公开(公告)号：US08568601B2

公开(公告)日：2013-10-29

申请号：US11947616

申请日：2007-11-29

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  H01L21/00

CPC分类号： G03B31/00

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。 图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。 该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。

公开(公告)号：US08503131B2

公开(公告)日：2013-08-06

申请号：US13339310

申请日：2011-12-28

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.

摘要翻译： 用于垂直磁数据记录的磁写头。 写入头包括形成在衬底上的衬底和磁性写入磁极，写入极具有后缘和第一和第二侧。 在磁性写入磁极的一部分上形成有磁性的缝合磁极，缝合的磁极具有限定二次闪光点的前部边缘。 第一和第二非磁性侧壁形成在写入极的第一和第二侧。 所述非磁性侧壁在靠近空气支承表面的第一区域中从所述基板至少延伸到所述写柱的后缘，并且其中所述第一和第二非磁性侧壁从所述基板延伸到所述基板之间的点 和后缘，允许缝合的磁极部分地延伸在写柱的侧面上。

公开(公告)号：US08252190B2

公开(公告)日：2012-08-28

申请号：US12343720

申请日：2008-12-24

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.

摘要翻译： 一种用于制造具有具有锥形后缘台阶的写极的磁写头的方法。 所产生的锥形后沿步骤通过防止磁极尖端的写极的磁饱和而使非常小的位尺寸的写入场最大化。 该方法包括沉积磁性写入磁极材料，然后在磁性写入磁极材料上沉积磁性材料。 RIE掩模和硬掩模沉积在磁性凸块材料上。 在RIE掩模和硬掩模上形成抗蚀剂掩模，并且执行反应离子蚀刻以将抗蚀剂掩模的图案转移到下面的硬掩模上。 然后执行离子铣削以形成具有锥形边缘的磁性阶梯层，其限定了写入极的锥形后缘阶梯结构。

公开(公告)号：US08085497B2

公开(公告)日：2011-12-27

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20100163523A1

公开(公告)日：2010-07-01

申请号：US12707652

申请日：2010-02-17

申请人： Daniel Wayne Bedell ,  David Patrick Druist ,  Edward Hin Pong Lee ,  Jennifer Ai-Ming Loo ,  Vladimir Nikitin ,  Sue Siyang Zhang

发明人： Daniel Wayne Bedell ,  David Patrick Druist ,  Edward Hin Pong Lee ,  Jennifer Ai-Ming Loo ,  Vladimir Nikitin ,  Sue Siyang Zhang

IPC分类号： G11B5/127

CPC分类号： G11B5/3123 ,  Y10T29/49043 ,  Y10T29/4906 ,  Y10T29/49064

摘要： In one embodiment and method of the present invention, a coil of a write head is created by forming a P1 pedestal layer and a back gap layer and further forming a coil pattern consistent with the coil to be formed and insulator spacers dispersed in the coil pattern, using a non-damascene process, thereafter the coil is formed by plating using a damascene process.

摘要翻译： 在本发明的一个实施例和方法中，通过形成P1基座层和后间隙层，并且进一步形成与要形成的线圈一致的线圈图案并且将绝缘体间隔物分散在线圈图案中，形成写入头的线圈 ，使用非镶嵌工艺，然后通过使用镶嵌工艺电镀形成线圈。

公开(公告)号：US20100157474A1

公开(公告)日：2010-06-24

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20100157472A1

公开(公告)日：2010-06-24

申请号：US12343709

申请日：2008-12-24

申请人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/10 ,  B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.

摘要翻译： 一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。 屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。 该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。 护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

公开(公告)号：US20090139958A1

公开(公告)日：2009-06-04

申请号：US11947616

申请日：2007-11-29

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G03B31/00

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。 图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。 该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。

公开(公告)号：US07212380B2

公开(公告)日：2007-05-01

申请号：US10831834

申请日：2004-04-26

申请人： Wen-Chien David Hsiao ,  Wipul Pemsiri Jayaekara ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Patrick Rush Webb ,  Sue Siyang Zhang

发明人： Wen-Chien David Hsiao ,  Wipul Pemsiri Jayaekara ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Patrick Rush Webb ,  Sue Siyang Zhang

IPC分类号： G11B5/31 ,  G11B5/187 ,  G11B5/255 ,  G11B5/39

CPC分类号： G11B5/1278 ,  G11B5/3143

摘要： A magnetoresistive read/write head having a first layer of alumina and a second layer of silicon dioxide overlaying a P3 layer of the head. In a preferred embodiment, the silicon dioxide layer is recessed away from an Air Bearing Surface (ABS) to reduce protrusion of a P2 layer and the P3 layer in the head, and to reduce degradation in the magnetic properties of the pole tips of the P2 and P3 layer ends.

摘要翻译： 具有第一氧化铝层和覆盖头部的P3层的第二二氧化硅层的磁阻读写头。 在优选实施例中，二氧化硅层从空气轴承表面（ABS）凹入，以减少P2层和P3中头部的突出，并减少P2的极尖的磁性能的降低 和P3层结束。

公开(公告)号：US07037847B2

公开(公告)日：2006-05-02

申请号：US10856679

申请日：2004-05-28

申请人： Quang Le ,  Sue Siyang Zhang

发明人： Quang Le ,  Sue Siyang Zhang

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： C23C16/44 ,  G11B5/3163 ,  G11B5/3169 ,  H01L21/3146

摘要： The fabrication of the read head sensor components where chemical mechanical polishing (CMP) stop layer is deposited above the sensor layers, a first reactive ion etch (RIE) layer and a second RIE layer are deposited, where the second RIE layer is etchable with a different ion species than the first RIE layer. A stencil layer is then deposited and patterned to create an etching stencil having the desired magnetic read track width of the sensor. An RIE step is then conducted in which the second RIE layer is etched. An RIE step for the first RIE layer is then conducted with a different ion species. Thereafter, the sensor layers are milled where the remaining portions of the first and second RIE layers act as a milling mask. A CMP assisted liftoff step is then conducted in which the remaining portions of the ion milling mask are removed.

摘要翻译： 沉积化学机械抛光（CMP）停止层沉积在传感器层上方，第一反应离子蚀刻（RIE）层和第二RIE层的读取头传感器部件的制造，其中第二RIE层可以用 不同的离子种类比第一个RIE层。 然后沉积和图案化模板层以产生具有传感器的期望磁读取磁道宽度的蚀刻模版。 然后进行RIE步骤，其中蚀刻第二RIE层。 然后用不同的离子种类进行第一RIE层的RIE步骤。 此后，将第一和第二RIE层的剩余部分用作铣削掩模的传感器层进行研磨。 然后进行CMP辅助剥离步骤，其中除去离子铣削掩模的剩余部分。