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1.发明申请DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY PANEL HAVING THE SAME 有权显示基板，其制造方法和具有该基板的显示面板公开(公告)号：US20120293852A1
公开(公告)日：2012-11-22
申请号：US13350922
申请日：2012-01-16
申请人： HYUN-MIN CHO , Sung-Sik YUN , Jae-Byung PARK , Don-Chan CHO , Dae-Hyun KIM , Seon-Tae YOON
发明人： HYUN-MIN CHO , Sung-Sik YUN , Jae-Byung PARK , Don-Chan CHO , Dae-Hyun KIM , Seon-Tae YOON
CPC分类号： G02B26/023
摘要： A display substrate includes a base substrate, a micro shutter, a first driving electrode, a second driving electrode, and a plurality of anchors. The micro shutter includes a flat portion having at least one opening, a main concave portion adjacent to the opening and extending in from the flat portion to a first depth, and at least one sub-concave portion extending in from a bottom surface of the main concave portion to second depth. The first driving electrode is connected to a first side of the micro shutter. The second driving electrode is connected to a second side of the micro shutter. The second side is positioned opposite to the first side. The anchors fix the first and second driving electrodes on the base substrate.
摘要翻译： 显示基板包括基底基板，微型快门，第一驱动电极，第二驱动电极和多个定位器。 微型快门包括具有至少一个开口的平坦部分，与开口相邻并且从平坦部分延伸到第一深度的主凹部，以及从主体的底表面延伸的至少一个子凹部 凹部到第二深度。 第一驱动电极连接到微快门的第一侧。 第二驱动电极连接到微快门的第二侧。 第二侧与第一侧相对。 锚固件将第一和第二驱动电极固定在基底基板上。
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公开(公告)号：US07745308B2
公开(公告)日：2010-06-29
申请号：US12417114
申请日：2009-04-02
申请人： Myung Lae Lee , Jong Hyun Lee , Sung Sik Yun , Dae Hun Jeong , Gunn Hwang , Chang Auck Choi , Chang Han Je , Jae Yong An
发明人： Myung Lae Lee , Jong Hyun Lee , Sung Sik Yun , Dae Hun Jeong , Gunn Hwang , Chang Auck Choi , Chang Han Je , Jae Yong An
IPC分类号： H01L21/00
CPC分类号： B81C1/00619 , B81C1/00626 , B81C2201/0132 , B81C2201/0133
摘要： A method of fabricating a micro-vertical structure is provided. The method includes bonding a second crystalline silicon (Si) substrate onto a first crystalline Si substrate by interposing an insulating layer pattern and a cavity, etching the second crystalline Si substrate using a deep reactive ion etch (DRIE) process along a [111] crystal plane vertical to the second crystalline Si substrate, and etching an etched vertical surface of the second crystalline Si substrate using a crystalline wet etching process to improve the surface roughness and flatness of the etched vertical surface. As a result, no morphological defects occur on the etched vertical surface. Also, footings do not occur at an etch end-point due to the insulating layer pattern. In addition, the micro-vertical structure does not float in the air but is fixed to the first crystalline Si substrate, thereby facilitating subsequent processes.
摘要翻译： 提供一种制造微垂直结构的方法。 该方法包括通过插入绝缘层图案和空腔将第二晶体硅（Si）衬底接合到第一晶体Si衬底上，使用沿[111]晶体的深反应离子蚀刻（DRIE）工艺蚀刻第二晶体Si衬底 垂直于第二晶体Si衬底，并且使用结晶湿蚀刻工艺蚀刻第二晶体Si衬底的蚀刻垂直表面，以改善蚀刻垂直表面的表面粗糙度和平坦度。 结果，蚀刻的垂直表面上没有形成形态缺陷。 此外，由于绝缘层图案，在蚀刻终点处不发生基脚。 此外，微垂直结构不会浮在空气中，而是固定在第一晶体Si衬底上，从而有助于后续工艺。
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3.发明授权Wet-pipe sprinkler system, method of supplying water and dealing with water leak in the sprinkler system 有权湿式喷淋系统，洒水系统中供水和处理泄漏的方法公开(公告)号：US06840457B2
公开(公告)日：2005-01-11
申请号：US10265768
申请日：2002-10-08
申请人： Hyo-jung Park , Sung-sik Yun , Kyong-gwan Lee , Seong-ock Hong , Hyun-ku Kim
发明人： Hyo-jung Park , Sung-sik Yun , Kyong-gwan Lee , Seong-ock Hong , Hyun-ku Kim
CPC分类号： A62C35/68
摘要： A wet-pipe sprinkler system, method of supplying water to the system, and method of dealing with a leakage of the system are provided, wherein the wet-pipe sprinkler system includes a sprinkler head; a plurality of interconnected pipes for supplying water to the sprinkler head; at least one water supply connected to one end of the pipes; an electric main valve for controlling inflow of water to the pipes; an electric drain valve to drain water from the pipes; a first electrical control circuit in a central control studio which outputs a drain valve opening signal to the electric drain valve and a main valve closing signal to the electric main valve when a leakage is detected, thereby blocking the water from entering the pipes and draining the water from the pipes. Accordingly, a leak may be dealt with promptly, thereby minimizing damage caused by the leakage.
摘要翻译： 提供了一种湿式管道喷淋系统，向系统供水的方法，以及处理系统泄漏的方法，其中，湿式喷淋系统包括喷头; 多个互连的管道，用于向喷头供水; 至少一个供水管连接到管道的一端; 用于控制水流入管道的电动主阀; 排水阀，用于从管道排出水; 中央控制室中的第一电气控制电路，当检测到泄漏时，向排水阀输出排水阀打开信号和主电阀关闭信号，从而阻止水进入管道并排出 水从管道。 因此，可以及时处理泄漏，从而最小化由泄漏引起的损坏。
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4.发明申请DISPLAY SUBSTRATE, DISPLAY APPARATUS HAVING THE SAME AND METHOD OF MANUFACTURING THE SAME 有权显示基板，具有该显示基板的显示装置及其制造方法公开(公告)号：US20120236385A1
公开(公告)日：2012-09-20
申请号：US13343250
申请日：2012-01-04
申请人： Sung-Sik Yun , Jae-Byung PARK , Jin-Seob BYUN , Hyun-Min CHO , Yu-Kwan KIM
发明人： Sung-Sik Yun , Jae-Byung PARK , Jin-Seob BYUN , Hyun-Min CHO , Yu-Kwan KIM
摘要： A display substrate includes a base substrate, a high reflective layer, a metal light reflective layer and a low reflective layer. The high reflective layer is on the base substrate, and includes a high refractive layer and a low refractive layer which alternate with each other. The high refractive layer has a first refractive index, and the low refractive layer has a second refractive index smaller than the first refractive index. The metal light reflective layer is between the high reflective layer and the low reflective layer, and reflects a light. The low reflective layer comprises a light absorbing layer which absorbs a light, and at least one insulating layer. Accordingly, a light utilizing efficiency and a display quality may be increased.
摘要翻译： 显示基板包括基底，高反射层，金属光反射层和低反射层。 高反射层在基底上，并且包括彼此交替的高折射层和低折射层。 高折射层具有第一折射率，并且低折射层具有小于第一折射率的第二折射率。 金属光反射层位于高反射层和低反射层之间，并反射光。 低反射层包括吸收光的光吸收层和至少一个绝缘层。 因此，可以提高光利用效率和显示质量。
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5.发明授权Display substrate, method of manufacturing the same and display panel having the same 有权显示基板，其制造方法以及具有该基板的显示面板公开(公告)号：US08842354B2
公开(公告)日：2014-09-23
申请号：US13350922
申请日：2012-01-16
申请人： Hyun-Min Cho , Sung-Sik Yun , Jae-Byung Park , Don-Chan Cho , Dae-Hyun Kim , Seon-Tae Yoon
发明人： Hyun-Min Cho , Sung-Sik Yun , Jae-Byung Park , Don-Chan Cho , Dae-Hyun Kim , Seon-Tae Yoon
IPC分类号： G02B26/02
CPC分类号： G02B26/023
摘要： A display substrate includes a base substrate, a micro shutter, a first driving electrode, a second driving electrode, and a plurality of anchors. The micro shutter includes a flat portion having at least one opening, a main concave portion adjacent to the opening and extending in from the flat portion to a first depth, and at least one sub-concave portion extending in from a bottom surface of the main concave portion to second depth. The first driving electrode is connected to a first side of the micro shutter. The second driving electrode is connected to a second side of the micro shutter. The second side is positioned opposite to the first side. The anchors fix the first and second driving electrodes on the base substrate.
摘要翻译： 显示基板包括基底基板，微型快门，第一驱动电极，第二驱动电极和多个定位器。 微型快门包括具有至少一个开口的平坦部分，与开口相邻并且从平坦部分延伸到第一深度的主凹部，以及从主体的底表面延伸的至少一个子凹部 凹部到第二深度。 第一驱动电极连接到微快门的第一侧。 第二驱动电极连接到微快门的第二侧。 第二侧与第一侧相对。 锚固件将第一和第二驱动电极固定在基底基板上。
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公开(公告)号：US20130050794A1
公开(公告)日：2013-02-28
申请号：US13557606
申请日：2012-07-25
申请人： Sung-Sik YUN , Jae-Byung PARK , Jin-Seob BYUN , Hyun-Min CHO , Dae-Hyun KIM
发明人： Sung-Sik YUN , Jae-Byung PARK , Jin-Seob BYUN , Hyun-Min CHO , Dae-Hyun KIM
CPC分类号： G02B26/02
摘要： The display substrate includes a base substrate, a micro shutter, a first driving electrode, a second driving electrode and a plurality of anchors. The micro shutter is disposed on the base substrate, and includes a plurality of opening parts and a blocking part. The blocking part includes at least two trench structures and the blocking part is disposed between an adjacent pair of the opening parts . The first driving electrode is connected to a first side of the micro shutter. The second driving electrode is connected to a second side of the micro shutter opposite to the first side of the micro shutter. The plurality of anchors fixes the first and second driving electrodes and the micro shutter on the base substrate.
摘要翻译： 显示基板包括基底基板，微快门，第一驱动电极，第二驱动电极和多个定位器。 微型快门设置在基底基板上，并且包括多个开口部和阻挡部。 阻挡部分包括至少两个沟槽结构，并且阻挡部分设置在相邻的一对开口部分之间。 第一驱动电极连接到微快门的第一侧。 第二驱动电极连接到微快门的与微快门第一侧相对的第二侧。 多个锚固件将第一和第二驱动电极和微快门固定在基底基板上。
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公开(公告)号：US20120256027A1
公开(公告)日：2012-10-11
申请号：US13516624
申请日：2010-08-30
申请人： Sung Yang , Sung Sik Yun , Sang Youl Yoon
发明人： Sung Yang , Sung Sik Yun , Sang Youl Yoon
CPC分类号： C12M47/06 , B02C19/0056
摘要： The present invention relates to a cell lysis apparatus and a manufacturing method thereof, and more particularly, to a cell lysis apparatus, which mechanically performs cell lysis, and a manufacturing method thereof. The cell lysis apparatus includes: an inlet port through which fluid containing cells is supplied; a fluid channel defining a passage through which the cell containing fluid supplied from the inlet port flows; a nano blade array including a plurality of nano blades having pointed leading ends and arranged such that the pointed leading ends of the nano blades are oriented in a direction of the fluid supplied through the inlet port to disrupt the cells passing therethrough; and an outlet port through which the disrupted cells and the fluid are discharged.
摘要翻译： 细胞裂解装置及其制造方法技术领域本发明涉及细胞裂解装置及其制造方法，更具体地，涉及机械实施细胞裂解的细胞裂解装置及其制造方法。 细胞裂解装置包括：供给含有细胞的流体的入口; 限定通道的流体通道，通过所述通道从所述入口端口供应的流体流过; 纳米刀片阵列，其包括具有尖端前端的多个纳米刀片，并且布置成使得纳米刀片的尖端前端沿着通过入口端口供应的流体的方向定向，以破坏通过其的细胞; 以及排出细胞和流体的出口。
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公开(公告)号：US20100009514A1
公开(公告)日：2010-01-14
申请号：US12417114
申请日：2009-04-02
申请人： Myung Lae LEE , Jong Hyun Lee , Sung Sik Yun , Dae Hun Jeong , Gunn Hwang , Chang Auck Choi , Chang Han Je , Jae Yong An
发明人： Myung Lae LEE , Jong Hyun Lee , Sung Sik Yun , Dae Hun Jeong , Gunn Hwang , Chang Auck Choi , Chang Han Je , Jae Yong An
IPC分类号： H01L21/306
CPC分类号： B81C1/00619 , B81C1/00626 , B81C2201/0132 , B81C2201/0133
摘要： A method of fabricating a micro-vertical structure is provided. The method includes bonding a second crystalline silicon (Si) substrate onto a first crystalline Si substrate by interposing an insulating layer pattern and a cavity, etching the second crystalline Si substrate using a deep reactive ion etch (DRIE) process along a [111] crystal plane vertical to the second crystalline Si substrate, and etching an etched vertical surface of the second crystalline Si substrate using a crystalline wet etching process to improve the surface roughness and flatness of the etched vertical surface. As a result, no morphological defects occur on the etched vertical surface. Also, footings do not occur at an etch end-point due to the insulating layer pattern. In addition, the micro-vertical structure does not float in the air but is fixed to the first crystalline Si substrate, thereby facilitating subsequent processes.
摘要翻译： 提供一种制造微垂直结构的方法。 该方法包括通过插入绝缘层图案和空腔将第二晶体硅（Si）衬底接合到第一晶体Si衬底上，使用沿[111]晶体的深反应离子蚀刻（DRIE）工艺蚀刻第二晶体Si衬底 垂直于第二晶体Si衬底，并且使用结晶湿蚀刻工艺蚀刻第二晶体Si衬底的蚀刻垂直表面，以改善蚀刻垂直表面的表面粗糙度和平坦度。 结果，蚀刻的垂直表面上没有形成形态缺陷。 此外，由于绝缘层图案，在蚀刻终点处不发生基脚。 此外，微垂直结构不会浮在空气中，而是固定在第一晶体Si衬底上，从而有助于后续工艺。
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公开(公告)号：US09506028B2
公开(公告)日：2016-11-29
申请号：US13516624
申请日：2010-08-30
申请人： Sung Yang , Sung Sik Yun , Sang Youl Yoon
发明人： Sung Yang , Sung Sik Yun , Sang Youl Yoon
CPC分类号： C12M47/06 , B02C19/0056
摘要： The present invention relates to a cell lysis apparatus and a manufacturing method thereof, and more particularly, to a cell lysis apparatus, which mechanically performs cell lysis, and a manufacturing method thereof. The cell lysis apparatus includes: an inlet port through which fluid containing cells is supplied; a fluid channel defining a passage through which the cell containing fluid supplied from the inlet port flows; a nano blade array including a plurality of nano blades having pointed leading ends and arranged such that the pointed leading ends of the nano blades are oriented in a direction of the fluid supplied through the inlet port to disrupt the cells passing therethrough; and an outlet port through which the disrupted cells and the fluid are discharged.
摘要翻译： 细胞裂解装置及其制造方法技术领域本发明涉及细胞裂解装置及其制造方法，更具体地，涉及机械实施细胞裂解的细胞裂解装置及其制造方法。 细胞裂解装置包括：供给含有细胞的流体的入口; 限定通道的流体通道，通过所述通道从所述入口端口供应的流体流过; 纳米刀片阵列，其包括具有尖端前端的多个纳米刀片，并且布置成使得纳米刀片的尖端前端沿着通过入口端口供应的流体的方向定向，以破坏通过其的细胞; 以及排出细胞和流体的出口。
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10.发明授权Display substrate, display apparatus having the same and method of manufacturing the same 有权显示基板，具有该显示基板的显示装置及其制造方法公开(公告)号：US09116343B2
公开(公告)日：2015-08-25
申请号：US13343250
申请日：2012-01-04
申请人： Sung-Sik Yun , Jae-Byung Park , Jin-Seob Byun , Hyun-Min Cho , Yu-Kwan Kim
发明人： Sung-Sik Yun , Jae-Byung Park , Jin-Seob Byun , Hyun-Min Cho , Yu-Kwan Kim
摘要： A display substrate includes a base substrate, a high reflective layer, a metal light reflective layer and a low reflective layer. The high reflective layer is on the base substrate, and includes a high refractive layer and a low refractive layer which alternate with each other. The high refractive layer has a first refractive index, and the low refractive layer has a second refractive index smaller than the first refractive index. The metal light reflective layer is between the high reflective layer and the low reflective layer, and reflects a light. The low reflective layer comprises a light absorbing layer which absorbs a light, and at least one insulating layer. Accordingly, a light utilizing efficiency and a display quality may be increased.
摘要翻译： 显示基板包括基底，高反射层，金属光反射层和低反射层。 高反射层在基底上，并且包括彼此交替的高折射层和低折射层。 高折射层具有第一折射率，并且低折射层具有小于第一折射率的第二折射率。 金属光反射层位于高反射层和低反射层之间，并反射光。 低反射层包括吸收光的光吸收层和至少一个绝缘层。 因此，可以提高光利用效率和显示质量。
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