公开(公告)号：US4072767A

公开(公告)日：1978-02-07

申请号：US693312

申请日：1976-06-07

申请人： Kyo Suda ,  Katsumi Takami ,  Akira Shintani ,  Shinobu Hase

发明人： Kyo Suda ,  Katsumi Takami ,  Akira Shintani ,  Shinobu Hase

IPC分类号： G01N15/14 ,  C23C16/52 ,  G01B11/08 ,  H01L21/205 ,  H01L21/31 ,  C23C13/04 ,  C01B33/12

CPC分类号： C23C16/52

摘要： In forming a film of a purposive substance on a substrate by a chemical vapor deposition (CVD), the size of the film-forming substance particles formed in a reactor is detected as an electrical signal and flow rates of respective gases introduced into the reactor are controlled in response to this electrical signal. According to this control method, the fogging phenomenon owing to formation of the film-forming substance in the gas flow can be effectively prevented.

摘要翻译： 在通过化学气相沉积（CVD）在基板上形成有目的物质的膜时，形成在反应器中的成膜​​物质颗粒的大小被检测为电信号，并且引入反应器的各种气体的流量为 根据该电信号进行控制。 根据这种控制方法，能够有效地防止由于气体流中的成膜物质的形成引起的起雾现象。

公开(公告)号：US4731855A

公开(公告)日：1988-03-15

申请号：US720730

申请日：1985-04-08

申请人： Kyo Suda ,  Shigeharu Kimura ,  Shinobu Hase ,  Chusuke Munakata ,  Kanji Kinameri ,  Yoshitoshi Ito ,  Hiroto Nagatomo ,  Yuzo Taniguchi ,  Mikihito Saito

发明人： Kyo Suda ,  Shigeharu Kimura ,  Shinobu Hase ,  Chusuke Munakata ,  Kanji Kinameri ,  Yoshitoshi Ito ,  Hiroto Nagatomo ,  Yuzo Taniguchi ,  Mikihito Saito

IPC分类号： G01N21/956 ,  H01L21/26 ,  G06K9/00

CPC分类号： G01N21/956 ,  H01L21/26

摘要： A pattern defect inspection apparatus detects presence or absence of a defect in a pattern formed on a semiconductor wafer by scanning the pattern normally to the surface thereof by a coherent light beam of a predetermined spot size, detecting reflected diffraction lights generated thereby and processing the detected lights. It comprises an abnormal direction signal detector including photo-detectors having wide light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from a normal pattern do not normally reach, a normal pattern detector including photo-detectors having large light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from the normal pattern reach, and a defect discriminator for determining if the abnormal direction signals are due to a true defect or not in accordance with the signals from the abnormal direction signal detector and the normal pattern detector.

摘要翻译： 图案缺陷检查装置通过用预定光斑尺寸的相干光束将图案通常扫描到其表面来检测在半导体晶片上形成的图案中的缺陷的存在或不存在，检测由此产生的反射衍射光并且处理检测到的 灯光 它包括异常方向信号检测器，其包括具有布置在多个空间区域中的宽光接收区域的光检测器，正常图案的反射衍射光通常不能正常到达，包括光检测器的正常图案检测器具有大的光接收面积 布置在从正常图案到达的反射衍射光的多个空间区域中，以及用于根据来自异常方向信号检测器的信号和用于确定异常方向信号是否由于真实缺陷而导致的缺陷鉴别器 正常模式检测器

公开(公告)号：US4767211A

公开(公告)日：1988-08-30

申请号：US088538

申请日：1987-08-20

申请人： Chusuke Munakata ,  Shinobu Hase ,  Shigeharu Kimura

发明人： Chusuke Munakata ,  Shinobu Hase ,  Shigeharu Kimura

IPC分类号： G01B11/00 ,  G01B11/24 ,  G01B11/30

CPC分类号： G01B11/24

摘要： An apparatus for and a method of measuring a boundary surface of a sample are disclosed in which a ratio of the light quantity of a part of reflected light from a sample which travels in the vicinity of the optical axis of the reflected light, to the light quantity of another part of the reflected light which is directed to a position deviating from the optical axis by a predetermined distance is used to accurately measure a boundary surface of a sample. Since the accuracy of measurement is increased by using the above ratio, light capable of passing through the sample can be used as incident light. Thus, a deep hole in the surface of the sample and a void such as an air bubble in a living being sample, which cannot be measured by the prior art, can be measured very accurately.

摘要翻译： 公开了一种测量样品的边界面的装置和方法，其中，来自在反射光的光轴附近行进的样品的反射光的一部分的光量与光 使用被引导到偏离光轴的位置预定距离的反射光的另一部分的量来准确地测量样品的边界面。 由于通过使用上述比例来提高测量精度，所以可以使用能够通过样品的光作为入射光。 因此，可以非常精确地测量样品表面中的深孔和活体样品中的诸如气泡之类的空隙，这是现有技术无法测量的。