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公开(公告)号：US08471227B2
公开(公告)日：2013-06-25
申请号：US13293914
申请日：2011-11-10
申请人： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
发明人： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
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公开(公告)号：US20120248344A1
公开(公告)日：2012-10-04
申请号：US13523446
申请日：2012-06-14
IPC分类号： G21K5/00
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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公开(公告)号：US20120119116A1
公开(公告)日：2012-05-17
申请号：US13293914
申请日：2011-11-10
申请人： Kouji KAKIZAKI , Shinji NAGAI , Tatsuya YANAGIDA
发明人： Kouji KAKIZAKI , Shinji NAGAI , Tatsuya YANAGIDA
IPC分类号： G21K5/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
摘要翻译： 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。
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公开(公告)号：US20120091893A1
公开(公告)日：2012-04-19
申请号：US13336749
申请日：2011-12-23
申请人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： H05H1/46
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。
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公开(公告)号：US08067756B2
公开(公告)日：2011-11-29
申请号：US12646075
申请日：2009-12-23
申请人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
发明人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。
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公开(公告)号：US09265136B2
公开(公告)日：2016-02-16
申请号：US13572484
申请日：2012-08-10
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20140077099A1
公开(公告)日：2014-03-20
申请号：US14114906
申请日：2012-06-07
IPC分类号： F21K2/00
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
摘要翻译： 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
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8.发明授权System and method for generating extreme ultraviolet light, and laser apparatus 有权用于产生极紫外光的系统和方法，以及激光装置公开(公告)号：US08669543B2
公开(公告)日：2014-03-11
申请号：US13126671
申请日：2011-03-25
IPC分类号： H05G2/00
CPC分类号： H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
摘要翻译： 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。
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公开(公告)号：US08436328B2
公开(公告)日：2013-05-07
申请号：US12638571
申请日：2009-12-15
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。
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10.发明申请SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 有权用于产生极光紫外线灯和激光装置的系统和方法公开(公告)号：US20120146507A1
公开(公告)日：2012-06-14
申请号：US13126671
申请日：2011-03-25
CPC分类号： H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
摘要翻译： 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。
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