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公开(公告)号：US07767053B2
公开(公告)日：2010-08-03
申请号：US11984186
申请日：2007-11-14
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32174 , H01J37/32082 , H01J2237/0206
摘要： To effectively prevent a micro arc causing damage to an apparatus and a substrate, by detecting a generation of the micro arc. A substrate processing apparatus is constituted so as to generate a plasma P, by applying a high frequency power to an electrode 210 provided in a processing chamber 200 from a high frequency power supply part 100 through a matching unit 300. A directional coupler 121 is provided between a high frequency power source 111 and the matching unit 300, so that a reflected wave reflected from the electrode 210 and a traveling wave advancing toward the electrode 210 are coupled to a detector 122. The detector 122 outputs a detection signal, when a level of a reflected wave Pr and a differential level thereof exceed each set value. In order to place an initial period of discharge out of a detection period, a delay traveling wave, which is a delayed traveling wave, is also outputted. A controller 130 determines the generation of a harmful micro arc, when coincidence of three detection signals outputted from the detector 122 is obtained, supplies an RF cut signal to a CPU 116, and temporarily stops or temporarily decreases a high frequency power from the high frequency power source 111.
摘要翻译： 通过检测微弧的产生，有效地防止微弧对装置和基板造成损害。 基板处理装置被构成为通过经由匹配单元300从高频电源部件100向设置在处理室200中的电极210施加高频电力来产生等离子体P.定向耦合器121被提供 在高频电源111和匹配单元300之间，使得从电极210反射的反射波和向电极210前进的行波耦合到检测器122.检测器122输出检测信号，当电平 的反射波Pr及其差分电平超过每个设定值。 为了在检测周期内放置初始放电周期，也输出作为延迟行波的延迟行波。 当获得从检测器122输出的三个检测信号的一致时，控制器130确定有害的微弧的产生，向CPU 116提供RF切断信号，并从高频临时停止或暂时降低高频功率 电源111。
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公开(公告)号：US20080075640A1
公开(公告)日：2008-03-27
申请号：US11984186
申请日：2007-11-14
CPC分类号： H01J37/32174 , H01J37/32082 , H01J2237/0206
摘要： To effectively prevent a micro arc causing damage to an apparatus and a substrate, by detecting a generation of the micro arc. A substrate processing apparatus is constituted so as to generate a plasma P, by applying a high frequency power to an electrode 210 provided in a processing chamber 200 from a high frequency power supply part 100 through a matching unit 300. A directional coupler 121 is provided between a high frequency power source 111 and the matching unit 300, so that a reflected wave reflected from the electrode 210 and a traveling wave advancing toward the electrode 210 are coupled to a detector 122. The detector 122 outputs a detection signal, when a level of a reflected wave Pr and a differential level thereof exceed each set value. In order to place an initial period of discharge out of a detection period, a delay traveling wave, which is a delayed traveling wave, is also outputted. A controller 130 determines the generation of a harmful micro arc, when coincidence of three detection signals outputted from the detector 122 is obtained, supplies an RF cut signal to a CPU 116, and temporarily stops or temporarily decreases a high frequency power from the high frequency power source 111.
摘要翻译： 通过检测微弧的产生，有效地防止微弧对装置和基板造成损害。 基板处理装置被构成为通过经由匹配单元300从高频电源部件100向设置在处理室200中的电极210施加高频电力来产生等离子体P. 定向耦合器121设置在高频电源111和匹配单元300之间，使得从电极210反射的反射波和向电极210前进的行波耦合到检测器122。 当反射波Pr和其差分电平的电平超过每个设定值时，检测器122输出检测信号。 为了在检测周期内放置初始放电周期，也输出作为延迟行波的延迟行波。 当获得从检测器122输出的三个检测信号的一致时，控制器130确定有害的微弧的产生，向CPU 116提供RF切断信号，并从高频临时停止或暂时降低高频功率 电源111。
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公开(公告)号：US20060252283A1
公开(公告)日：2006-11-09
申请号：US10549279
申请日：2004-08-04
IPC分类号： H01L21/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J2237/0206
摘要： To effectively prevent a micro arc causing damage to an apparatus and a substrate, by detecting a generation of the micro arc. A substrate processing apparatus is constituted so as to generate a plasma P, by applying a high frequency power to an electrode 210 provided in a processing chamber 200 from a high frequency power supply part 100 through a matching unit 300. A directional coupler 121 is provided between a high frequency power source 111 and the matching unit 300, so that a reflected wave reflected from the electrode 210 and a traveling wave advancing toward the electrode 210 are coupled to a detector 122. The detector 122 outputs a detection signal, when a level of a reflected wave Pr and a differential level thereof exceed each set value. In order to place an initial period of discharge out of a detection period, a delay traveling wave, which is a delayed traveling wave, is also outputted. A controller 130 determines the generation of a harmful micro arc, when coincidence of three detection signals outputted from the detector 122 is obtained, supplies an RF cut signal to a CPU 116, and temporarily stops or temporarily decreases a high frequency power from the high frequency power source 111.
摘要翻译： 通过检测微弧的产生，有效地防止微弧对装置和基板造成损害。 基板处理装置被构成为通过经由匹配单元300从高频电源部件100向设置在处理室200中的电极210施加高频电力来产生等离子体P.定向耦合器121被提供 在高频电源111和匹配单元300之间，使得从电极210反射的反射波和向电极210前进的行波耦合到检测器122.检测器122输出检测信号，当电平 的反射波Pr及其差分电平超过每个设定值。 为了在检测周期内放置初始放电周期，也输出作为延迟行波的延迟行波。 当获得从检测器122输出的三个检测信号的一致时，控制器130确定有害的微弧的产生，向CPU 116提供RF切断信号，并从高频临时停止或暂时降低高频功率 电源111。
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4.发明授权Substrate processing device, substrate conveying device, and substrate processing method 失效基板处理装置，基板输送装置及基板处理方法公开(公告)号：US06742977B1
公开(公告)日：2004-06-01
申请号：US09503916
申请日：2000-02-15
申请人： Satohiro Okayama , Motoichi Kanazawa , Takeshige Ishida , Tomohiko Takeda , Yukio Akita , Satoru Ichimura , Kazunori Suzuki , Teruo Yoshino , Tokunobu Akao , Yasunobu Nakayama
发明人： Satohiro Okayama , Motoichi Kanazawa , Takeshige Ishida , Tomohiko Takeda , Yukio Akita , Satoru Ichimura , Kazunori Suzuki , Teruo Yoshino , Tokunobu Akao , Yasunobu Nakayama
IPC分类号： H01L2168
CPC分类号： H01L21/67742 , H01L21/67745 , H01L21/67748 , Y10S414/135 , Y10S414/14
摘要： An unprocessed substrate is conveyed to a film-processing chamber at the same time a processed substrate is conveyed to a substrate preparation chamber, reducing the substrate processing cycle, thereby increasing the yield per unit time. The substrate preparation chamber has a two-tiered structure for receiving processed substrates and unprocessed substrates. A two-tiered transfer robot allows the substrates to be removed or placed into the preparation and process chambers at the same time, thus decreasing the cycle time for processing a substrate.
摘要翻译： 将未处理的基板输送到膜处理室，同时将处理后的基板输送到基板准备室，减少基板处理循环，从而提高单位时间的产量。 衬底制备室具有用于接收经处理的衬底和未处理衬底的双层结构。 双层传送机器人可以将基板同时移除或放置在准备和处理室中，从而减少加工基板的循环时间。
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