模坯料具有要形成掩模电路图案的多个图案形成区域和不形成任何掩模电路图案的支撑区域。 支撑区域用于在分离多个图案形成区域的同时保持多个图案形成区域。 支撑区域具有第一和第二对准标记。 基于第一对准标记进行由掩模毛坯制成的掩模的曝光，并且基于第二对准标记进行用于在其上形成电路图案的基板的曝光。 利用这种结构，可以以低成本高精度地制造用于带电粒子束减小和分割转印曝光的掩模，并且可以通过使用掩模高度准确地执行基板的曝光。

    Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask
    6.
    发明授权
    Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask 失效
    掩模图案校正方法，半导体器件制造方法，掩模制造方法和掩模

    公开(公告)号：US07109500B2

    公开(公告)日：2006-09-19

    申请号：US10509230

    申请日：2003-03-20

    申请人： Shinji Omori ,  Kaoru Koike ,  Shigeru Moriya ,  Isao Ashida

    发明人： Shinji Omori ,  Kaoru Koike ,  Shigeru Moriya ,  Isao Ashida

    IPC分类号： H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/20 ,  H01J2237/31794

    摘要： A mask pattern correction method capable of preventing a position of a pattern from deviating by deformation of a mask due to gravity, a mask production method, a mask, and a production method of a semiconductor device capable of forming a fine pattern with high accuracy are provided. A mask pattern correction method, a mask production method, a mask produced thereby and a production method of a semiconductor device using the mask include a step of creating first position data indicating positions of a plurality of marks when supporting a first thin film having the marks in a state where a first surface directs upward, a step of creating second position data indicating mark positions when supporting the first thin film in a state where a second surface directs upward, a step of obtaining a transfer function for converting the first position data to the second position data, and a step of correcting a mask pattern as a shape of exposure beam transmission portions formed on a second thin film by using an inverse function of the transfer function.

    摘要翻译： 能够通过重力防止图案的位置偏离掩模的位置偏移的掩模图案校正方法，能够以高精度形成精细图案的半导体器件的掩模制造方法，掩模和制造方法， 提供。 掩模图案校正方法，掩模制造方法，由此制备的掩模和使用掩模的半导体器件的制造方法包括：当支撑具有标记的第一薄膜时，创建指示多个标记的位置的第一位置数据的步骤 在第一面向上方的状态下，在第二面向上方的状态下支撑第一薄膜时，形成指示标记位置的第二位置数据的步骤，获得将第一位置数据变换为 第二位置数据，以及通过使用传递函数的反函数将掩模图案校正为形成在第二薄膜上的曝光光束透射部分的形状的步骤。

    Image reading apparatus having color correction according to tempeature change improved
    9.
    发明授权
    Image reading apparatus having color correction according to tempeature change improved 失效
    具有根据温度变化的颜色校正的图像读取装置改善

    公开(公告)号：US5495340A

    公开(公告)日：1996-02-27

    申请号：US019204

    申请日：1993-02-18

    申请人： Yoshikazu Naito ,  Shigeru Moriya ,  Takayoshi Hayashi

    发明人： Yoshikazu Naito ,  Shigeru Moriya ,  Takayoshi Hayashi

    IPC分类号： H04N1/04 ,  H04N1/46 ,  H04N1/60 ,  H04N9/64 ,  H04N1/21

    CPC分类号： H04N1/6033

    摘要： A chromatic color pattern and a monochromatic color pattern are read by an image sensor. A masking coefficient in a color masking portion or a gamma conversion characteristic of a gamma correction portion are selected in accordance with the ratio V1/V0 of a read value V1 of the chromatic color pattern and a read value V0 of the monochromatic color pattern. An output of an image data is corrected by masking processing with the selected masking coefficient and the like.

    摘要翻译： 彩色图案和单色图案由图像传感器读取。 根据彩色图案的读取值V1和单色图案的读取值V0的比值V1 / V0来选择色彩掩蔽部分中的蒙版系数或伽马校正部分的伽马转换特性。 通过所选择的掩蔽系数等的掩蔽处理来校正图像数据的输出。

    Image forming apparatus
    10.
    发明授权
    Image forming apparatus 失效
    图像形成装置

    公开(公告)号：US5311259A

    公开(公告)日：1994-05-10

    申请号：US79107

    申请日：1993-06-17

    申请人： Shigeru Moriya ,  Takashi Noda

    发明人： Shigeru Moriya ,  Takashi Noda

    IPC分类号： G03G15/00 ,  G06T3/40 ,  H04N1/23 ,  H04N1/387 ,  H04N1/393 ,  G03G15/04

    CPC分类号： G03G15/5095 ,  G06T3/40 ,  H04N1/2307 ,  H04N1/2323 ,  H04N1/3875 ,  H04N1/393 ,  H04N2201/0426

    摘要： An image forming apparatus divides an original image into multiple areas depending on the magnification of copy and produces enlarged copies of the divided areas on sheets of copy paper sequentially, thereby obtaining a enlarged copy of the original larger than the paper size. For each divided area, copy paper of a smallest possible size necessary to copy the entirety of the divided area is selected. The original can be divided optimally based on the original size, copy paper size and magnification, or can be divided by excluding a specified region from the original.

    摘要翻译： 图像形成装置根据复制的倍率将原始图像分割成多个区域，并且依次产生复印纸上的分割区域的放大副本，从而获得比纸张尺寸大的原稿的放大副本。 对于每个分割区域，选择复制整个分割区域所需的尽可能小的复印纸。 原稿可以根据原稿尺寸，复印纸张尺寸和放大倍数进行最佳分割，也可以从原稿中排除指定区域。