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    Super-resolution lithography apparatus and method based on multi light exposure method
    1.
    发明授权
    Super-resolution lithography apparatus and method based on multi light exposure method 有权
    基于多光曝光方法的超分辨光刻设备及方法

    公开(公告)号：US08279400B2

    公开(公告)日：2012-10-02

    申请号：US12403111

    申请日：2009-03-12

    申请人： Hee Su Park ,  Sun Kyung Lee ,  Jae Yong Lee ,  Sang-Kyung Choi ,  Dong-Hoon Lee

    发明人： Hee Su Park ,  Sun Kyung Lee ,  Jae Yong Lee ,  Sang-Kyung Choi ,  Dong-Hoon Lee

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70408 ,  G03F7/7005 ,  G03F7/70466 ,  G03F7/70575

    摘要： Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps. Furthermore, a multiple photon absorber that is difficult to obtain, a medium having a complicated energy level and a high-efficiency quantum optical light are unnecessary, and thus economic efficiency is improved.

    摘要翻译： 本文公开了一种基于多次曝光方法的超分辨率光刻设备和方法。 超分辨光刻设备包括具有第一基态，第二基态，第一激发态，第二激发态和淬灭态的能级的照相介质; 在照相介质的第一基态和第一激发态之间引起能级转变的第一光源; 第二光源，在所述第二基态和所述照相介质的所述第一激发态之间引起能级转变; 以及在照相介质的第二基态和第二激发态之间引起能级跃迁的第三光源。 因此，可以简单地通过使用具有简单结构和传统激光束的照相介质并增加曝光步骤的数量来改进光刻的分辨率。 此外，难以获得难以获得的多光子吸收体，具有复杂的能级和高效量子光的介质，因而提高了经济效率。

    SUPER-RESOLUTION LITHOGRAPHY APPARATUS AND METHOD BASED ON MULTI LIGHT EXPOSURE METHOD
    5.
    发明申请
    SUPER-RESOLUTION LITHOGRAPHY APPARATUS AND METHOD BASED ON MULTI LIGHT EXPOSURE METHOD 有权
    基于多光子曝光方法的超分辨率光刻设备及方法

    公开(公告)号：US20100123889A1

    公开(公告)日：2010-05-20

    申请号：US12403111

    申请日：2009-03-12

    申请人： Hee Su PARK ,  Sun Kyung LEE ,  Jae Yong LEE ,  Sang-Kyung CHOI ,  Dong-Hoon LEE

    发明人： Hee Su PARK ,  Sun Kyung LEE ,  Jae Yong LEE ,  Sang-Kyung CHOI ,  Dong-Hoon LEE

    IPC分类号： G03B27/54 ,  G03B27/32

    CPC分类号： G03F7/70408 ,  G03F7/7005 ,  G03F7/70466 ,  G03F7/70575

    摘要： Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps. Furthermore, a multiple photon absorber that is difficult to obtain, a medium having a complicated energy level and a high-efficiency quantum optical light are unnecessary, and thus economic efficiency is improved.

    摘要翻译： 本文公开了一种基于多次曝光方法的超分辨率光刻设备和方法。 超分辨光刻设备包括具有第一基态，第二基态，第一激发态，第二激发态和淬灭态的能级的照相介质; 在照相介质的第一基态和第一激发态之间引起能级转变的第一光源; 第二光源，在所述第二基态和所述照相介质的所述第一激发态之间引起能级转变; 以及在照相介质的第二基态和第二激发态之间引起能级跃迁的第三光源。 因此，可以简单地通过使用具有简单结构和传统激光束的照相介质并增加曝光步骤的数量来改进光刻的分辨率。 此外，难以获得难以获得的多光子吸收体，具有复杂的能级和高效量子光的介质，因而提高了经济效率。

    Furancarbonylguanidine derivatives, their preparation and pharmaceutical compositions containing them
    6.
    发明授权
    Furancarbonylguanidine derivatives, their preparation and pharmaceutical compositions containing them 失效
    呋喃羰基胍衍生物，其制备方法和含有它们的药物组合物

    公开(公告)号：US07351843B2

    公开(公告)日：2008-04-01

    申请号：US10581799

    申请日：2004-12-24

    申请人： Kyu Yang Yi ,  Sun Kyung Lee ,  Nak Jeong Kim ,  Jee Hee Suh ,  Soon Hee Hwang ,  Byung Ho Lee ,  Ho Won Seo ,  Sun Kyung Hwang ,  Sung Eun Yoo ,  Kyung Hee Lee

    发明人： Kyu Yang Yi ,  Sun Kyung Lee ,  Nak Jeong Kim ,  Jee Hee Suh ,  Soon Hee Hwang ,  Byung Ho Lee ,  Ho Won Seo ,  Sun Kyung Hwang ,  Sung Eun Yoo ,  Kyung Hee Lee

    IPC分类号： C07D307/02 ,  A61K31/34 ,  A01N43/08

    CPC分类号： C07D307/68

    摘要： The present invention relates to furancarbonylguanidine derivatives, a preparation method thereof and a pharmaceutical composition comprising the same.Furancarbonylguanidine derivatives of the present invention inhibit NHE-1 (sodium-hydrogen exchanger isoform 1), which helps recovery of heart function damaged from ischemia/reperfusion and decreases myocardial infarction rate, indicating that they have protective effect on myocardial cells. Thus, furancarbonylguanidine derivatives of the present invention can be effectively used for the prevention and the treatment of ischemic heart diseases such as myocardial infarction, arrhythmia, angina pectoris, etc, and also a promising candidate for a heart protecting agent applied to reperfusion therapy including thrombolytics or cardiac surgery including coronary artery bypass graft, percutaneous transluminal coronary angioplasty, etc.

    摘要翻译： 本发明涉及呋喃羰基胍衍生物，其制备方法和包含其的药物组合物。 本发明的呋喃羰基胍衍生物抑制NHE-1（钠氢交换异构体1），其有助于恢复从缺血/再灌注损伤的心脏功能，并降低心肌梗死率，表明它们对心肌细胞具有保护作用。 因此，本发明的呋喃羰基胍衍生物可以有效地用于预防和治疗心肌梗死，心律失常，心绞痛等缺血性心脏病，也是应用于再灌注治疗的心脏保护剂的有希望的候选物，包括溶栓剂 或心脏手术，包括冠状动脉旁路移植术，经皮腔内冠状动脉血管成形术等