摘要:
A wafer process material is prepared which has a plurality of semiconductor formation regions of different planar sizes, each including a low dielectric constant film/wiring line stack structure component. A laser beam is applied onto a dicing street of the necessary semiconductor formation region and onto its straight extension in order to remove partial areas of the low dielectric constant film/wiring line stack structure components of the necessary semiconductor formation region and the unnecessary semiconductor formation region so that first groove and the second groove are formed. A protective film is formed in the second groove formed in the unnecessary semiconductor formation region and on the low dielectric constant film/wiring line stack structure component. An upper wiring line and a sealing film are formed on the protective film, and a semiconductor wafer is cut along the dicing street.
摘要:
A network electronic component comprises a network-electronic-component substrate, a thin-film passive element provided on the substrate, and a plurality of external connection electrodes provided on the substrate in connection with the thin-film passive element.
摘要:
A first semiconductor element is mounted on a base plate, and is in a sealed state by the periphery thereof being covered by an insulation member, and the upper surface thereof being covered by an upper insulation film. An upper wiring layer formed on the upper insulation film, and the lower wiring layer formed below the base plate via lower insulation films are connected by conductors. A second semiconductor element is mounted exposed, being connected to the lower wiring layer.
摘要:
A first semiconductor element is mounted on a base plate, and is in a sealed state by the periphery thereof being covered by an insulation member, and the upper surface thereof being covered by an upper insulation film. An upper wiring layer formed on the upper insulation film, and the lower wiring layer formed below the base plate via lower insulation films are connected by conductors. A second semiconductor element is mounted exposed, being connected to the lower wiring layer.
摘要:
A semiconductor device includes a semiconductor constructing body which has a semiconductor substrate, a plurality of external connection electrodes formed on the semiconductor substrate, and heat dissipation columnar electrodes. Upper interconnections are mounted on one side of the semiconductor constructing body and connected to the external connection electrodes of the semiconductor constructing body. A heat dissipation layer is mounted on one side of the semiconductor constructing body and made of the same material as that of the upper interconnections.
摘要:
Disclosed is a semiconductor structure including a semiconductor substrate including an electronic circuit which is provided in a predetermined region of the semiconductor substrate, a wiring provided on the semiconductor substrate in a region outside of the predetermined region, an external connection electrode provided on the wiring, a sealing resin which covers a side surface of the external connection electrode and a wall which intervenes between the electronic circuit and the sealing resin.
摘要:
A semiconductor device comprises a semiconductor chip which comprises mode-set terminals, and mode-set wiring lines respectively connected to the mode-set terminals, a sealing layer which covers the semiconductor chip and also covers a land of a first mode-set wiring line that is one of the mode-set wiring lines, the sealing layer including a mode-set via hole formed above a land of a second mode-set wiring line, the second mode-set wiring line being one of the mode-set wiring lines and being different from the first mode-set wiring line, a mode-set embedded conductor provided within the mode-set via hole to be connected to the second mode-set wiring line, and a mode-set conductive pattern which is connected to the mode-set embedded conductor and which is provided on the sealing layer above the land of the first mode-set wiring line.
摘要:
A semiconductor construct includes a semiconductor substrate and connection pads provided on the semiconductor substrate. Some of the connection pads are connected to a common wiring and at least one of the remaining of the connection pads are connected to a wiring. The construct also includes a first columnar electrode provided to be connected to the common wiring and a second columnar electrode provided to be connected to a connection pad portion of the wiring.
摘要:
In the manufacture of a semiconductor, in unnecessary semiconductor device formation areas 22b and 22c, a columnar electrode 14 made of copper is formed only in an area excluding an area corresponding to a dicing street 23 and both sides of the dicing street 23, and is not formed in the area corresponding to the dicing street 23 and both sides of the dicing street 23. As a result, the dicing blade is prevented from being clogged with copper. In this case, a plurality of layers of low-dielectric film and the same number of layers of wiring are formed on a semiconductor wafer such that they are alternately laminated, and the columnar electrode is formed on a connection pad portion of upper layer wiring formed on the low-dielectric film wiring laminated structure section with an insulating film therebetween.
摘要:
A wafer process material is prepared which has a plurality of semiconductor formation regions of different planar sizes, each including a low dielectric constant film/wiring line stack structure component. A laser beam is applied onto a dicing street of the necessary semiconductor formation region and onto its straight extension in order to remove partial areas of the low dielectric constant film/wiring line stack structure components of the necessary semiconductor formation region and the unnecessary semiconductor formation region so that first groove and the second groove are formed. A protective film is formed in the second groove formed in the unnecessary semiconductor formation region and on the low dielectric constant film/wiring line stack structure component. An upper wiring line and a sealing film are formed on the protective film, and a semiconductor wafer is cut along the dicing street.