摘要:
A receiver includes a local signal generator, a power phase adjuster, and a frequency converter so as to perform frequency conversion on signals included in a plurality of radio frequency bands. The local signal generator supplies a plurality of local signals. The power phase adjuster adjusts local signals in terms of signal power or relative phases. The frequency converter performs frequency conversion on radio frequency bands by use of local signals adjusted with the power phase adjuster, thus sorting them in a desired frequency range.
摘要:
HDART binds with HDAC (histone deacetylase) and functions as a repressor. HDART directly binds with Skip, which functions as a transcription co-activator of nuclear receptors, to repress the transcription by the nuclear receptor. Moreover, HDART is a transcription co-repressor of nuclear receptors, and binds with HDAC wherein transcription can be strongly repressed through the histone deacetylization of HDAC. On the other hand, a dominant negative peptide of HDART can be obtained, and it has been confirmed that, in contrast with the full-length HDART protein, this peptide activates transcription. In particular, the ability of this peptide to activate transcription by the retinoic acid receptor exceeds that of all-trans retinoic acid (ATRA).
摘要:
A back electrode type solar cell in which a no-electrode-formed region where no electrode is placed is provided in a part of a peripheral portion of a back surface of the back electrode type solar cell such that a line connecting end portions of a plurality of electrodes to one another includes a partially inwardly recessed region and the no-electrode-formed region is located adjacent to each of an electrode for n-type and an electrode for p-type adjacent to each other, a solar cell module, a method of manufacturing a back electrode type solar cell with interconnection sheet, and a method of manufacturing a solar cell module are provided.
摘要:
A semiconductor device includes: a first MIS transistor of a first conductivity type having a first active region as a region of a semiconductor substrate surrounded by an element isolation region formed in an upper portion of the semiconductor substrate, a first gate insulating film having a first high dielectric film formed on the first active region, and a first gate electrode formed on the first gate insulating film; and a resistance element having a second high dielectric film formed on the element isolation region and a resistance layer made of silicon formed on the second high dielectric film. The first high dielectric film and the second high dielectric film include the same high dielectric material, and the first high dielectric film includes a first adjustment metal, but the second high dielectric film does not include the first adjustment metal.
摘要:
A microchannel device includes; a microchannel that forms two or more different fluids as a multiphase flow, and a section shape of the multiphase flow having in at least one portion a first shape in which plural polygons are two-dimensionally arranged, and adjacent to one another, a second shape in which a polygon is inscribed in one of a circle and an ellipse, or circumscribes one of a circle and an ellipse, or a third shape in which at least plural circles and polygons are two-dimensionally arranged, and adjacent to one another.
摘要:
The semiconductor device includes a first transistor and a second transistor formed in a semiconductor substrate. The first transistor includes: a first gate insulating film formed on the semiconductor substrate; and a first gate electrode formed on the first gate insulating film. The second transistor includes: a second gate insulating film formed on the semiconductor substrate; and a second gate electrode formed on the second gate insulating film. The first gate insulating film includes a first insulating material with a first element diffused therein, the second gate insulating film includes the first insulating material, and the amount of the first element contained in the first gate insulating film is greater than the amount of the first element contained in the second gate insulating film.
摘要:
A back contact solar cell according to an embodiment of the invention includes an alignment mark (25a, 25b) in an inner region inside of an outer periphery of an electrode pattern that includes plural electrodes for first conductivity type (24) and plural electrodes for second conductivity type (25), which are formed on one surface side of a semiconductor substrate (21). According to the configuration, alignment accuracy is improved between a back contact of a solar cell and a wiring of a wiring sheet.
摘要:
A receiver includes a local signal generator, a power phase adjuster, and a frequency converter so as to perform frequency conversion on signals included in a plurality of radio frequency bands. The local signal generator supplies a plurality of local signals. The power phase adjuster adjusts local signals in terms of signal power or relative phases. The frequency converter performs frequency conversion on radio frequency bands by use of local signals adjusted with the power phase adjuster, thus sorting them in a desired frequency range.
摘要:
This disclosure provides a method of adjusting capacities of combustion chambers of a multi-cylinder engine having a cylinder head with recessed parts that partially form the combustion chambers and a mating surface for mating with a cylinder block, which includes casting a cylinder head material having flat reference surfaces on top of the recessed parts of the cylinder head, machining the cylinder head material to form the mating surface, measuring distances in a height direction from the mating surface to the reference surfaces, respectively, and adjusting machining margins of machining portions of the reference surfaces of the recessed parts based on the measured height direction distances.
摘要:
A semiconductor device includes: a semiconductor substrate; a gate electrode formed on the semiconductor substrate with a gate insulating film interposed therebetween; a side wall spacer formed on a side wall of the gate electrode; source/drain regions formed in opposing portions of the semiconductor substrate with the gate electrode and the side wall spacer interposed therebetween; and a stress-applying insulating film covering the gate electrode, the side wall spacer, and an upper surface of the semiconductor substrate. A gate-length-direction thickness of an upper portion of the side wall spacer is at least larger than a gate-length-direction thickness of a middle portion thereof.